Monthly Archives: January 2014

Choose Modutek’s Quartz Baths When Safety and Reliability Are a Must

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Choose Modutek's Quartz Baths When Safety and Reliability Are a MustThe Quartz Baths designed and manufactured by Modutek Corporation are safe and reliable as well as being cost-effective so it can be integrated into your current production system. With over 30 years of experience developing and evolving the bath designs, they are seen in the industry as the quality standard of quartz baths.

Pure quartz is nearly inert and will not react with most other substances. It is for this reason quartz is the perfect choice for semiconductor processes. Not only is it non-reactive, it is also stable at relatively high temperatures. It has a Mohs hardness of 7 and lacks cleavage which enables it to handle most demanding applications.

Modutek offers different Quartz Bath Products to meet your processing needs:

The QFa Series Quartz Baths provide the following benefits:

  • Fast heating that is more even than other manufacturers
  • A nested, 4-sided heating element that heats to 360 degrees Fahrenheit with a serrated overflow barrier
  • A seamless, sloped flange design
  • Minimizes damages which could result from runaway temperatures
  • Dual safety snap switch
  • Improved up-time and reliability because of the longer vessel life
  • Easier laminar flow while it reduces particulate contamination

It can be used with a variety of chemicals including H2SO4, H202, SC1 and other chemicals. It has an operating range of 30 º – 180 ºC. The operating temperature range can be controlled in ± 1 ºC (depends on controller and process). The operating temperature range has a heat-up rate of 2 º C per minute. (This rate will be affected by the size of the system, the fluid being used and other factors.) It can be used for cleaning, etching and stripping and has a ¾” male Flaretek circulating fluid inlet/outlet.

Options include a liquid level sensor, process temperature controller, custom vessel sizes to meet your specifications, quartz diffuser plate and autolid.

The Qa Series Quartz Bath is a constant temperature quartz bath. It has redundant safety devices, seamless, sloped flange design and a bonded, 5-sided circuit heating element. Benefits include improved process yield by faster, more efficient, and even heating. It minimizes the potential damage caused by runaway temperatures. It also increases uptime and reliability because of longer vessel life.

The options available for the Qa Series Quartz Baths include having a magnetic stirrer, a gravity drain, an aspirator (dilution) valve system, remote operation timer switches, quartz bubbler, and process controller.

Both Series Quartz Baths come in a variety of sizes. If you would like to learn more about the Modutek Corporation Quartz Bath models or want a quote, you may reach us at 866-803-1533.

Modutek’s DR Series Quick Dump Rinser

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Modutek Quick Drump Rinser DR Series

Modutek’s DR Series Quick Dump Rinser

Throughout wafer manufacturing, few steps are as critical as the D.I. (deionized water) rinse cycle. In most cases, your product is exposed to more D.I. water than any other process fluid. For this reason, a truly effective rinsing system can contribute dramatically to the reduction of particles and defect densities. A considerable amount of time has been given to help you make this transaction into our DR series quick dump rinser easy and affordable. Whether it’s upgrading your existing rinsing line or installing new wet process station we have the plan that will work best for you.

Our overall DR series Quick Dump Rinser is designed with two major features. One: Easy installation into new or used equipment and two: Low DI water consumption due to our rinse features.

Modutek's Quick Dump Rinser during the spray cycleSuperior and consistent rinsing is achieved by (1) strategically located D.I water spray nozzles, (2) bottom filling (3) N2 agitation and (4) bottom fill that creates a vortex agitation in the rinse tank (optional).

The interior volume of the DR Series Quick Dump Rinser was reduced to minimum size relative to the wafer cassette. This, along with a 360˚ overflow weir and rapid dump time ensures that all large and small contaminants are quickly removed from the surface of the wafer and surrounding areas, thereby preventing recontamination of the wafer.

Modutek C15sa Rinser Controller is used in conjunction with the Quick Dump RinserModutek’s C15sa Rinser Controller is specifically designed for use with the DR Series Quick Dump Rinser wafer rinse system and provides a high degree of process flexibility. The user has the ability to program dump cycle, fill cycles, start cascade and spray delay. In addition, our C15sa controller has the ability to be programmed for resistivity and incorporates an access code which prevents tampering with the program.

In order to rinse to resistivity, the DR Series is used in conjunction with the Modutek Resistivity Monitor RM30a (optional feature). The RM30a has the ability to monitor resistivity and temperature inside the DR series rinser as well as incoming water into the wet bench. Once resistivity setting is reached inside the Quick Dump Rinser the rinse cycle discontinues at the next full level. This results in a process specific rinse, ensuring that a minimal amount of DI water is used.

Modutek Quick Dump Rinser during full rinse cycleIn addition to all of these features Modutek’s Quick Dump Rinser is designed for new or used wet bench installations. With this design you can easily upgrade your old rinser and not incur the cost of a new wet bench. The water savings and the increased throughput will help cover the cost of the overall upgrade. If you would like to learn more about Modutek’s Quick Dump Rinser and how it can improve your wafer manufacturing process, call 866-803-1533 or email [email protected].