Advanced Wafer Drying using Modutek’s IPA Vapor Dryer
The successful manufacture of tightly packed semiconductor products depends on obtaining low particle counts on silicon wafer surfaces after rinsing. Heat drying and spin dryers may leave water marks and residue as the water evaporates. Modutek’s advanced IPA vapor dryers use the Marangoni drying effect to reduce particle counts to a minimum. The compact dryer […]
How the IPA Vapor Dryer Improves Wafer Processing Results
Not every advancement in semiconductor fabrication produces results that are usable in industry. To be of value, advancements need to be consistently repeatable when used on an industrial scale. Modutek’s IPA vapor dryer falls into this category, helping semiconductor fabricators improve both yields and processing times. Modutek’s IPA vapor dryers are custom-engineered with in-house experts […]
How Marangoni Drying Produces Superior Surface Conditioning for Wafer Processing
At the end of a particular step in silicon wafer processing, wafers often have to be cleaned, rinsed and dried. The resulting wafer surfaces must be free of water, watermarks, particles and organic residues. Older technologies such as spinning the wafers rapidly or heat drying can no longer fulfill the requirements of high density electronic […]