Monthly Archives: October 2021

How Specialized Equipment Improves Wafer Cleaning Results

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When equipment is specially designed for a specific cleaning process, residue and particle removal from wafers can be improved. A better wafer cleaning process reduces semiconductor defects and can result in improved output quality. Specialized equipment can clean more quickly, allowing higher facility throughput. Specialized and customized equipment can be adapted for batch processing, continuous manufacturing or prototyping, improving production line performance, and reducing costs.

Specialized Equipment Delivers Specific Advantages

Modutek has developed specialized equipment that addresses issues with specific semiconductor manufacturing processes. Resulting advantages include better control of process variables, more efficient cleaning, reduced space requirements, and more flexible automation. While standard solutions are also available and are sometimes sufficient, the specialized equipment will deliver superior results in specific cases.

Piranha Etch Clean is often used for post-etch clean and for the removal of organic matter. Modutek has implemented a specialized control strategy that gives more reliable cleaning results while cutting chemical costs. The “bleed and feed” method provides tight control of temperature and chemical concentration to deliver superior cleaning performance.

A wafer cleaning process used in semiconductor manufacturing such as Piranha Clean has to take place in special tanks that are impervious to the process chemicals. Modutek’s heated quartz tanks minimize particle contamination while delivering precise temperature control. They are available in recirculating and constant temperature models are made from boron-free virgin fused quartz.

For many process steps, wafers must be carefully rinsed after cleaning. Modutek’s specialized quick dump rinsers minimize rinsing time while reducing the consumption of deionized water. Modutek’s specialized design has eliminated particle entrapment by reducing particle contamination at the rinsing stage.

After rinsing, wafers have to be dried while limiting additional particle contamination. Modutek offers IPA vapor drying stations but has developed a specialized single-chamber unit that rinses and dries the wafers without moving them to a new station. Moving the wafers exposes them to additional particle contamination and the single chamber IPA vapor dryer features extremely low particle counts.

As microscopic structures on silicon wafers become smaller and more tightly packed, a reduced particle count becomes critical for some wafer processes. Modutek’s use of Megasonic cleaning uses high-frequency sound waves in a cleaning solution to remove almost all remaining particles on wafer surfaces. The cavitation bubbles created by the sound waves can dislodge even the smallest particles, delivering an almost completely particle-free wafer.

Specialized Software Control for Automation

To control the wafer cleaning process, specialized software and automation can help deliver exactly the cleaning chemicals required while eliminating human error. Modutek uses its own SolidWorks Simulation Professional and Flow Simulation software and can adapt the programs to any process. Modutek’s wet bench stations are available in manual, semi-automatic, and fully automated versions with the automation designed to support the latest wet process technology. The specialized automation can be customized for specific applications to satisfy customer process requirements.

How Modutek’s Specialized Equipment Improves Performance

Specialized equipment can reduce particle counts, improve cleaning, reduce costs and increase production capacity. Modutek works closely with customers in a variety of industries and develops specialized wafer cleaning equipment to meet their unique needs. When additional customization is needed, Modutek can adapt equipment and software as required. Because the company designs and builds its products in-house, it can make the changes needed itself without relying on third parties.

With Modutek’s specialized equipment, customers ranging from large semiconductor manufacturers to small research labs can achieve excellent production results, especially after the additional customization that Modutek can provide. Superior wafer cleaning performance impacts all aspects of semiconductor manufacturing, from initial prototyping to full production line fabrication. Modutek can help with the choice of specialized equipment, suggest customizations, and ensure that the delivered equipment meets expectations.

Important Things to Know Before Buying a Wet Bench Station

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There are a number of process and production requirements that need to be considered before buying a wet bench station. In addition to knowing which process chemicals are needed, you also need to decide on the degree of automation and whether any customization is needed for your station. If your application requires the use of aggressive chemicals, you also need to consider chemical delivery, handling, and disposal systems. Once silicon wafers have been cleaned or etched on the wet bench station, you have to know how the rinsing and drying process will be performed while keeping contamination to a minimum. The kind of semiconductor manufacturing you’ll be carrying out determines the type of wet bench station, and how you plan to run your facility impacts many of the other decisions you’ll have to make.

The Process Determines the Type of Station

Depending on the details of the semiconductor manufacturing process you’ll be using, you may be etching or cleaning wafers with acids and bases or you may be using solvents. Chemicals such as hydrochloric acid or hydrogen peroxide are extremely corrosive and require stations made of polypropylene and tanks made of inert materials such as quartz. Stations that use solvents such as acetone or IPA are made from stainless steel and the chemicals are not as aggressive.

Chemical Handling Systems Increase Safety

When you install chemical handling systems with your wet benches, you avoid spills and eliminate human error in dosages and mixing. Chemical handling includes delivery to the process, neutralization of the chemicals after use, and safe disposal of the waste. Chemical handling systems come in many sizes and can handle a variety of tasks. An experienced manufacturer of wet process equipment can advise you regarding the best systems for your application.

Automation Can Help Improve Performance

Wet process automation can range from stations that perform a few tasks independently to fully automated stations that run the whole process by themselves. For large production runs, full automation can save time and ensure consistency. For batch processing or the development of prototypes, semi-automated stations run standardized tasks while operators take over manual control where needed. You have to decide how you are going to run your facility and whether a high degree of automation is appropriate.

Specialized Sub-Systems Can Meet Your Unique Process Needs

The complexity of semiconductor manufacturing means that each facility has unique features and special requirements. Often specialized subsystems can improve facility performance. For example, a quick dump rinser speeds up rinsing while a unit that combines rinsing and IPA vapor drying can reduce particle contamination. If particle count reduction is critical for your process, Megasonic cleaning using high-frequency sound waves can reduce particle counts to a minimum. Look at specialized sub-systems to see if you can use any of them for your process.

Customization Can Help You Get Exactly What You Need

When standard wet benches don’t quite do what you want, it’s time to work with a wet bench manufacturer that designs and builds their own equipment. When design and assembly are carried out in-house, the manufacturer has the capability to adapt standard equipment to exactly meet your requirements. It could be something simple such as a custom tank size and shape or more complex features such as special automation programming for extra process steps. Experienced manufacturers can customize your equipment and can advise you on what equipment is best suited for your application before building it to your requirements.

Modutek Has the In House Expertise and Experience

Modutek has been designing and building wet bench stations and equipment for over 40 years and can advise customers to make sure they get the equipment they need. As one of the leading semiconductor equipment manufacturers, Modutek’s in-house expertise allows them to develop the specialized sub-systems needed by customers. When considering the purchase of a wet bench station, Modutek can help you choose the equipment and make sure it operates the way you want.