Modutek, a leading provider of leading-edge wet benches and wet process equipment, will have a factory representative at the Semicon Conference in Shanghai China from March 15-17, 2016. Modutek will be with their China Rep Laserwort located in Hall N3 at booth 3401. Information about the Semicon Conference can be referenced at http://www.semiconchina.org/ and details on Modutek’s attendance at the conference can be referenced at: Modutek at Semicon Conference in China
Stop by the Modutek /Laserwort booth to get information and answer any questions you have about Automated, Semi-Automated and Manual Wet Process Stations used for acid/base, solvent and ozone cleaning or photo resist strip. Modutek also provides IPA vapor drying and Megasonic cleaning equipment to support your manufacturing applications. In addition environmentally friendly acid neutralization systems and air scrubbers are available with all their equipment.
Additional details on some of Modutek’s products are listed below:
- Fully-automated Wet Bench Equipment
- Benefits include:
- Full automation control with touch screen
- SolidWorks Simulation Professional software
- SolidWorks Flow Simulation software
- Servo motor automation
- All robotics and software designed in house
- Complete design, assembly and test done according to your specifications
- Benefits include:
- Semi-automated Wet Bench Equipment:
- Benefits include:
- Automation control with touch screen
- SolidWorks Simulation Professional software
- SolidWorks Flow Simulation software
- Servo motor automation
- All robotics and software designed in house
- Complete design, assembly and test done according to your specifications
- Benefits include:
- Manual Wet Bench Equipment:
- Benefits include:
- High end manual equipment at competitive pricing
- Meets or exceeds all current safety standards
- Designed to meet any process requirements
- Can accommodate custom designs and processes
- Low cost of ownership
- Equipment designed for future expansion
- Benefits include:
Our fully-automated, semi-automated and manual wet bench equipment supports the following applications:
- KOH Etching
- Quartz cleaning
- Ozone Etching
- Ozone Cleaning
- SC1 & SC2 featuring Megasonic Cleaning
- BOE (Buffered Oxide Etching)
- MEMs processing
- Plating
- All solvent applications
- Hot phosphoric (Nitride Etching)
- SPM Cleaning
- Precision Part Cleaning
- IPA Vapor Dryer
- Benefits include:
- Very low IPA consumption
- No moving parts inside drying chamber which eliminates wafer breakage
- Most drying cycles completed within 10-15 minutes
- No watermarks
- Drying technology can be easily designed into your wet bench eliminating one transfer step
- Benefits include:
- The IPA Vapor Dryer supports the following applications:
- Ozone Cleaning
- Wafer Drying
Modutek has over 35 years of experience developing and building wet bench stations and wet process equipment that provides highly reliable results for precision processes. They also provide world-class service, and customer support. Call 866-803-1533 or email [email protected] for a free quote or consultation to discuss your requirements.