Single Wafer Processing Spurs Demand for Wafer Cleaning Equipment
Wafer cleaning equipment suppliers have to invest heavily in research and development to keep abreast of rapidly changing technologies and changing market conditions. Single wafer processing is one such change factor, spurring demand for wafer cleaning equipment and promising a rapid increase in market size. The wet process equipment supplier market is characterized by high […]
Why Quartz Baths Are Used in the Wafer Cleaning Process
The cleaning of silicon wafers during semiconductor manufacturing uses strong, corrosive chemicals to remove deposits from the surface of the silicon. Critical factors for effective cleaning are an absence of contamination in the chemical bath, the impervious nature of the container and a tight control of the bath temperature. Baths made from high purity quartz […]
How Megasonic Cleaning Improves the Silicon Wafer Cleaning Process
As silicon microscopic circuits and structures shrink in size, the elimination of contaminants from becomes increasingly important. When silicon wafer cleaning is effective, it removes particles as small as 0.1 µm to prevent them from affecting the silicon fabrication process. Traditional wafer cleaning with chemicals may leave some of the smallest particles in place and production […]
Why Pre-Diffusion Cleans Are Critical in Wafer Cleaning Processing
Before silicon wafers are placed in a diffusion furnace, they must be cleaned to remove impurities and particles from their surfaces. Such pre-diffusion cleaning takes place several times during semiconductor manufacturing as microscopic structures are fabricated in the silicon. Various wafer cleaning process methods include the use of different chemical baths, ozone treatment or megasonic […]