Sub-Ambient Systems / BOE

F Series

Filtered Sub-Ambient Circulation Bath for BOE Applications

The F SERIES sub-ambient filtered etch bath is our time-tested solution to providing continuous filtration while reducing acid consumption in your BOE (Buffered Oxide Etch) or positive resist develop processes. A low cost of ownership has been engineered into every detail of our filter etch bath, making it one of our most consistent performers.

Our F-SERIES will significantly reduce acid consumption while providing continuous 10.0 to 0.2 micron filtration for reduced particulate count & improved yields. The two basic models available are the L & H version, which are constructed of natural polypropylene & polyvinyldilene fluoride (P.V.D.F ) & will operate in the 10-60ºC range respectively. Both models will maintain precise ± 1ºC control; 0.4ºC under certain conditions. The use of our F SERIES in your BOE process will dramatically reduce acid consumption. Connection our F SERIES with our RCe heat/chiller give your BOE the sub-ambient control required. Several sizes are available which will accommodate from 1 ea. 4” up to 2ea. 6” cassettes. Numerous available options will enable you to order an F SERIES to fill your process requirements.

Benefits Include:

• Specifically designed for BOE process
• Easy installation to upgrade existing stations
• Sub ambient capability
• Micron Filtration options
• Remote pump and filter option

Features Include:

High flow pump *

• Uniform flow return system
• 360º serrated overflow weir

Ultra Efficient Filtration

• 0.2u absolute filtration
• Modutek-pioneered 360º weir for effective particulate removal.
• Will accept any 10” cartridge filter.

Semiconductor Grade Environment

• 360 degree overflow housing
• Virgin, natural polypropylene (1 model) or polyvinyldilene (P.V.D.F.).h model.
• No metals exposed to liquid or vapors.

Rugged Process Pump

• Seal-less (no mechanical seal)
• N2 purged

Uniform Flow Return System

• Eliminates inconsistent sparagers
• Provides desired consistent laminar flow across each and every wafer
• Eliminates eddys and “dead spots” created by diffuser plate.
• Removed for easy cleaning

Excellent Temperature Control

• ± 1ºC, 0.4ºC under certain conditions
• Wide range 10-60ºC, L” models, 10-80ºC, “H” models
• Digital readout

User-Friendly Servicable Components

• Easily removed pump/filter assembly (held in place by 2 each P.V.C. bolts)
• Easily changed filter, can be removed in usually less than 5 minutes
• 360ºweir assembly is easily removed for cleaning
• Threaded drain can be removed in minutes

No Cost Extras

• Clear P.V.C. cover retracts out of the way when not in use
• Remotely actuated drain

 Options:

• Remote pneumatic pump
• N2 manifold (for positive resist developing )
• Low temp flow sensor
• High temp flow sensor
• 230 V 50 HZ electrical service
• 0.1 micron filter 10-60ºC (B.O.E.)
• 0-2 micron filter 10-80ºC
• 10.0 micron filter 10-60ºC positive resist developing
• MICROTIME process timer
• .33, .5h.p. electric motors
• Pneumatic pump
• Stainless steel construction
• Informative Digital Flowmeter
  • Filter loading (plugging) indication
  • Adjustable alarm setting, will alarm when filter requires changing, (based on flow rate)
  • Filter element flow evaluation

Product-Filter Etch, Positive Resist Developer Bath

Process- Filter etching, Positive Resist Developing

Chemical Usage- NH4 HF, CH3 COOH, HNO3P. Resist Developer

Temperature Range-L Model 10-40ºC, H Model 10-60ºC1

Specifications:

Performance

• Permissible Operating Range:
  • L model 10-40ºC
  • H model 10-60ºC
• Process Temperature Control: both models ± 1ºC (.4 obtainable under certain conditions)
• Bath Liquid Stability: Internal gradients ± 0.5ºC
• Flow Rates 3.5-8 g.p.m.

Construction Materials:

• Process Module L model- Natural polypropylene
  • H model- P.V.D.F.
• Pump /Filter Housing
  • L model- Natural polypropylene
  • H model- natural P.V.D.F.
• Temperature Control Coils
  • L model- PFA
  • H model- PFA

“O” Rings: Viton is standard, other materials available
Drain: Natural polypropylene or Teflon
Cover: Clear P.V.C
Note: There are no exposed metals

1. Motor: .125 h.p. standard (.33 and .5 available, please note size and configuration will change if ordered).
2. Filter Housing: Will accept any 10” cartridge filter.
3. Removable Protective Shroud: protects pump motor.
4. N2 Purge Fitting: Creates positive N2 atmosphere to protect motor.
5. Removable Pump/Filter Assembly: Held in place by two each P.V.C. screws for fast replacement.
6. Power Cord: Acid Resistant.
7. Housing: Rotomolded, seamless design
8. Temperature Control Coils: For circulating temperature-controlled media (corrugated polypropylene or P.V.D.F. ).
9. Flow Sensor: For determining filter loading (optional)
10. Drain Valve: Pneumatically, remotely actuated (standard).
11. Temperature Control Coils: To appropriate temperature control circulator.
12. Inner Process Tank: Isolated, perforated for uniform flow, 360º overflow for effective particulate removal.
13. Process Thermocouple: From temperature control circulator, Teflon encapsulated for long life.
14. Process Cover: Clear P.V.C., retractable, hide-away.

F Series Dimensions Table

Model nomenclature: model code, number of cassettes and size of cassettes. eg. QFa26(QFa series-2-6”)
Note: Add approximately 4” for drain on overall depth