Modutek Offers an Individualized Approach to KOH Etching
KOH etching is a chemical process used for the fabrication of silicon nanostructures. This etching process has been studied extensively in both research and real-world applications. Modutek provides individualized solutions for customers that want to use this process by using the KOH etching tank along with their existing wet bench equipment. All of Modutek’s KOH tanks are manufactured on site and built per your specifications. All PFA material is used for cleanliness and compatibility.
Definition of KOH Etching
Potassium Hydroxide (KOH) etching is a wet chemical etching process used to create cavities in silicon. Highly corrosive alkaline chemical compound (pH > 12) is used in conjunction with DI water and thermal regulation. The etch rate is limited; and the precision of Si etching is dependent on consistency throughout the nano chemical process. The process allows for the optimal precision of fabricating Si wafers. In addition, the KOH etching process can be automated for increased efficiency and reduction in cost.
Brief Overview of the KOH Etching Process
Benefits of KOH Etching
Dry etching processes (Hydrazine) may pose notable risk of explosion and harmful toxins. Similar to KOH, Tetramethylammonium Hydroxide (TMAH) is an isotropic wet etching process. KOH etching is a superior process as TMAH etching is slower, and TMAH etching may result in the formation of hillocks.
Advantages of Modutek’s Individualized Approach to KOH Etching
Modutek’s KOH Silicon Etch Tank is designed to decrease impurities and unwanted byproducts due to advanced welding techniques with PFA sheet material. Continual adjustments to the Si etching process are not necessary after the initial process has been established. We construct all of our products per individual customer specifications, and we routinely design products that are compatible with a customer’s existing wet bench equipment.