Benefits of Modutek’s Semi-Automated Wet Processing Systems
Modutek’s semi-automated wet processing systems are the perfect choice for those seeking a solution that balances manual operation with the precision and consistency of automation—ensuring both innovation and efficiency for semiconductor fabrication.















































Potassium hydroxide (KOH) etching requires precise temperature control and consistent immersion timing to produce repeatable anisotropic etch profiles in silicon. Semi-automated systems are well-suited for KOH etching because the robotics ensures consistent wafer handling from bath to bath while the operator monitors and adjusts process parameters directly.
The RCA clean sequence uses SC1 and SC2 chemical steps to remove organic, metallic, and oxide contamination from wafer surfaces before critical process steps. Semi-automated wet benches support these multi-step cleaning sequences by automating wafer transfers between baths, reducing handling time and contamination risk while maintaining operator control over chemistry and timing.
Buffered oxide etch (BOE) uses a hydrofluoric acid and ammonium fluoride mixture to selectively remove silicon dioxide from wafer surfaces. Semi-automated systems provide the consistent transfer timing required for repeatable BOE results across batches, making them a reliable choice for both production and development environments.
Megasonic cleaning uses high-frequency acoustic energy to dislodge sub-micron particles from wafer surfaces without mechanical contact. Semi-automated wet benches support megasonic cleaning integration, combining automated wafer transfer with the acoustic cleaning step as part of a broader wet process sequence.
Photoresist development is a critical step in photolithography, requiring precise control over developer chemistry, temperature, and immersion time to achieve consistent pattern resolution. Semi-automated systems provide the process control and repeatability needed for development steps in both R&D and low-to-mid volume production environments.
Modutek’s semi-automated wet processing systems can be customized as needed to meet your specific wet process requirements.
A semi-automated wet bench uses robotics to move wafers between chemical baths while the operator directly controls process parameters. A fully automated wet bench handles both wafer transfer and process sequencing through programmed recipes with minimal operator intervention. Semi-automated systems are a cost-effective middle ground for facilities that need consistent wafer handling but prefer hands-on process control over full recipe automation.
A PLC, or Programmable Logic Controller, is the control system that manages the automated functions of the wet bench, including robotic transfer sequencing, safety interlock monitoring, and process timing. On semi-automated systems, the PLC is paired with a touchscreen GUI that gives operators real-time visibility and control over the process without requiring manual programming expertise.
Servo motors with encoder feedback allow the robotic transfer arm to position wafers with high repeatability and precision. Unlike pneumatic systems, servo-driven arms can be programmed for variable speed and positioning, which reduces wafer stress during transfer and improves consistency across process cycles, particularly for fragile or thin wafers.