Megasonic Cleaning Equipment
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Megasonic Cleaning Equipment delivers precision cleaning that meets the unique requirements of the Semiconductor, FPD, Hard Disk, Solar, and Crystal industries. Modutek works directly with Kaijo Corporation, the world leader in Megasonic cleaning systems technology. This gives us the opportunity to offer the latest Megasonic cleaning advances, like the new Kaijo Quava Megasonic cleaning system generator.
Modutek’s Megasonic Cleaning Equipment offers a precision cleaning system developed for unique requirements for the Semiconductor, FPD, Hard Disk, Solar, and Crystal industries. We work directly with Kaijo Corporation, the world leader in Megasonic cleaning systems technology. This gives us the opportunity to offer the latest Megasonic cleaning advances like the new Kaijo Quava Megasonic cleaning system generator.
How Megasonic Cleaning Works
Megasonic cleaning removes sub-micron particles from wafers and substrates using high-frequency acoustic energy transmitted through a cleaning liquid, typically SC1 or a similar chemistry. A transducer sends rapid pressure waves and acoustic streaming across the wafer surface, and that motion dislodges particles too small or too strongly bound for chemistry alone to remove. Because the frequency is much higher than conventional ultrasonic cleaning, the energy is gentle enough for delicate device features while still clearing contamination down to 0.1 micron, where aggressive ultrasonic cavitation would risk damage.
Modutek builds megasonic cleaning equipment in two configurations. The indirect MSI Series uses a bath design that removes 0.1-micron particles and operates at temperatures up to 140°C. The Direct MSD Series places a Teflon-coated megasonic transducer plate directly in the tank, making it well-suited for quick installation or upgrades to an existing bath and ideal for SC1 applications, with a maximum temperature rating of 70°C. In either case, Modutek’s engineers design, build, and test each system in-house at the San Jose, California, facility and configure it to your cleaning chemistry, particle target, and temperature requirements.
Benefits
- Removes sub-micron particles down to 0.1 micron
- Gentle enough for delicate device features, unlike aggressive ultrasonic cavitation
- Direct MSD Series can be added to an existing tank for a quick upgrade
- Indirect MSI Series operates at temperatures up to 140°C
- Well-suited to SC1 and other particle-removal chemistries
- Built around proven Kaijo megasonic transducer technology
Features
- Indirect (MSI Series) bath design for 0.1 micron particle removal
- Direct (MSD Series) Teflon-coated transducer mounted in-tank
- MSI operation at temperatures up to 140°C
- MSD operation rated to 70°C maximum, ideal for SC1
- Kaijo megasonic technology, including the Quava megasonic generator
- Engineered for semiconductor, FPD, hard disk, solar, and crystal applications
- Designed, built, and tested in-house at Modutek's San Jose facility
Specifications
- Two configurations: Indirect MSI Series and Direct MSD Series
- MSI Series particle removal: 0.1 micron
- MSI Series temperature: up to 140°C
- MSD Series: Teflon-coated transducer plate located directly in the tank
- MSD Series temperature: 70°C maximum
- Compatible with SC1 cleaning chemistry
- Kaijo Quava megasonic cleaning system generator available
Applications
- RCA and SC1 Particle Removal
- Post-CMP Cleaning
- Pre-Diffusion and Pre-Deposition Cleaning
- FPD, Solar, Hard Disk, and Crystal Cleaning
Benefits
- Removes sub-micron particles down to 0.1 micron
- Gentle enough for delicate device features, unlike aggressive ultrasonic cavitation
- Direct MSD Series can be added to an existing tank for a quick upgrade
- Indirect MSI Series operates at temperatures up to 140°C
- Well-suited to SC1 and other particle-removal chemistries
- Built around proven Kaijo megasonic transducer technology
Features
- Indirect (MSI Series) bath design for 0.1 micron particle removal
- Direct (MSD Series) Teflon-coated transducer mounted in-tank
- MSI operation at temperatures up to 140°C
- MSD operation rated to 70°C maximum, ideal for SC1
- Kaijo megasonic technology, including the Quava megasonic generator
- Engineered for semiconductor, FPD, hard disk, solar, and crystal applications
- Designed, built, and tested in-house at Modutek's San Jose facility
Specifications
- Two configurations: Indirect MSI Series and Direct MSD Series
- MSI Series particle removal: 0.1 micron
- MSI Series temperature: up to 140°C
- MSD Series: Teflon-coated transducer plate located directly in the tank
- MSD Series temperature: 70°C maximum
- Compatible with SC1 cleaning chemistry
- Kaijo Quava megasonic cleaning system generator available
Applications
- RCA and SC1 Particle Removal
- Post-CMP Cleaning
- Pre-Diffusion and Pre-Deposition Cleaning
- FPD, Solar, Hard Disk, and Crystal Cleaning
Benefits
- Removes sub-micron particles down to 0.1 micron
- Gentle enough for delicate device features, unlike aggressive ultrasonic cavitation
- Direct MSD Series can be added to an existing tank for a quick upgrade
- Indirect MSI Series operates at temperatures up to 140°C
- Well-suited to SC1 and other particle-removal chemistries
- Built around proven Kaijo megasonic transducer technology
Features
- Indirect (MSI Series) bath design for 0.1 micron particle removal
- Direct (MSD Series) Teflon-coated transducer mounted in-tank
- MSI operation at temperatures up to 140°C
- MSD operation rated to 70°C maximum, ideal for SC1
- Kaijo megasonic technology, including the Quava megasonic generator
- Engineered for semiconductor, FPD, hard disk, solar, and crystal applications
- Designed, built, and tested in-house at Modutek's San Jose facility
Specifications
- Two configurations: Indirect MSI Series and Direct MSD Series
- MSI Series particle removal: 0.1 micron
- MSI Series temperature: up to 140°C
- MSD Series: Teflon-coated transducer plate located directly in the tank
- MSD Series temperature: 70°C maximum
- Compatible with SC1 cleaning chemistry
- Kaijo Quava megasonic cleaning system generator available
Applications
- RCA and SC1 Particle Removal
- Post-CMP Cleaning
- Pre-Diffusion and Pre-Deposition Cleaning
- FPD, Solar, Hard Disk, and Crystal Cleaning
Benefits
Benefits
- Removes sub-micron particles down to 0.1 micron
- Gentle enough for delicate device features, unlike aggressive ultrasonic cavitation
- Direct MSD Series can be added to an existing tank for a quick upgrade
- Indirect MSI Series operates at temperatures up to 140°C
- Well-suited to SC1 and other particle-removal chemistries
- Built around proven Kaijo megasonic transducer technology
Features
Features
- Indirect (MSI Series) bath design for 0.1 micron particle removal
- Direct (MSD Series) Teflon-coated transducer mounted in-tank
- MSI operation at temperatures up to 140°C
- MSD operation rated to 70°C maximum, ideal for SC1
- Kaijo megasonic technology, including the Quava megasonic generator
- Engineered for semiconductor, FPD, hard disk, solar, and crystal applications
- Designed, built, and tested in-house at Modutek's San Jose facility
Specifications
Specifications
- Two configurations: Indirect MSI Series and Direct MSD Series
- MSI Series particle removal: 0.1 micron
- MSI Series temperature: up to 140°C
- MSD Series: Teflon-coated transducer plate located directly in the tank
- MSD Series temperature: 70°C maximum
- Compatible with SC1 cleaning chemistry
- Kaijo Quava megasonic cleaning system generator available
Applications
Applications
- RCA and SC1 Particle Removal
- Post-CMP Cleaning
- Pre-Diffusion and Pre-Deposition Cleaning
- FPD, Solar, Hard Disk, and Crystal Cleaning
Megasonic Cleaning Equipment FAQs
1.What Is the Difference Between Megasonic and Ultrasonic Cleaning?
Ultrasonic cleaning uses lower frequencies that produce strong cavitation, which cleans aggressively but can damage fine features. Megasonic cleaning uses much higher frequencies (from 950 kHz to 3 MHz) that generate gentler pressure waves and acoustic streaming, thereby removing sub-micron particles while protecting delicate device structures. This makes megasonic the preferred method for advanced wafer and substrate cleaning.
2. What Is the Difference Between the MSI and MSD Series?
The MSI Series is an indirect bath design that removes 0.1-micron particles and operates at temperatures up to 140°C. The MSD Series is a direct design with a Teflon-coated transducer plate mounted inside the tank, rated up to 70°C and ideal for SC1 applications. The MSD configuration is particularly suited to upgrading an existing bath because the transducer installs directly into the tank.
3.What Particle Sizes Can Megasonic Cleaning Remove?
Modutek megasonic systems remove particles down to 0.1 micron. Because acoustic energy acts on particles that chemistry alone cannot lift, megasonic cleaning is used where sub-micron particle counts must meet strict limits, such as pre-diffusion, post-CMP, and SC1 cleaning steps.
4.Can Megasonic Cleaning Be Added to an Existing Wet Bench?
Yes. The Direct MSD Series places its Teflon-coated transducer plate directly in the tank, allowing it to be installed in an existing bath as an upgrade rather than requiring a new system. This allows a facility to add megasonic particle removal to its current wet processing equipment with minimal disruption.
5. What Industries Use Megasonic Cleaning Equipment?
Megasonic cleaning is used in the semiconductor, flat panel display, hard disk, solar, and crystal industries. These applications all require the removal of sub-micron particles from sensitive surfaces, and megasonic energy provides the cleaning needed to avoid damaging fine features or thin films.
Contact us if you need more information on how our Megasonic Cleaning Equipment can improve your processing results or to request a quote.