How the Ozone Cleaning Process Improves Silicon Manufacturing Yields

How the Ozone Cleaning Process Improves Silicon Manufacturing YieldsA process that uses ozone with water or with a mild acid can clean, strip and etch wafers more rapidly and at lower cost than traditional processes. Modutek’s proprietary Advanced Ozone Cleaning Process eliminates the use of expensive chemicals while improving process performance and reducing environmentally harmful waste.

Modutek provides custom designed equipment to meet the specific requirements of customers and offers an ozone cleaning process as a solution for better silicon wafer manufacturing yields. The patented technology can replace traditional methods that use expensive chemicals and high temperatures with a room-temperature process that is environmentally friendly.

How the Ozone Cleaning Process Works

Modutek’s ozone cleaning process provides cleaner silicon wafers with reduced particle counts. For example, in Modutek’s DryZone solvent gradient dryer, the patented process rinses substrates with deionized water to remove water-miscible inorganic impurities and then exposes them to ozone in an ozone chamber. All traces of organic materials are converted to carbon dioxide. The resulting substrate surfaces are free from particles, moisture and trace organic materials and are stable hydrophilic surfaces.

For silicon wafers, the surfaces are Si-O terminated. If hydrophobic, Si-H terminated surfaces are required, a ten second post-ozone process can complete a conversion. Because the dryer uses reactive chemistries, it is particle-reducing rather than just particle-neutral.

In Modutek’s Organostrip process, wafers are exposed to an ozonated organic solvent at room temperature. The company’s technology produces very high ozone solubility in the liquid. The process results in a fast resist removal and it is compatible with all metals tested, including aluminum, copper, gold, tantalum, titanium and tungsten.

In all the Modutek ozone cleaning processes, the exact chemistry is delivered to the point of use in compact equipment that requires fewer steps and a smaller number of tanks than conventional wet benches. In contrast to traditional solvent processes, the ozone process solution has a longer useful lifespan and results in a more benign discharge. Available ozone processes include resist removal, surface preparation and final clean.

Advantages Compared to the Piranha Process

A commonly used conventional acid process is the sulfuric acid and hydrogen peroxide based Piranha process. Key advantages of the ozone cleaning process over the Piranha process include:

  • More rapid processing: Batches of 100 wafers and a rate of 6 batches per hour per process tank allow silicon manufacturing facilities to achieve a higher throughput.
  • Better compatibility: The Piranha process is not compatible with most metals while the Modutek ozone cleaning process has broad compatibility.
  • Fewer particles: The number of particles left on wafers processed with the Modutek ozone cleaning systems is extremely low while Piranha leaves particles on the surfaces.
  • Better safety: The Piranha process operates with highly corrosive chemicals heated to 130 degrees C. The Modutek ozone cleaning systems work at room temperature without harsh chemicals.
  • Lower equipment cost: With fewer tanks and process steps, the Modutek ozone cleaning systems can cost substantially less than a Piranha installation
  • Lower operating costs: Piranha process chemicals are up to twice as expensive as Modutek ozone cleaning chemicals. The total cost of ownership of a Piranha installation is much more than that of an ozone station.

Modutek can evaluate the needs of a silicon manufacturing facility and offer appropriate solutions. The new ozone technology increases manufacturing yields by reducing contaminants and can reduce overall costs. If you want a free consultation or quote on using Modutek’s ozone cleaning process to improve your manufacturing yields, call 866-803-1533 or email [email protected].

Tips on Selecting the Right Options for Your Wet Bench Equipment

Tips on Selecting the Right Options for Your Wet Bench EquipmentModutek wet benches are of white polypropylene construction with 304 stainless steel construction available for solvent applications. The company will build any size and length to meet customer requirements. Safety features include safety interlocks, PVC safety shields, emergency power off mushroom buttons and wiring to NFPA 70 and 79. All models have a Teflon N2 gun, a deionized water hand spray and a continuous flow deionized water manifold.

Fully Automated Stations

Modutek’s fully automated wet bench stations use SolidWorks Simulation Professional and SolidWorks Flow Simulation software to optimize the semiconductor fabrication processes and improve performance. The cost of the units covers the basic station and robotics to handle automated operation. These wet process stations are suitable for customers who need high yields, improved etch rates, better throughput and who want the highest output quality.

In addition to increased performance, fully automated stations eliminate human operator error in calculating the chemical dosage and operating the station. The automated system tracks chemical usage to reduce waste and maintain a consistent process environment. Once programmed, the automated station runs the same software and the process is fully repeatable.

Semi-Automated Stations

The semi-automated stations give customers the advanced features and precision of fully automated stations without having to pay the fully automated price. Stations have a graphic user interface on a PCL touch screen to control servomotors with three degrees of freedom and with encoder feedback. Customers can get process uniformity and accurate handling while saving money.

Modutek semi-automated stations are an excellent option for customers who want the precision of robotic controls without paying for full automation. The semi-automated stations still use the SolidWorks Professional and Flow software packages to ensure customers achieve excellent results while spending less.

Manual Stations

Manual wet benches are a cost effective way for customers to get the safety features and operating characteristics of the Modutek wet process equipment family with competitive pricing and an overall low cost of ownership. The manual stations are an effective way for customers to start using wet process equipment and they can later expand the units to add automation options. The manual equipment is of the same quality as the automated stations and delivers excellent performance without the cost of robotics.

Solvent Stations

For solvent stations Modutek uses a 304 stainless steel construction with fire suppression. Solvent stations are available with the same fully automated, semi-automated or manual options as the other wet processing stations and they share the same advanced features. Solvent stations are for customers who have applications with acetone or IPA or who want to carry out photo resist stripping or EDP etching.

Dry to Dry Wet Process Equipment

Modutek’s Dry to Dry equipment saves time by eliminating transfers and increases throughput and yield. It uses an IPA dryer to avoid having to dry in a separate tool. The same automation options as for other wet processing equipment are available for the Dry to Dry models. The unit is a convenient option for customers who want to simplify their process and increase output.

Custom Options

Because Modutek designs and produces all wet benches and related equipment in house without subcontracting, the company can use in house expertise to develop custom solutions for particular applications that may not fall within the standard option set. Customers can be assured that, no matter what the wet process application, Modutek engineers can propose a custom solution if the broad range of standard options is not suitable. For more information or for a free quote contact Modutek at 866-803-1533 or email [email protected].

Modutek’s Wet Bench Design Process

Modutek's Wet Bench Design ProcessIn an effort to meet the highest customer expectations, Modutek has developed a wet bench design process that emphasizes collaboration with customers and dedicates the full resources of the company to identifying and satisfying customer requirements. Key features of the process are an emphasis on quality, an orientation toward partnering with the customer, a project-based account management structure and the use of the latest design tools. With this approach to wet bench equipment design, Modutek intends to ensure that the company meets the highest levels of customer satisfaction.

Design Goals

While meeting and exceeding customer expectations is the overall goal, Modutek emphasizes wet bench process results as well. A high-quality wet bench must be designed for high throughput with a long service life and a low level of downtime. High product quality requires a high level of extremely precise control. Based on these essential features, Modutek starts a conversation with the customer to identify his particular needs.

Partnership Design Program

To begin with the process, Modutek technical personnel gather all the details of their customer’s application. Specifications, data, descriptions and parameters are collected to allow Modutek to understand the customer’s business. The company can then develop the criteria for a successful design together with the customer. The business needs for wet benches, wet process tools, chemical delivery systems or custom semiconductor equipment are explored in detail. At the end of this process the requirements for a successful design are clear.

Design Tools

Once the design requirements have been identified together with the customer, Modutek uses advanced tools to help with design and modeling. Three dimensional design tools ensure precision and the accuracy of the models. Such 3-D designs are created for all wet process and chemical delivery systems, to show the positions of all components and to form the basis for a detailed design review. Once approved, the same material is used to create complete documentation, including post installation maintenance manuals. Using a single set of designs to generate all the documentation ensures that performance is always consistent, even when many units are produced.

Project Management

To execute the production as specified in the designs, Modutek focuses on managing accounts as projects. For each order, the company assigns a dedicated project manager to lead the work. He coordinates with the customer to make sure the design, engineering, manufacturing and integration remain on track. Delivery and installation at the end of the project are handled the same way. The project manager is responsible for ensuring basic technical requirements are met and the customer’s input is respected, leading to a high quality design that meets the customer’s needs.

Factors for a Successful Design Process

Four factors allow Modutek to offer a collaborative design process that gives superior results. First, the company has the experience and broad line of wet bench equipment to respond to a wide variety of customer requirements. Secondly, the company designs and builds all process, etching or cleaning components of its wafer fabrication equipment in house. Thirdly, all automation design is carried out in house, with Modutek engineers designing and writing the software. Lastly, Modutek’s SolidWorks Simulation Professional and SolidWorks Flow Simulation tools help design the system to get the end results specified. All of these factors must be in place for the successful implementation of the type of design process offered by Modutek, and the company works hard to ensure these prerequisites are retained in order to deliver the superior customer-centric service they make possible.

If you need wet bench equipment designed and built for your specific process requirements, contact Modutek at 866-803-1533 or email [email protected].

How the IPA Vapor Dryer Improves Wafer Processing Time

How the IPA Vapor Dryer Improves Wafer Processing TimeImproving silicon wafer processing time and yields in a consistent and repeatable process is an on-going need among semiconductor manufacturers. Modutek’s customizable IPA Vapor Dryer design addresses the needs of facilities and process engineers who are constantly looking for ways to improve their manufacturing process. Modutek partners with your engineers to build an IPA Vapor Dryer that matches your specific requirements using SolidWorks Flow Simulation and Simulation Professional software. This system provides improved operations and drying time with one or two 150-450mm cassettes or glass substrates. For reliable performance, Modutek does not outsource the design and manufacturing of their wafer processing equipment. Equipment design, assembly, and DI water testing all occur on-site at our San Jose facility.

IPA Vapor Dryer Design

Combine rinsing and drying chambers using the Modutek IPA Vapor Dryer. This Marangoni drying system uses a single chamber to simplify the final stages in your cleaning process. Choose a freestanding cabinet or seamless integration into your current wet bench. Surface tension drying with stationary parts perfectly accommodates modern, flat substrates. In addition, potential wafer breakage and damage are essentially eliminated. This advanced system serves as your one-stop shop for IC, solar cell, fuel cell, MEMS and disk drives.

System Advantages

The IPA Vapor Dryer achieves high throughput with a variety of features and benefits. For maximum yield, our systems eliminate watermarks on substrates and hydrophilic/hydrophobic films with no feature damage. The system also provides 15-minute batch drying for most applications. In addition there is a secure system interface bottle change for quick, deck-level operations. Here, one-gallon IPA containers fill under level sensor protection. IPA consumption decreases through even vapor distribution at the top of the chamber.

Additional safety features include:

  • Overtemp protection on all heated devices
  • Teflon tubing for all wet plumbing
  • High/low flow cascade rinse
  • Touch screen interface

Optional features include:

  • Dump rinse
  • Resistivity monitor

Reliable Silicon Wafer Processing Equipment

Optimizing wafer production processes for over 30 years, Modutek supplies industry-trusted, custom wet processing equipment. Our experienced engineers and system integration specialists configure stations and software to minimize existing wet bench alterations and meet company-specific requirements. For extended customer satisfaction, all IPA Vapor Dryer stations come with a 2-year warranty. If malfunction occurs, we provide onsite service repair to minimize costs and potential production loss.

Call 866-803-1533 or email [email protected] to get answers to any questions about your specific requirements. Our team is ready to provide you with the right wafer processing equipment and support you need.

Wafer Processing Equipment That Meets Your Specific Requirements

Wafer Processing Equipment That Meets Your Specific RequirementsSemiconductor manufacturers and research facilities need to use wafer processing equipment that guarantees consistent results for continually shrinking geometries used in integrated circuits. From LED to solar panel production, semiconductor wafers require durable wet bench stations designed by the most advanced technology. Fortunately, Modutek Corporation utilizes industry-leading methods to design and manufacture silicon wafer processing equipment. They provide the experience and expertise needed to supply equipment that meets the specific requirements of process and facilities engineers across medical, military, solar, and industrial industries.

Wet Processing Manual Stations

Execute every clean room process with cost-efficient manual stations. Modutek constructs and configures stations to support base and acid applications with the utmost care. In fact, they match or surpass current safety standards and use industrial-strength polypropylene material for secure, long-lasting machines.

Semi-Automated Wet Bench Stations

Incorporate semi-automated wafer processing equipment into all your clean room applications to balance precision and control. Modutek utilizes touch screen controls, servo motor robots, and three degrees of flexibility to provide complete turnkey support for companies that want a lower cost alternative from the fully-automated station. SolidWorks Simulation Professional and Flow Simulation Software remain developed in-house for seamless compatibility.

Fully-Automated Wet Bench Stations

Reduce machine intervention with convenient, fully-automated wet bench stations. For increased throughput and company efficiency, there’s no better choice. From design to installation, we meet your specific requirements in both station size and software. Enjoy standard features such as PVC safety shields, Emergency Power Off (EPO), and a 12-month warranty on all station parts. Optional features include:

  • Rear access
  • Stainless steel construction
  • Complete Teflon plumbing
  • Overhead deck lighting
  • CO2 fire suppression

The Rotary Wafer Etching System

Etch, develop, strip, and clean with the Rotary Wafer Etching System for efficient batch processing. The space-saving, dual wet tank construction enables a 3 second transfer from process to rinse. In addition, continuous rotation reaches speeds up to 80 revolutions per minute. Multiple wafer sizes remain easily manageable in a freestanding design.

Silicon Wafer Cleaning Equipment

Serving engineers across numerous silicon wafer dependent industries for over 30 years, Modutek specializes in all types of wafer processing equipment. Our certified specialists configure every detail to match your specific processing needs. In the event of malfunction, we prevent the hassle of business interruptions and shipping costs by supplying onsite service repair.

Email [email protected] or call 866-803-1533 to receive immediate, trustworthy assistance. Our team stands by for your company support. We’ll supply additional information, answer any design or installation inquiries, and provide a free quote.

Using RCA Clean in a Wet Bench Process

Using RCA Clean in a Wet Bench ProcessBefore processing a silicon wafer under high temperatures, semiconductor process engineers will use RCA clean as part of a wet bench process. This procedure removes organic residue from a silicon wafer and replaces the surface layer of oxide with a thin, new layer. The application of two chemical solutions, SC-1 and SC-2, make up this process.

SC-1 removes impurities attached to silicon, quartz and oxide surfaces in a 15 minute soak. In addition, it initiates the regeneration of surface oxide layers. The mixture consists of:

  • 1 part NH4OH (ammonium hydroxide)
  • 1 part H2O2 (hydrogen peroxide)
  • 5 parts deionized (DI) water.

After an SC-1 application, cleanliness is ensured by soaking a wafer in SC-2 for 10 minutes. This mixture does not etch silicon, but targets and eliminates microscopic metal hydroxides, alkali residue and any other remaining metal. SC-2 consists of:

  • 1 part HCl (hydrochloric acid)
  • 1 part H2O2 (hydrogen peroxide)
  • 5 parts DI water

Fortunately, Modutek offers an array of wet bench equipment that support both steps of RCA clean. With a custom station, you can rinse and dry wafers in one place within 15 minutes.

Modutek Wet Bench Equipment

Modutek produces high-tech, high-yield wet bench processing equipment suited for RCA clean. Stations conserve DI water and operate with precise process controls via SolidWorks Flow Simulation software. Expedite your applications with a station designed in-house according to your specific requirements. Standard features include:

  • DI water hand spray
  • Continuous flow DI water chamber
  • Teflon N2 gun

Modutek IPA Vapor Dryer

Eliminate the need for separate rinsing and drying chambers with Modutek’s Marangoni drying system, also called an IPA Vapor Dryer. Incorporated into your wet bench, the IPA Vapor Dryer’s single chamber makes finalizing the cleaning process quick and convenient. In addition, this advanced system allows for ozone introduction in a post-solution clean. Safe and simple bottle change happens at deck level where IPA vapor precipitates inside your gallon container under level sensor protection. Additional safety features include an Emergency Power Off button and the absence of moving parts inside the drying chamber. IPA vapor distributes evenly through the top of the chamber, reducing IPA use while providing sufficient surface tension drying for all substrates and silicon wafers.

Modutek has been designing and manufacturing wet bench equipment for customers for 30+ years. Certified specialists will work with you from design to installation, ensuring you have the perfect wet bench and IPA Vapor Dryer for your cleaning and processing applications. Email [email protected] or call 866-803-1533 for inquiries.

Tips for Selecting the Right Wafer Fabrication Equipment for Your Application

Tips for Selecting the Right Wafer Fabrication Equipment for Your Application

Selecting the right wafer fabrication equipment for your company’s manufacturing requirements is an important decision. Whether you manufacture solar panels, semiconductors, or LED displays, it’s necessary to have a reliable wet bench station constructed by an experienced wet process equipment provider. From the military industry to the medical industry, process and facilities engineers need to consider five factors before selecting an appropriate bench.

High Quality Control Standards and Safety

Due to repeated use, wet bench stations should be both durable and safe. Modutek Corporation ensures equipment meets both conditions by minimal outsourcing of their design and manufacturing process. In addition, all stations come equipped with a chemical fume hood that efficiently expels hazardous chemicals. Testing at their facilities in San Jose, CA confirms functionality and compliance with all current safety standards.

Custom Fabrication Options

Production rates increase when wet bench stations are tailor-made according to your requirements and application. Modutek utilizes PFA, Halar, PVDF and PVC-C welding expertise to construct a station that makes meeting prototype specifications effortless. Modutek specializes in custom designs, providing numerous features for etching, plating, and cleaning. These include:

  • SolidWorks Flow Simulator software
  • Stainless steel construction
  • Teflon plumbing
  • Overhead deck lighting
  • CO2 fire suppression
  • Rear access

Wafer Size

Consider your specific applications and the wafer or substrate sizes a wet bench can handle before making a purchase. Modutek’s selection of wet bench stations process wafer sizes up to 12” and glass solar panels up to 30” x 60”.

A Full Service Vendor    

Don’t settle for off-site service and repair. Wafer fabrication equipment vendors should eliminate the issue of shipping faulty wet benches and related equipment. Fortunately, if your wet bench requires maintenance, Modutek’s specialists come to you. Receive a diagnosis and schedule a convenient repair over the phone.

A Devoted Vendor with a Wide Selection

Whether you need a fully-automated, semi-automated, or manual wet bench, you want a vendor that employs quality resources and expertise to create them all. Modutek offers all three types of stations that are customized according to your requirements.

Fully-Automated Wet Benches

Enjoy a hands-off approach with fully-automated wet process stations. These are available in any size from Modutek. Standard features include Emergency Power Off (EPO) and a one year warranty on all parts.

Semi-Automated Wet Benches 

Etch and clean with precise semi-automatic wet benches. Modutek incorporates servo motor automated robots with touch screen controls in all of their semi-automatic stations. This supplies you with three degrees of flexibility for any processing need. In-house development gives you full turnkey support and the same consistency found in advanced, fully-automated systems.

Manual Wet Benches

Use manual wet benches to reduce the price of using robotics in your clean room applications. Modutek’s standard benches include all the safety features found in automated systems and support both acid and base processes with white polypropylene construction.

Modutek’s Experience

Modutek has built and supplied custom wafer fabrication equipment for 30+ years. Certified specialists work with you from design to final installation and supply future assistance through field service repair. Email [email protected] or call 866-803-1533 for a free quote.

How Standard Clean Particle Removal (SC1 Clean) is Supported in a Wet Bench Process

How Standard Clean Particle Removal (SC1 Clean) is Supported in a Wet Bench ProcessSC1 Clean is the first step in the RCA clean, the procedure required before the high-temperature processing of silicon wafers. Organic impurities attached to silicon, oxide and quartz surfaces by the solvating and oxidizing actions of NH4OH and H2O2 respectively are eliminated by the particle removing solution, SC1 Clean. This solution starts a slow regeneration process whereby the silicon wafer’s original surface layer of oxide is broken down and replaced with a new layer. This regeneration process is a highly significant part of particle removal.

SC1 solution is used at 75 or 80°C for approximately 10 minutes. It is composed of:

  • 5 parts deionized water
  • 1 part NH4OH
  • 1 part H2O2

The cleaning procedure begins by heating a mixture of the deionized water and NH4OH up to 75°C. Then, add H2O2 and allow the mixture to bubble violently before using. The silicon wafer will then be soaked in the solution for 15 minutes. After, rinse the silicon wafer in a container of deionized water in order to clean off the solution. You should change the water several times in order to prevent any removed residue from clinging back on to the surface of the silicon wafer. Remember, with the new oxide layer on the surface comes ionic contamination that should be cleaned off in the following steps of the RCA clean.

Modutek Megasonic Cleaning Equipment and Features

The particular demands of the semiconductor, FPD, hard disk, solar and crystal industries are met by Modutek’s precision megasonic cleaning system. In addition, partnering with Kaijo Corporation allows Modutek to supply engineers with cutting-edge high precision cleaning technology.

You can clear 0.1 µm particles while working up to 140°C with Modutek’s Indirect (MSI Series) bath design. Or, Modutek’s Direct (MSD Series) can give you identical results with the Teflon coated Megasonic transducer. Placed in the tank, the transducer plate is ideal for using SC1 Clean and is easily accessible for installation and upgrades. With the help of Modutek’s engineers, your manufacturing equipment will be designed to work according to the requirements of your application.

Modutek’s Megasonic cleaning features include:

  • Automatic frequency tracking system
  • High efficiency generator
  • Upper and lower limit controls
  • Available frequencies: 950kHz, 2MHz, 750kHz, 430kHz and 200kHz

Modutek’s Experience

Modutek has been in the business of supplying semiconductor manufacturing equipment for 30+ years. This history is sustained by associates who will work with you from design to final installation. For a free quote call 866-803-1533.

How to Develop a Requirements List When Buying Wet Bench Equipment

How-to-Develop-a-Requirements-List-When-Buying-Wet-Bench-EquipmentChoosing the right wet bench equipment is a huge challenge for a manufacturing company or research facility. The equipment represents a major investment and you don’t want to spend a lot of money to find out the system doesn’t meet all your requirements. Secondly, the complex nature of wet bench equipment often makes the selection process even more difficult. In many cases, wet benches are designed to handle specific processes for wafer manufacturing. You need to insure that the equipment can support all your chemical processing and through put requirements.

That’s why you need to carefully evaluate your needs as you prepare to buy a wet bench. Below are 7 things you need to consider when buying wet bench equipment.

  • Wafer or substrate size

Before you even think about the equipment you want to buy, consider what wafer or substrate sizes it can handle. Different applications utilize different processes and wafer sizes, which applications do you need? Fortunately Modutek’s wet bench stations can handle all manufacturing process and wafer sizes up to 12″, whichever wet station you choose; manual, automated, or semi-automated.

  • Cassettes per bath

How many wafer cassettes per bath can the wet bench equipment hold? Some equipment can hold 2 wafer cassettes per bath; others can only hold one cassette per bath. An even more important feature is how the wafers are moved between baths. In some equipment, the movement is manual while in others it is automatic.

  • Is FM approval required?

FM Global Standards form the basis approval assessment of manufacturing equipment used in the semiconductor industry. It is a general understanding in the industry that equipment addressed as FM Standard are custom built rather than produced in mass. The manufacturer’s ability to produce consistently standard products is assessed on a regular basis during FM Approval’s product follow-up program.

  • Is CO2 fire system required?

Considering the fire risk posed by wet bench processes when solvents are used, most manufacturers fit their equipment with fire extinguisher systems. A common trend is to fit the equipment with CO2 fire suppression systems (Acid benches do not require CO2). See if the fire extinguisher suppresses fires without leaving behind foam, water, or dry chemical that may damage sensitive equipment parts.

  • Is a third party electrical inspection needed?

SEMI S2, CE, and 3rd party tests are an excellent way to test your system for consistency and efficiency. Modutek uses SEMI S2, NFPA, and NEC as guidelines in manufacturing wet processing equipment and can also provide a quotation for inspection reports as requested. You’re guaranteed that all systems will pass 3rd party electrical inspections.

  • Wafer volume requirements per day/week

How many wafers do you expect to process per day/week? As most process engineers have discovered, Modutek’s dry-to-dry wet processing equipment eliminates the need to dry using a separate tool. Fitted with an MVD Series IPA Dryer, the equipment shortens overall manufacturing process allowing for greater yield per unit time.

  • Exhaust/chemical fume hood filtration requirements

Since hazardous fumes are produced in wet bench process, an exhaust mechanism is critical to all processes. Modutek provides a chemical fume hood that gives you a quick and low cost means to dispose of hazardous chemicals from the work station. Featuring white polypropylene construction for base and acid processes and stainless steel construction for solvent applications, the fume hoods are easy to install and set up, low cost, and meet or exceed all safety standards.

Summary

Remember that you always have the choice of manual, semi-automatic, and automatic wet bench stations. Other factors you may need to consider include: pump requirements, in-line heater needs, and station layout. For more information, contact Modutek on 866-803-1533 or 408-362-2000.

Modutek Featured at Semicon Conference in China

Modutek-Featured-at-Semicon-ConferenceModutek, a leading provider of semiconductor manufacturing equipment and wet bench stations, will have a factory representative at the Semicon Conference in Shanghai China in Hall W3 at booth 3243. The conference will be held from March 17-19, 2015 and will be attended by a large number of exhibitors in the semiconductor manufacturing industry. Details and information about the Semicon Conference can be viewed on their site at http://www.semiconchina.org/.

Modutek will provide information and can answer questions about their manufacturing equipment with Laserwort who is their local Rep in China. Information about the following products will be provided at the conference:

  • Semi-automated Wet Bench Equipment:
    • Benefits include:
      • Servo motor automation
      • Automation control with touch screen
      • All robotics and software designed in house
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
  • Fully-automated Wet Bench Equipment
    • Benefits include:
      • Servo motor automation
      • Full automation control with touch screen
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
      • All robotics and software designed in house

The semi-automated and fully-automated wet bench equipment supports the following applications:

  • MEMs processing
  • KOH Etching
  • Ozone Etching
  • Ozone Cleaning
  • Precision Part Cleaning
  • SC1 & SC2 featuring Megasonic Cleaning
  • Quartz cleaning
  • BOE (Buffered Oxide Etching)
  • SPM Cleaning
  • Plating
  • All solvent applications
  • Hot phosphoric (Nitride Etching)
  • IPA Vapor Dryer
    • Benefits include:
      • Very low IPA consumption
      • No watermarks
      • Most drying cycles completed within 10-15 minutes
      • No moving parts inside drying chamber which eliminates wafer breakage
      • Drying technology can be easily designed and integrated into your wet bench eliminating one transfer step

       

    • The IPA Vapor Dryer supports the following applications:
      • Ozone Cleaning
      • Wafer Drying

Modutek has over 30 years of experience designing and building semiconductor manufacturing equipment and wet bench stations to meet the requirements of customers around the world. Modutek provides world-class service, set-up, and customer support. Their Wet Benches and Wet Process equipment provides high reliable results for precision processes. Contact them by calling 866-803-1533 or by email from the site.