Two Position Transfer Agitation System
A fully automated
two-position transfer system, with adjustable vertical agitation stroke and speed in the process
and etch tank.
Microprocessor-based controller with operator access console.
FEATURES:
- Reduced operator handling
- Process repeatability ensures consistent results
- Vertical agitation at process step
- High throughput
- Various size wafers/substrates can be accommodated
- Microprocessor-based system offers reliable and precise
process control
- Modular design for minimal downtime
- Economical cost Installation in current sink (with minimal
modification)
TYPICAL OPERATION:
 The
operator programs the process parameters through the
operator access console. The operator loads the wafer
cassettes and presses the START button to initiate the
cycle. The cassettes are transferred into process
tank,(# 1), and are subjected to continuous vertical agitation at
the desired stroke and frequency for a preset time
period. After time expires, the cassettes are
automatically transferred to the rinse tank (#2). When processing
at tank #2 is completed the end of the cycle is signaled
by an audible alarm. The operator presses the RESET
button and the cassettes are transferred to the unload
position, The operator removes the cassettes, and the
system is now ready for the next run.
SPECIFICATIONS:
Production capacity:
Up to and including two (2) cassettes of 150MM wafers
Agitation cycle: vertical up and down motion
Process time:
0-9999 see Rinse time: 0-9999 seconds
Quick dump cycle:
0-99 cycles
Electrical power 120 VAC 50/60 Hz, 2A (other voltage available)
Compressed air or N2 pressures 80 psi/20cfm
OPTIONS:
- Custom wafer/substrate cassette carriers
- Dump riser controls and valves
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