Benefits of Using Quick Dump Rinsers for Silicon Wet Etching

Benefits for Using Quick Dump Rinsers for Silicon Wet EtchingQuick Dump Rinsers are used during the rinse cycle in the silicon wet etching process. The deionized water (DI) rinse cycle is a vital step in your wafer manufacturing process. In fact, DI water probably contacts your product more than any process solution. This makes an efficient rinsing system invaluable to particle and defect density reduction. Fortunately, Modutek Corporation offers the DR Series Quick Dump Rinser for thorough, economical cleaning. Their experienced specialists can upgrade existing rinsing modules and install fresh-from-the-factory wet bench process stations to suit your specific needs.

Features and Functionality

For optimal operations, Modutek includes two defining features into each DR Series Quick Dump Rinser: limited DI water use and easy installation into new or used stations. These properties complement complete rinsing enhanced by:

  • Ergonomic DI water spray nozzles
  • N2 agitation
  • Bottom filling
  • Optional rinse tank vortex agitation
  • Dual overhead spray manifolds

In addition, Modutek has reduced the interior volume of their Rinsers to suit the size of your wafer cassettes. This design expedites dump time through a large, machined dump door and utilizes a surrounding overflow weir to remove all contaminates while preventing recontamination on wafer surfaces.

A Compatible Controller 

Complete your DR Series Quick Dump Rinser with Modutek’s compatible C15sa Rinser Controller. Designed specifically for the wafer rinse module, the controller provides convenience with a high degree of adjustability. Engineers program the fill and dump cycles and initiate cascade and spray delay at the click of a button. Safety features include access code-protected resistivity to prevent unwanted changes to the program.

A Monitored Rinse

Use the Modutek Resistivity Monitor RM30a with the DR Series wafer rinse system for a meticulous oversight of your cleaning process. Along with measuring resistivity, the optional RM30a monitors in flowing water into your wet bench station and internal temperatures of the DR Series rinse system. For minimal DI water consumption, rinse cycles automatically finish after reaching the resistivity setting. This ensures a fully adjustable, conservative rinse.

Whether you desire to upgrade your old rinse system or customize a new wet bench, the Modutek DR Series Quick Dump Rinser installs seamlessly. Even if you choose the latter, Modutek’s rinse system design ensures you save money on water costs throughout years of operation. Also don’t forget to consider increased throughput on all of your manufacturing projects.

Modutek has over 30 years of experience in providing reliable wet bench equipment for all processes in silicon wet etching. Certified specialists will guide you through from design to installation and can provide a free quote on equipment to meet your specific requirements. Call Modutek at 866-803-1533 or an email to