Customized Table Top Chemical Process Tanks

For small operations and specialized applications requiring semiconductor fabrication capabilities it often doesn’t make sense to construct wet processing lines that produce products at volume. Table top process tanks can allow research labs, universities and start-up companies to produce single parts or low-volume output. These organizations may need proof of concept components or prototypes for testing. Small chemical process tanks deliver the capability to fabricate such products in a customized unit designed for the specialized applications.

Customization is the Key to Effective Table Top Systems

Table top chemical process tanks for specialized output are heavily customized to reflect their unique purposes. Tank size, chemicals used, controls, heating and circulation are all adapted to the particular use. Because Modutek designs and builds all of its wet bench equipment in house, the company is ideally situated to undertake the customization required for this special application. Modutek has been working with customers to provide table top chemical process tanks that are easy to install and use safely, for example under an existing fume hood. Customers can purchase a complete unit with the special features and characteristics they need.

Features and Benefits of the Modutek Table Top Systems

Modutek’s table top chemical process tanks are a further development of their wet bench Teflon tanks but other configurations are available. Specific features include the following:

  • Installation.The tanks are mobile and can be placed wherever convenient for safe operation. Sizes and shapes are fully customized to match the use and the space available.
  • Circulation.Tanks can be static or fitted with overflow circulation and filtration. Circulating tanks have a 360 degree serrated overflow weir and an all-Teflon fluid path. Both static and circulating tanks are made of all PFA Teflon.
  • Heating.Tanks are ambient temperature or temperature controlled. For heated tanks, the operating temperature is 30 to 100 degrees centigrade. The heat-up rate is 2 to 3 degrees per minute and the temperature control is accurate within plus/minus 0.5 degrees centigrade.
  • Process.The tanks are usually Teflon tanks for KOH and related wet processes. Acid and solvent process capabilities are also available.
  • Wafer Holders.The systems usually come with standard carrier sizes for single or double capacity. Custom wafer holders are available.
  • Controls.Process controllers to handle temperature and timing are available. Inputs can include level switches, temperature alarms and a drain interlock. Remote operation is also possible.

Modutek can assemble the table top unit with the required features exactly as specified by customers. Benefits include reliable and safe operation, consistent process variables and repeatable outputs and results.

Table Top Systems Designed and Built to Meet Requirements

As a leader in wet bench technology, Modutek has the in house expertise to design and build innovative semiconductor fabrication equipment such as table top chemical process tanks. The company can draw on its comprehensive line of wet bench stations to adapt standard equipment for such special applications. Because Modutek engineers and technical personnel create these customized units, the company can provide complete after sales support and repair services. Contact Modutek for a free quote or consultation to discuss your specific chemical process application requirements.

 

Improving Wafer Processing with Automated Equipment

Fully and semi-automated wafer processing equipment can help improve wafer output quality by providing consistent chemical processing dosages and timing, however these settings must be first be determined. One way to find optimal process settings is to operate in manual and then in semi-automated mode where settings can easily be adjusted. This is especially true of new process development where the exact parameters are not known. Wafer fabrication facilities can first try out initial settings in manual mode and tweak or “fine tune” them to obtain the desired output. Using semi-automated stations to run the parts of the process that are finalized while making additional adjustments gives optimal results. These can then be made permanent in a fully automatic station.

Steps for Improving the Fabrication Process

Although the overall process is known and the chemicals to be used are set, a new fabrication process may initially not work as desired. Perhaps the etching is not at the expected speed, or the results are not consistently reliable. While the effects of changing chemical concentrations and timing for bath exposure are known, the optimum variables for the specific process have to be found.

After an initial run, the problem areas can be identified and variables such as chemical dosages and timing can be adjusted. Skilled and experienced operators can carry out the fabrication steps and make changes easily on a manual station. In manual mode, the operator is completely in control and nothing happens unless the operator initiates the action. Such control can be important when determining initial settings for a new process.

Once the major parts of the new process work as expected, there may still be minor adjustments necessary to achieve targets such as faster processing, better quality output or reduced chemical use. For such adjustments, use of a semi-automated station saves time. Instead of carrying out all the steps manually, the semi-automated station can run the parts of the process that don’t need adjusting. These parts will run reliably without operator intervention, as programmed and without deviation from the correct set points. The operator can then focus on the final adjustments to optimize and then utilize fully automated wafer process equipment

Subsequent Tailor Made Full Automation

Once the parameters and variables for the desired yield and performance have been determined, a tailor-made software and automation package can be assembled. This package, in a fully automated station, reproduces the custom settings of the manual and semi-automated process steps and uses them to consistently produce the desired results. Carrying out the fine tuning of the process on manual and semi-automated stations first allows the fully automated station with the optimized settings to scale up to full production right away. The tailor-made solution for a specific new process can immediately produce the desired yields and process characteristics.

For semiconductor fabrication facilities that often bring online new processes, using manual and semi-automated stations to fine tune the process and develop a tailor-made solution can be an attractive alternative to optimization on a fully automated station. Full automation is still desirable for production runs because of the greater reliability, accuracy and reproducibility that such stations deliver. Once the optimized software and automation package is running production on a fully automated station, the station will produce consistently high-quality output, high yields, low defect rates and use chemicals efficiently.

Modutek can work closely with each customer to determine the best way of optimizing new processes. The company’s full line of wafer processing equipment including manual, semi-automated and fully automated wet bench stations lends itself to this kind of optimization to produce ideal outcomes. Wafer fabrication facilities that consistently optimize new processes can lower overall costs and improve facility performance. Contact Modutek for a free quote or consultation on selecting the right equipment to support your manufacturing process requirements.

 

Modutek at 2018 Semicon Conference in China

2018 Semicon Conference ChinaModutek Corporation, a leading provider of wet bench stations and wet process equipment, will be at the Semicon Conference in Shanghai China from March 14-16, 2018 with their factory representative Laserwort Ltd.  They will be located in Hall N2 at booth 2431. Information about the Semicon Conference can be referenced at http://www.semiconchina.org/ and details on Modutek’s attendance at the conference can be referenced at: Modutek at Semicon Conference in China

Come by the Modutek /Laserwort booth to get information and answer any questions you have about using Wet Bench Process Stations for acid/base, solvent and ozone cleaning or photo resist strip.  In addition Modutek will also provide information about the benefits of their new IPA vapor dryer with the HF last process. Modutek serves customers around the world who require any type of wet processing equipment and builds chemical delivery systems for pharmaceutical, biochemical, solar and semiconductor manufacturing.

Additional details on some of Modutek’s products are listed below:

Single Chamber HF Last IPA Vapor Dryer

Benefits include:

  • Most drying cycles completed within 10 to 15 minutes
  • Very low consumption of IPA
  • No moving parts inside drying chamber eliminating wafer breakage
  • Eliminates watermarks
  • Drying technology can be designed into wet bench eliminating one transfer step

Features include:

  • Single drying chamber for DI water rinsing and IPA vapor drying
  • On board HF metering for precision mix ratios
  • Uses an in situ HF etch process with a rinse step before the IPA drying cycle
  • Filter bypass for contamination control with no cassette contact points
  • Easy to change IPA bottles
  • Handles all process sizes (standard wafer carriers to glass substrates)

 

Fully-automated Wet Bench Equipment

Benefits include:

  • In house customization to meet customer process requirements
  • Precise automated process execution and reliable repeatability
  • Full automation control with touch screen
  • Improved yield and reduced errors
  • SolidWorks Simulation software for accurate calculation of process parameters
  • All robotics and software design designed in house
  • Complete design, assembly and test at one location to meet your specifications

 

Semi-automated Wet Bench Equipment:

Benefits Include:

  • Automation control with touch screen
  • Servo motor automation
  • SolidWorks Flow Simulation software
  • SolidWorks Simulation Professional software
  • All robotics and software designed and developed in house
  • Complete design, assembly and test at one location to meet your specifications

 

Manual Wet Bench Equipment:

Benefits Include:

  • High end manual equipment at competitive pricing
  • Meets or exceeds all current safety standards
  • Low cost of ownership
  • Designed to meet any process requirements
  • Can accommodate custom designs and processes
  • Equipment designed for future expansion

 

All wet bench equipment supports the following applications:

  • KOH Etching
  • Quartz cleaning
  • Ozone Strip
  • Ozone Cleaning
  • SC1 & SC2 (RCA Clean)
  • Megasonic Cleaning
  • BOE (Buffered Oxide Etching)
  • MEMs processing
  • All solvent applications
  • Hot phosphoric (Nitride Etching)
  • SPM Cleaning
  • Precision Part Cleaning

Modutek has over 37 years of industry experience and expertise in developing and building wet bench stations and wet process equipment that provides highly reliable results for precision processes. They also provide world-class service, and customer support. Contact Modutek at 866-803-1533 or email [email protected] for a free quote or consultation to discuss your requirements.

 

Silicon Wafer Strip Solutions for Wet Processing Equipment Applications

Silicon Wafer Strip Solutions for Wet Processing Equipment ApplicationsModutek’s extensive experience in delivering wet processing equipment allows the company to meet the particular needs of each customer. Its equipment can support a wide variety of wet bench processes and its extensive range of products can be customized to solve specialized problems for particular applications. For silicon wafer strip solutions, the company can deliver equipment to support the following applications:

Silicon Nitride Strip

The silicon nitride strip process removes silicon nitride from silicon wafers containing integrated circuits in a hot acid bath. Key factors for a high quality result are the selectivity of the bath strip solution and the repeatability of the process variables. The selectivity of removing silicon nitride while leaving silicon oxide intact must be high and the process must always deliver the same results for the same inputs.

The Modutek Nb series silicon nitride etch bath monitors bath temperature while adding DI water to maintain the acid to water ratio. The process can be tightly controlled to give excellent consistency resulting in the desired selectivity and the required repeatability.

Resist Strip

Modutek offers an advanced ozone cleaning process for photoresist strip without the use of harsh, expensive chemicals. The ozone cleaning process can strip, etch or clean silicon wafers at a lower cost than conventional technology while using an environmentally friendly and safe process.

Oxide Strip (Buffered Oxide Etch – BOE) 

The F series filtered sub-ambient circulation bath for BOE applications can cut down on acid consumption while reducing particles and improving yields. Specifically designed for BOE applications, the Modutek F series bath delivers excellent performance with a large number of options available to meet specific process requirements.

Solvent Based Resist Strip 

Modutek’s SFa series temperature controlled stainless steel recirculating baths can handle a wide variety of solvents. The baths all meet Class 1 Div 1 Group D requirements and can handle solvents such as IPA, acetone and resist strip solutions. The vessels are 316L electropolished stainless steel designed for long vessel life and operate at a temperature of up to 100 degrees Celsius. Available in a range of sizes as well as with custom dimensions, the baths are designed to handle all solvent applications.

SPM Photo Resist Strip

For photo resist strip using the sulphuric acid / hydrogen peroxide mixture SPM process, the Modutek QFa high temperature recirculation quartz baths are an ideal solution. They feature fast, even heating in a seamless, sloped flange design. Operating temperature range is 30 to 180 degrees Celsius with an approximate heat up rate of 2 degrees per minute. Process temperature control can provide an accuracy of up to plus/minus 1 degree Celsius. The quartz bath vessel is made of boron-free internally flame polished virgin fused quartz and Modutek can supply a wide range of standard and custom sizes.

Wet Processing Strip Solutions

Processing engineers considering various silicon wafer strip solutions can be confident that Modutek can supply the appropriate wet processing equipment for their application. The company has been in operation for over 35 years and provides an extensive product line of semiconductor manufacturing equipment. Their experience and expertise allows them to offer both standard equipment for common applications as well as customized solutions for applications outside the norm.

With Modutek, engineers can choose the wafer strip process they want to use, from conventional SPM, solvent or silicon nitride wet processes to the new advanced ozone technology. They can decide which is the most appropriate for their particular application. Modutek can provide recommendations on the wet processing equipment needed and also offer different options when applicable. For a free consultation or quote on selecting equipment for specific wafer strip applications call Modutek at 866-803-1533 or email [email protected].

Silicon Wafer Cleaning Solutions for Wet Processing Applications

Silicon Wafer Cleaning Solutions for Wet Processing ApplicationsModutek designs and delivers standard and customized silicon wafer cleaning equipment for semiconductor manufacturing facilities and research labs. Supported cleaning processes include RCA clean, Standard Clean 1 and 2, Piranha etch clean, and pre-diffusion clean. The company has specialized in silicon wafer cleaning equipment for over 30 years and emphasizes effective and efficient contaminant and particle removal to ensure high yields, improved throughput and high quality output.

RCA Clean

The RCA clean process is based on a cleaning method developed at RCA Corporation to remove organic residue from silicon wafers. The cleaning solution is made up of 5 parts water, 1 part 27% ammonium hydroxide and 1 part 30% hydrogen peroxide. It removes organic contaminants and leaves a thin layer of oxidized silicon on the surface of the wafer.

Standard Clean 1 and 2

The RCA cleaning process is often carried out in two steps called SC1 and SC2. The SC1 step uses the APM (ammonia/peroxide mixture) solution of the RCA cleaning method to remove organic matter and particles. The SC2 cleaning method uses a solution of hydrochloric acid and hydrogen peroxide or HPM (hydrochloric/peroxide mixture) to remove metallic ions. The two steps prepare the silicon wafer for further processing.

Piranha Etch Clean

The Piranha etch clean removes large amounts of organic material. It is used when there are visible organic contaminants such as photoresist or other hard to remove organic materials. It uses the Piranha solution, made up of a mixture of hydrogen peroxide and sulphuric acid, to clean silicon wafers and hydroxylate surfaces making them hydrophilic. Typical mixture ratios are 3 parts of sulphuric acid and 1 part of 30 percent hydrogen peroxide or higher sulphuric acid ratios of up to 7 to 1. The mixture is highly corrosive and has to be handled with special care.

Pre-Diffusion Clean

The pre-diffusion clean is the final step before the silicon wafer goes into the diffusion furnace. The wafer surfaces must be free from particles and from metallic and organic contaminants. Native oxides or chemical oxide films may have to be removed.

Depending on the nature of the contaminant, a variety of aggressive chemicals, including those from the above cleaning methods, may be used to achieve clean surfaces. Pre-diffusion cleaning is critical because particles or contaminants on the wafer surface may affect the diffusion process and result in defective or low-quality semiconductor output.

Modutek’s Silicon Wafer Cleaning Equipment

Modutek’s dual tank rotary wafer etching system provides a convenient silicon wafer cleaning solution in a compact design. Once the operator loads the wafers and closes the fume door, the wafers are moved to a chemical process tank. After a pre-programmed agitation cycle, the wafers are transferred to the quenching tank where they undergo a set series of rinse cycles. When the set number of cycles is reached, an alarm sounds and the operator can remove the wafers.

Cleaning stations can be manually operated, semi-automatic or fully automated. Modutek’s SolidWorks Simulation Professional and Flow Simulation software allows customers to optimize their operation, reliably reproduce cleaning procedures and precisely control cleaning.

Modutek can evaluate the cleaning requirements of semiconductor manufacturing facilities and research labs and provide custom solutions for their specific requirements. The company’s equipment combines the latest technology with the highest quality and reliability. Modutek can provide their expertise and experience and work directly with clients to improve the silicon wafer cleaning processes for their specific application. For a free quote or consultation on call 866-803-1533 or email [email protected].

Tips on Selecting the Right Options for Your Wet Bench Equipment

Tips on Selecting the Right Options for Your Wet Bench EquipmentModutek wet benches are of white polypropylene construction with 304 stainless steel construction available for solvent applications. The company will build any size and length to meet customer requirements. Safety features include safety interlocks, PVC safety shields, emergency power off mushroom buttons and wiring to NFPA 70 and 79. All models have a Teflon N2 gun, a deionized water hand spray and a continuous flow deionized water manifold.

Fully Automated Stations

Modutek’s fully automated wet bench stations use SolidWorks Simulation Professional and SolidWorks Flow Simulation software to optimize the semiconductor fabrication processes and improve performance. The cost of the units covers the basic station and robotics to handle automated operation. These wet process stations are suitable for customers who need high yields, improved etch rates, better throughput and who want the highest output quality.

In addition to increased performance, fully automated stations eliminate human operator error in calculating the chemical dosage and operating the station. The automated system tracks chemical usage to reduce waste and maintain a consistent process environment. Once programmed, the automated station runs the same software and the process is fully repeatable.

Semi-Automated Stations

The semi-automated stations give customers the advanced features and precision of fully automated stations without having to pay the fully automated price. Stations have a graphic user interface on a PCL touch screen to control servomotors with three degrees of freedom and with encoder feedback. Customers can get process uniformity and accurate handling while saving money.

Modutek semi-automated stations are an excellent option for customers who want the precision of robotic controls without paying for full automation. The semi-automated stations still use the SolidWorks Professional and Flow software packages to ensure customers achieve excellent results while spending less.

Manual Stations

Manual wet benches are a cost effective way for customers to get the safety features and operating characteristics of the Modutek wet process equipment family with competitive pricing and an overall low cost of ownership. The manual stations are an effective way for customers to start using wet process equipment and they can later expand the units to add automation options. The manual equipment is of the same quality as the automated stations and delivers excellent performance without the cost of robotics.

Solvent Stations

For solvent stations Modutek uses a 304 stainless steel construction with fire suppression. Solvent stations are available with the same fully automated, semi-automated or manual options as the other wet processing stations and they share the same advanced features. Solvent stations are for customers who have applications with acetone or IPA or who want to carry out photo resist stripping or EDP etching.

Dry to Dry Wet Process Equipment

Modutek’s Dry to Dry equipment saves time by eliminating transfers and increases throughput and yield. It uses an IPA dryer to avoid having to dry in a separate tool. The same automation options as for other wet processing equipment are available for the Dry to Dry models. The unit is a convenient option for customers who want to simplify their process and increase output.

Custom Options

Because Modutek designs and produces all wet benches and related equipment in house without subcontracting, the company can use in house expertise to develop custom solutions for particular applications that may not fall within the standard option set. Customers can be assured that, no matter what the wet process application, Modutek engineers can propose a custom solution if the broad range of standard options is not suitable. For more information or for a free quote contact Modutek at 866-803-1533 or email [email protected].

Advantages Modutek Offers Over Other Semiconductor Equipment Manufacturers

Advantages Modutek Offers Over Other Semiconductor Equipment ManufacturersFounded in 1980, the Modutek Corporation has established itself as an industry leader among semiconductor equipment manufacturers. Modutek provides a full product line of wet process equipment and related products, including wet bench stations, nitride etch baths, high temperature quartz-heated baths, sub ambient filtration, rinsing systems as well as chemical delivery systems. The company has maintained its position through a focus on innovation and on delivering high quality semiconductor equipment. In addition to offering a broadly based standard product line, the company can design custom solutions for a wide variety of applications according to the specific requirements of customers.

 

Key Company Characteristics

 

Modutek has been in the semiconductor equipment manufacturing business for over 35 years and has developed a reputation for high quality and reliability during that time. The company retains a skilled group of design engineers who keep up with new technology and innovate in areas such as process automation. Modutek leverages its expertise developed over the years to deliver solutions that respond exactly to the particular needs of each customer.

 

Located in San Jose, California, Modutek designs and builds its equipment in house and does not subcontract out the manufacture or assembly of its products. This policy allows the company to ensure that all equipment is of the highest quality and Modutek stands behind its products with its warranties and guarantees.

 

A key part of the company’s success is its outstanding customer support. Extensive customer support manpower is not only available but has unparalleled expertise because all equipment and software is designed and produced in San Jose. This insures that local personnel have the experience and product information required to deliver support to customers.

 

Specific Advantages of Ordering From Modutek

 

Decision-makers and production managers at manufacturing plants, research facilities or university labs that have a need for semiconductor manufacturing equipment look for companies with specific characteristics. They want reliable suppliers who can deliver high quality equipment that meets their needs. They need expert help in working through the design process, purchasing the right configuration and with post sales support.

 

Because of Modutek’s long history as a supplier in this industry, the company has a proven reputation that customers can verify. The record of existing installations and the experiences of current customers allow potential buyers to evaluate Modutek’s record and confirm company claims for high quality equipment and reliability of supply before making a purchase.

 

Keeping design and production of products and software in house allows Modutek to fully control and maintain high quality of its products. Customers wanting information about materials used or design practices can get answers first hand from the people responsible. This is especially valuable when discussing guarantees and warranties.

 

With their own engineers working on all aspects of semiconductor equipment supply, Modutek can easily make changes to designs and customize products to meet specific needs. Customers can start by evaluating the wide range of standard products but, if they have specific applications that require unusual features or requirements, Modutek can accommodate them.

 

Modutek’s in house design and production practices give customers access to technical specialists who have hands-on experience with the equipment. A Modutek design engineer can give customers information about a product or even suggest design changes for custom equipment. This capability, together with a commitment to a high level of customer service, lets Modutek offer service before and after a sale that is both customer-oriented and effective in solving problems.

 

For customers that need highly reliable wet process or related equipment, Modutek stands out among semiconductor equipment manufacturers as a supplier that fulfills requirements and provides outstanding customer support. For a free quote or consultation call Modutek at 866–803-1533 or email [email protected]

Modutek’s Wet Bench Design Process

Modutek's Wet Bench Design ProcessIn an effort to meet the highest customer expectations, Modutek has developed a wet bench design process that emphasizes collaboration with customers and dedicates the full resources of the company to identifying and satisfying customer requirements. Key features of the process are an emphasis on quality, an orientation toward partnering with the customer, a project-based account management structure and the use of the latest design tools. With this approach to wet bench equipment design, Modutek intends to ensure that the company meets the highest levels of customer satisfaction.

Design Goals

While meeting and exceeding customer expectations is the overall goal, Modutek emphasizes wet bench process results as well. A high-quality wet bench must be designed for high throughput with a long service life and a low level of downtime. High product quality requires a high level of extremely precise control. Based on these essential features, Modutek starts a conversation with the customer to identify his particular needs.

Partnership Design Program

To begin with the process, Modutek technical personnel gather all the details of their customer’s application. Specifications, data, descriptions and parameters are collected to allow Modutek to understand the customer’s business. The company can then develop the criteria for a successful design together with the customer. The business needs for wet benches, wet process tools, chemical delivery systems or custom semiconductor equipment are explored in detail. At the end of this process the requirements for a successful design are clear.

Design Tools

Once the design requirements have been identified together with the customer, Modutek uses advanced tools to help with design and modeling. Three dimensional design tools ensure precision and the accuracy of the models. Such 3-D designs are created for all wet process and chemical delivery systems, to show the positions of all components and to form the basis for a detailed design review. Once approved, the same material is used to create complete documentation, including post installation maintenance manuals. Using a single set of designs to generate all the documentation ensures that performance is always consistent, even when many units are produced.

Project Management

To execute the production as specified in the designs, Modutek focuses on managing accounts as projects. For each order, the company assigns a dedicated project manager to lead the work. He coordinates with the customer to make sure the design, engineering, manufacturing and integration remain on track. Delivery and installation at the end of the project are handled the same way. The project manager is responsible for ensuring basic technical requirements are met and the customer’s input is respected, leading to a high quality design that meets the customer’s needs.

Factors for a Successful Design Process

Four factors allow Modutek to offer a collaborative design process that gives superior results. First, the company has the experience and broad line of wet bench equipment to respond to a wide variety of customer requirements. Secondly, the company designs and builds all process, etching or cleaning components of its wafer fabrication equipment in house. Thirdly, all automation design is carried out in house, with Modutek engineers designing and writing the software. Lastly, Modutek’s SolidWorks Simulation Professional and SolidWorks Flow Simulation tools help design the system to get the end results specified. All of these factors must be in place for the successful implementation of the type of design process offered by Modutek, and the company works hard to ensure these prerequisites are retained in order to deliver the superior customer-centric service they make possible.

If you need wet bench equipment designed and built for your specific process requirements, contact Modutek at 866-803-1533 or email [email protected].

Wet Bench Ergonomics and Safety

Wet Bench Ergonomics and SafetyImplementing ergonomic engineering principles to reduce operator strain and effort can increase safety and help prevent accidents. Established safety guidelines such as those of the Semiconductor Equipment and Materials International (SEMI), the “SEMI S8-0712 – Safety Guidelines for Ergonomics Engineering of Semiconductor Manufacturing Equipment,” can help manufacturers design their installations accordingly. Such designs make it easy for operators and technicians to reach controls and work with semiconductor wafers. Modutek follows these guidelines and has included specific features in their wet benches and other equipment to allow for ergonomic and safe operation. In addition, when dealing with specific customer requirements or retrofitting existing installations, Modutek can develop customized ergonomic solutions.

Swing Arm Interface Mount

When technicians have to monitor a process or operate tools when troubleshooting they must be able to see the operator interface and input commands safely and ergonomically without stretching or assuming unnatural positions. The normal resting location of the interface is to the side and out of the way. The swing arm allows operators to pull the interface out and over so it is visible and within reach when they are monitoring the process or handling tools.

The swing arm can rotate on three axes and tilt to let operators place it in any desired position. Once the operator pulls the interface into place and orients it in an optimal way, a single push button actuates pneumatic locking by pressing two large bearings together, preventing further movement. With this rigid and low bounce design, the interface can be positioned with one hand, and the design eliminates further movement such as might result from the operation of the touch screen.

Its epoxy powder coating and anodized aluminum finish together with its internal cabling make the swing arm easy to clean with low particulate generation for clean room applications. The fact that one technician can place the arm into a convenient position and lock it with one hand means that a second person to assist with the operations is often not required.

Easy to Load Wafer Holding Devices

The impact of safe and ergonomic design increases greatly when applied to operations that have to be carried out regularly and frequently. When wafer trays and holding devices are designed to make it easy for operators and technicians to use them, even small improvements in ergonomic design can make a big difference in both productivity and safety.

In Modutek wet benches, robot arms move the wafer holding trays to the front of the station to a position optimally located for easy and effortless loading and unloading. Modutek applies such ergonomic design principles to wet bench access for increased safety of operators and technicians working in semiconductor fabrication facilities and research labs.

Ergonomically Designed Upgrades and Customization

When a facility is upgraded or additional equipment is retrofitted, standard ergonomic designs may not meet the needs of the completed installation. Equipment that fully satisfies ergonomic design principles on its own may be difficult to operate when placed in specific configurations. Modutek can apply the company’s experience with ergonomic design to customize installations, ensuring that a customer’s specific ergonomic requirements are met and that the installation as a whole is easy and safe for operators and technicians.

Modutek processing stations are available in a wide variety of configurations and the company works with the customer’s engineering team to custom design the best processing equipment for the particular application. The ergonomic engineering required to ensure easy and safe operation is integrated in these designs and guides the company when customizing their equipment for specialized needs.

If you need help selecting or upgrading wet bench equipment for your application and have specific ergonomic requirements, contact Modutek at 866-803-1533 or email [email protected].

How Technology Manufacturers Use Chemical Delivery Systems

How-Chemical-Delivery-Systems-are-Used-by-Technology-Manufacturers

Technology manufacturing requires the safe handling of chemicals as well as their delivery in accurate amounts. Corrosive chemicals are used for etching, cleaning and plating materials such as silicon chips, metal parts, solar system components and printed circuit boards. The chemicals have to be stored securely, delivered to the process in precise amounts, and neutralized before disposal. Automated chemical delivery systems reduce waste and operator error while allowing the supply of defined amounts of each chemical with a high degree of precision.

Technology manufacturers use these systems to supply chemicals to wet processing equipment. Acids are used to etch away layers of material on wafers of silicon, printed circuit boards or other substrates. Sections of the layers to be etched are covered in protective material and are not removed by the etching. In this way microscopic structures and conducting paths can be created. The requirements for chemical delivery systems depend on the application of the wet processing equipment and on the chemicals to be used.

The key to supplying effective chemical delivery systems is a flexible approach combined with the ability to develop systems customized to meet the needs of the manufacturer. Companies that manufacture silicon wafers have different requirements from those that manufacture micro-electro-mechanical systems, hard disk drives or solar cells. The cleaning and etching processes of different technology manufacturers use various chemicals and widely varying amounts and process control strategies. Their chemical delivery systems must be resistant to corrosion, be safe to operate, allow the storage of large amounts of chemicals and include flexible software to control distribution. An equipment supplier has to have a good understanding of the processes involved so that they can standardize the parts of the system that can remain the same while developing custom solutions to match the needs of each technology manufacturer.

Modutek specializes in designing and manufacturing systems that provide outstanding performance and reliability with the ability to be highly customizable. The systems incorporate user-friendly features that promote safe and cost-effective operation. In a typical custom application, water use, and the number of defective parts produced is reduced while consistency of results increases.

Modutek’s chemical delivery systems feature all Teflon fluid paths, double containment cabinet construction, leak detection and chemical level sensing. Double wall plumbing and system data logging are available. Chemical storage can be in large tote chemical containers or 55-gallon drums close to the wet process station. Manufacturers that use different chemicals can improve throughput because the Modutek’s systems are designed for quick chemical change.

The software that automates a chemical delivery system is a key factor in the system’s flexibility and Modutek can customize the software to meet the needs of the technology manufacturer. Typically a touch screen shows error messages on start-up and then displays a flow diagram showing the status of key components such as metering pumps, valves and level switches. Since these may be different for particular customized applications, the software must be easily adaptable. All the software for Modutek’s chemical delivery systems is written in house. This means that Modutek has the in house expertise and capability to make changes in the software as needed and can provide excellent technical support without having to rely on exterior sources.

The Modutek chemical delivery systems are suitable for any technology manufacturer application. They are specifically designed for easy customization and provide reliable, cost-effective operation. For additional information about Modutek’s Chemical Delivery Systems or related products call 866-803-1533 or email [email protected]