Specialized Wafer Etching for Critical Wet Processing Applications
Improving the performance of critical wet process applications depends on selecting wet bench processes designed for the tasks at hand. Specialized equipment can support different etching and cleaning processes and can be used to make sure that the process selected can fulfill specific application requirements. Modutek’s wet process stations are specialized for the different processes […]
Advantages of Using the KOH Etching Process
The KOH etching process uses a potassium hydroxide solution to etch silicon wafers and produce microscopic structures in the silicon. In subsequent semiconductor fabrication steps, the micro structures are used in the manufacture of integrated circuits, processors and other electronic devices. Compared to other etching processes KOH etching is comparatively safe, etches silicon rapidly and […]
How the KOH Etching Process is Improved Using Modutek’s Teflon Tanks
Among the different approaches available to foundries that create intricate integrated circuitry on semiconductor chips, etching with potassium hydroxide (KOH) is frequently preferred for the error-free mass-production that it allows. The improvement in precision that the KOH etching process brings to semiconductor fabrication is attributable in large part to the use of deionized water. When […]