How Standard Clean Particle Removal (SC1 Clean) is Supported in a Wet Bench Process

How Standard Clean Particle Removal (SC1 Clean) is Supported in a Wet Bench ProcessSC1 Clean is the first step in the RCA clean, the procedure required before the high-temperature processing of silicon wafers. Organic impurities attached to silicon, oxide and quartz surfaces by the solvating and oxidizing actions of NH4OH and H2O2 respectively are eliminated by the particle removing solution, SC1 Clean. This solution starts a slow regeneration process whereby the silicon wafer’s original surface layer of oxide is broken down and replaced with a new layer. This regeneration process is a highly significant part of particle removal.

SC1 solution is used at 75 or 80°C for approximately 10 minutes. It is composed of:

  • 5 parts deionized water
  • 1 part NH4OH
  • 1 part H2O2

The cleaning procedure begins by heating a mixture of the deionized water and NH4OH up to 75°C. Then, add H2O2 and allow the mixture to bubble violently before using. The silicon wafer will then be soaked in the solution for 15 minutes. After, rinse the silicon wafer in a container of deionized water in order to clean off the solution. You should change the water several times in order to prevent any removed residue from clinging back on to the surface of the silicon wafer. Remember, with the new oxide layer on the surface comes an iron contamination that should be cleaned off in the following steps of the RCA clean.

Modutek Megasonic Cleaning Equipment and Features

The particular demands of the semiconductor, FPD, hard disk, solar and crystal industries are met by Modutek’s precision megasonic cleaning system. In addition, partnering with Kaijo Corporation allows Modutek to supply engineers with cutting-edge high precision cleaning technology.

You can clear 0.1 µm particles while working up to 140°C with Modutek’s Indirect (MSI Series) bath design. Or, Modutek’s Direct (MSD Series) can give you identical results with the Teflon coated Megasonic transducer. Placed in the tank, the transducer plate is ideal for using SC1 Clean and is easily accessible for installation and upgrades. With the help of Modutek’s engineers, your manufacturing equipment will be designed to work according to the requirements of your application.

Modutek’s Megasonic cleaning features include:

  • Automatic frequency tracking system
  • High efficiency generator
  • Upper and lower limit controls
  • Available frequencies: 950kHz, 2MHz, 750kHz, 430kHz and 200kHz

Modutek’s Experience

Modutek has been in the business of supplying semiconductor manufacturing equipment for 30+ years. This history is sustained by associates who will work with you from design to final installation. For a free quote call 866-803-1533.