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Rotary Wafer Etching System

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Modutek’s Rotary Wafer Etching System, Model-SPS, offers an economical, ergonomically planned and safety oriented automated batch processor for precise chemical etching, developing, stripping, resist etching, wafer reclaim or cleaning of semiconductor wafers or substrates.

Modutek’s Rotary Wafer Etching System is a dual tank wet station which provides chemical etching or wafer cleaning and rinsing with transfer between tanks in a compact design. The operator loads the wafer boats into carrier assembly, closes the fume door and presses the START button to initiate the programmed process cycle. The carrier assembly transfers into the chemical process tank and performs the process with a continuous rotational agitation for preset time.

Rotary-Wafer-Etching-Equipment

Operation of Our Rotary Wafer Etching System

After completion of the preset process time or if process abort is selected, the carrier assembly is transferred to the rinse tank for the Quench-Quick Dump-Overflow rinse cycles. When the rinse cycle is completed, the end of the process cycle is signaled by an audible alarm. The carrier assembly continues to spin until the operator presses the RESET button at which time the carrier is moved to the unload position for removal to the drying unit.

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Benefits

Benefits

Features

Features

Specifications

Specifications

Options

Options

Benefits

Features

Specifications

Options

Modutek’s Rotary Wafer Etching System in an economical, ergonomic, and safe automated batch processor for semiconductor wafers.