Using RCA Clean in a Wet Bench Process

Using RCA Clean in a Wet Bench ProcessBefore processing a silicon wafer under high temperatures, semiconductor process engineers will use RCA clean as part of a wet bench process. This procedure removes organic residue from a silicon wafer and replaces the surface layer of oxide with a thin, new layer. The application of two chemical solutions, SC-1 and SC-2, make up this process.

SC-1 removes impurities attached to silicon, quartz and oxide surfaces in a 15 minute soak. In addition, it initiates the regeneration of surface oxide layers. The mixture consists of:

  • 1 part NH4OH (ammonium hydroxide)
  • 1 part H2O2 (hydrogen peroxide)
  • 5 parts deionized (DI) water.

After an SC-1 application, cleanliness is ensured by soaking a wafer in SC-2 for 10 minutes. This mixture does not etch silicon, but targets and eliminates microscopic metal hydroxides, alkali residue and any other remaining metal. SC-2 consists of:

  • 1 part HCl (hydrochloric acid)
  • 1 part H2O2 (hydrogen peroxide)
  • 5 parts DI water

Fortunately, Modutek offers an array of wet bench equipment that support both steps of RCA clean. With a custom station, you can rinse and dry wafers in one place within 15 minutes.

Modutek Wet Bench Equipment

Modutek produces high-tech, high-yield wet bench processing equipment suited for RCA clean. Stations conserve DI water and operate with precise process controls via SolidWorks Flow Simulation software. Expedite your applications with a station designed in-house according to your specific requirements. Standard features include:

  • DI water hand spray
  • Continuous flow DI water chamber
  • Teflon N2 gun

Modutek IPA Vapor Dryer

Eliminate the need for separate rinsing and drying chambers with Modutek’s Marangoni drying system, also called an IPA Vapor Dryer. Incorporated into your wet bench, the IPA Vapor Dryer’s single chamber makes finalizing the cleaning process quick and convenient. In addition, this advanced system allows for ozone introduction in a post-solution clean. Safe and simple bottle change happens at deck level where IPA vapor precipitates inside your gallon container under level sensor protection. Additional safety features include an Emergency Power Off button and the absence of moving parts inside the drying chamber. IPA vapor distributes evenly through the top of the chamber, reducing IPA use while providing sufficient surface tension drying for all substrates and silicon wafers.

Modutek has been designing and manufacturing wet bench equipment for customers for 30+ years. Certified specialists will work with you from design to installation, ensuring you have the perfect wet bench and IPA Vapor Dryer for your cleaning and processing applications. Email sales@modutek.com or call 866-803-1533 for inquiries.