How the IPA Vapor Dryer Improves Wafer Processing Results

how-the-ipa-vapor-dryer-improves-wafer-processing-results

Not every advancement in semiconductor fabrication produces results that are usable in industry. To be of value, advancements need to be consistently repeatable when used on an industrial scale. Modutek’s IPA vapor dryer falls into this category, helping semiconductor fabricators improve both yields and processing times.

Modutek’s IPA vapor dryers are custom-engineered with in-house experts working in partnership with a client’s technical staff. From a thorough understanding of a client’s manufacturing process, Modutek works to make sure their equipment is designed and tested to meet the requirements.

The Marangoni IPA Vapor Dryer Design

Silicon wafers require cleaning, rinsing and drying at certain stages of the fabrication process. The results need to be as close to perfection as possible, with no watermarks, and minimal particle contamination. In the past, these results were obtained through rapid spinning and heat drying. These simple methods no longer work with the latest high-density wafers, however. Not only is water hard to remove from complex shapes, drying without leaving watermarks is impossible.

Contamination from incorrect cleaning and drying can cause serious product malfunction and high failure rates. This is where drying by isopropyl alcohol comes into play. IPA drying by the vapor method, delivers wafers that are completely free of watermarks and with minimal contamination. Modutek’s IPA vapor drying system is both cost-effective, and ready for seamless integration into the standard wet bench process or free-standing design.

How the IPA Vapor Dryer Design Works

Modutek’s IPA vapor dryer design is unique in a number of ways. This design delivers high-quality results through serving IPA vapor at the upper reaches of the drying tank. This makes sure that vapor distribution is even. Since the surface tension of isopropyl alcohol is lower than that of water, such vapor serving introduces a gradient of surface tension where isopropyl alcohol meets with a layer of water on the wafer surface. With this type of drying effect, water quickly leaves the wafer surface, and leaves it completely dry and clean. Since the water does not actually evaporate, it leaves the watermarks behind. The drying process takes no longer than 15 minutes.

The Advantages of Modutek’s IPA Vapor Dryer

Modutek’s in house experts in IPA vapor dryer design work together with a clients’ technical team to design and create IPA dryers that specifically meet their application requirements. Clients are able to come to Modutek’s facility for testing to make sure that their equipment works as expected.

With extensive experience in the wafer processing industry, Modutek is fully able to provide top-notch equipment and customer support at every stage of the design process, during delivery and after the sale. With expertise in semiconductor processing equipment, Modutek is able to address every specific client need for this industry. Contact Modutek for free consultation on the equipment needed for your specific wafer manufacturing process.

 

 

 

Modutek at 2018 Semicon Conference in China

2018 Semicon Conference ChinaModutek Corporation, a leading provider of wet bench stations and wet process equipment, will be at the Semicon Conference in Shanghai China from March 14-16, 2018 with their factory representative Laserwort Ltd.  They will be located in Hall N2 at booth 2431. Information about the Semicon Conference can be referenced at http://www.semiconchina.org/ and details on Modutek’s attendance at the conference can be referenced at: Modutek at Semicon Conference in China

Come by the Modutek /Laserwort booth to get information and answer any questions you have about using Wet Bench Process Stations for acid/base, solvent and ozone cleaning or photo resist strip.  In addition Modutek will also provide information about the benefits of their new IPA vapor dryer with the HF last process. Modutek serves customers around the world who require any type of wet processing equipment and builds chemical delivery systems for pharmaceutical, biochemical, solar and semiconductor manufacturing.

Additional details on some of Modutek’s products are listed below:

Single Chamber HF Last IPA Vapor Dryer

Benefits include:

  • Most drying cycles completed within 10 to 15 minutes
  • Very low consumption of IPA
  • No moving parts inside drying chamber eliminating wafer breakage
  • Eliminates watermarks
  • Drying technology can be designed into wet bench eliminating one transfer step

Features include:

  • Single drying chamber for DI water rinsing and IPA vapor drying
  • On board HF metering for precision mix ratios
  • Uses an in situ HF etch process with a rinse step before the IPA drying cycle
  • Filter bypass for contamination control with no cassette contact points
  • Easy to change IPA bottles
  • Handles all process sizes (standard wafer carriers to glass substrates)

 

Fully-automated Wet Bench Equipment

Benefits include:

  • In house customization to meet customer process requirements
  • Precise automated process execution and reliable repeatability
  • Full automation control with touch screen
  • Improved yield and reduced errors
  • SolidWorks Simulation software for accurate calculation of process parameters
  • All robotics and software design designed in house
  • Complete design, assembly and test at one location to meet your specifications

 

Semi-automated Wet Bench Equipment:

Benefits Include:

  • Automation control with touch screen
  • Servo motor automation
  • SolidWorks Flow Simulation software
  • SolidWorks Simulation Professional software
  • All robotics and software designed and developed in house
  • Complete design, assembly and test at one location to meet your specifications

 

Manual Wet Bench Equipment:

Benefits Include:

  • High end manual equipment at competitive pricing
  • Meets or exceeds all current safety standards
  • Low cost of ownership
  • Designed to meet any process requirements
  • Can accommodate custom designs and processes
  • Equipment designed for future expansion

 

All wet bench equipment supports the following applications:

  • KOH Etching
  • Quartz cleaning
  • Ozone Strip
  • Ozone Cleaning
  • SC1 & SC2 (RCA Clean)
  • Megasonic Cleaning
  • BOE (Buffered Oxide Etching)
  • MEMs processing
  • All solvent applications
  • Hot phosphoric (Nitride Etching)
  • SPM Cleaning
  • Precision Part Cleaning

Modutek has over 37 years of industry experience and expertise in developing and building wet bench stations and wet process equipment that provides highly reliable results for precision processes. They also provide world-class service, and customer support. Contact Modutek at 866-803-1533 or email [email protected] for a free quote or consultation to discuss your requirements.

 

Advantages of HF-Last Etching and IPA Drying in One Chamber

In the final stage of silicon wafer cleaning the silicon oxide layer has to be removed and the clean wafer dried without contamination. When wafers are removed from the HF etching process and transferred to a drying chamber, the extra handling increases the chances for wafers to pick up contaminating particles. Such particles cause errors in the further processing of the wafers and can result in final semiconductor products that are defective or of poor quality. Carrying out the final etching and the wafer drying in one chamber reduces the possibility of contamination and can result in better output quality. The latest field results from a customer using Modutek’s single chamber HF-last and IPA vapor dryer show a substantial reduction in particle counts on wafer substrates.

The Single Chamber Process

Modutek uses IPA vapor (Marangoni) drying in a free-standing unit with one drying chamber for DI water rinsing and drying. The IPA vapor is generated in a standard one gallon bottle and is introduced into the drying chamber through the top cover to ensure even distribution. IPA consumption is low but is still adequate to give surface tension drying across all wafers and substrates. The Marangoni drying technique results in wafers without any watermarks.

To allow single step etching and drying in one chamber, Modutek modified the IPA vapor dryer to include HF (hydrofluoric) acid injection before the start of the standard IPA vapor drying process. The HF acid injection is ratio controlled and provides an oxide etch down to bare silicon. Once etched, the wafers are rinsed to a controlled pH level. When the required pH level is reached, the IPA drying process begins without moving the wafers. The particle count on the wafers remains low.

Field Results

Modutek has supplied the new single chamber HF-last IPA dryer to customers and the first large scale results are now in. In the 0.3 to 5 micron range, fewer than 20 particles (adders) were added to the etched substrate after using the Modutek etching/drying combined system. These particle counts are substantially below those achieved using the previous process in this particular field trial. Semiconductor manufacturing facility managers and research center engineers can compare these results to particle counts resulting from their current process and may be able to achieve significant improvements using the Modutek equipment.

The number of microscopic particles on wafers is becoming more and more critical as micro-structures and electronic features become smaller. Where comparatively large conducting areas and physical structures can work well even when they contain a disruptive particle, particles in the way of smaller structures either result in defective semiconductor components or in components whose characteristics are not as specified.

Modutek’s single chamber technology lets semiconductor manufacturing facilities improve output performance and increase yield. The entire etching, rinsing and drying process took only about 15 to 20 minutes in this application. One customer is reviewing particle counts, yields and output quality throughout the entire operation because it is likely that the improved facility performance with the Modutek system can justify the cost of acquiring the new equipment.

How Modutek Can Help

Modutek has over 35 years of experience providing wet processing equipment to the semiconductor manufacturing industry. The company has the expertise to advise customers regarding their semiconductor processing needs and can customize their equipment to fit particular applications. Their state-of-the-art equipment has helped wet process facilities meet their production goals in the past and the new single chamber HF-last etch and IPA vapor dryer can now help customers improve overall production line performance and increase facility profitability.

 

How Marangoni Drying Produces Superior Surface Conditioning for Wafer Processing

How Marangoni Drying Produces Superior Surface Conditioning for Wafer ProcessingAt the end of a particular step in silicon wafer processing, wafers often have to be cleaned, rinsed and dried. The resulting wafer surfaces must be free of water, watermarks, particles and organic residues. Older technologies such as spinning the wafers rapidly or heat drying can no longer fulfill the requirements of high density electronic devices on today’s silicon wafers. Water is hard to remove completely from complicated geometries and drying can leave contaminating watermarks and particles.

Such contamination can lead to product defects in subsequent processing steps or to high failure rates as the contamination impacts quality. IPA (isopropyl alcohol) drying using the Marangoni drying effect leads to dry silicon wafer surfaces without watermarks or particles. Modutek’s IPA vapor dryer is cost effective and can be integrated in a wet bench process without adding drying transfer steps.

How it Works

In Modutek’ IPA drying process, IPA vapor is introduced at the top of the drying tank to ensure even vapor distribution. Because the IPA has a lower surface tension than water, it introduces a surface tension gradient where it interfaces with the water on the wafer surface. As a result of the Marangoni drying effect, water flows off the surface of the silicon wafer and leaves it dry and clean.

The departing water also takes along any impurities or particles suspended within it. No watermarks are present because the water does not dry on the wafer surface and ozone can be introduced into the drying tank to eliminate trace organic contamination. There are no moving parts inside the chamber so physical wafer damage is eliminated and drying cycles typically last ten to fifteen minutes.

Modutek’s Design

The stand-alone Modutek IPA dryer is a 30″ wide cabinet of polypropylene construction. It features wiring to NFPA 70 & 79 and has all Teflon fitting, valves and tubes. A touch screen controls operation with a graphic user interface and the dryer has a multiple recipe function.

The unit has an N2 head case purge with an interlock, a hot N2 dry feature, a continuous flow DI water manifold and an auto lid with foot switch open. PVC side shields are removable and there is DI water degassing function using a membrane contactor. Third party certification for NEC and NFPA is available.

Dryer options include PVC construction, a manual lid and a quick dump feature. Data logging and online support are available. Other options include a static eliminator, resistivity monitoring, HEPA fan filter units and a fire suppression system. Modutek can customize any dryer to customer specifications.

IPA Dryer Operation

The Modutek MVD series IPA dryer is a competitive solution with a single drying chamber for DI water rinsing and IPA vapor drying. The IPA vapor is generated in a one gallon bottle installed at deck level for easy changing. Introducing the vapor at the top of the tank is an efficient way of achieving even distribution of the vapor and reduces IPA consumption. The dryer can handle all wafer sizes and glass substrates and Modutek can integrate the IPA drying function into wet bench stations to eliminate a transfer step.

Benefits of Modutek’s IPA Vapor Dryer

Modutek’s specialists work with customer engineering teams to design a dryer that best matches the process application. Modutek’s design and software implementations are all carried out in house and acceptance testing with de-ionized water is available. The company’s extensive experience in the semiconductor manufacturing industry lets it provide first class customer support at all stages of a contract and after delivery. If you need to improve your wafer processing quality and want a free consultation or quote on using an IPA Vapor Dryer, call Modutek or email [email protected].

Tips on Selecting the Right Options for Your Wet Bench Equipment

Tips on Selecting the Right Options for Your Wet Bench EquipmentModutek wet benches are of white polypropylene construction with 304 stainless steel construction available for solvent applications. The company will build any size and length to meet customer requirements. Safety features include safety interlocks, PVC safety shields, emergency power off mushroom buttons and wiring to NFPA 70 and 79. All models have a Teflon N2 gun, a deionized water hand spray and a continuous flow deionized water manifold.

Fully Automated Stations

Modutek’s fully automated wet bench stations use SolidWorks Simulation Professional and SolidWorks Flow Simulation software to optimize the semiconductor fabrication processes and improve performance. The cost of the units covers the basic station and robotics to handle automated operation. These wet process stations are suitable for customers who need high yields, improved etch rates, better throughput and who want the highest output quality.

In addition to increased performance, fully automated stations eliminate human operator error in calculating the chemical dosage and operating the station. The automated system tracks chemical usage to reduce waste and maintain a consistent process environment. Once programmed, the automated station runs the same software and the process is fully repeatable.

Semi-Automated Stations

The semi-automated stations give customers the advanced features and precision of fully automated stations without having to pay the fully automated price. Stations have a graphic user interface on a PCL touch screen to control servomotors with three degrees of freedom and with encoder feedback. Customers can get process uniformity and accurate handling while saving money.

Modutek semi-automated stations are an excellent option for customers who want the precision of robotic controls without paying for full automation. The semi-automated stations still use the SolidWorks Professional and Flow software packages to ensure customers achieve excellent results while spending less.

Manual Stations

Manual wet benches are a cost effective way for customers to get the safety features and operating characteristics of the Modutek wet process equipment family with competitive pricing and an overall low cost of ownership. The manual stations are an effective way for customers to start using wet process equipment and they can later expand the units to add automation options. The manual equipment is of the same quality as the automated stations and delivers excellent performance without the cost of robotics.

Solvent Stations

For solvent stations Modutek uses a 304 stainless steel construction with fire suppression. Solvent stations are available with the same fully automated, semi-automated or manual options as the other wet processing stations and they share the same advanced features. Solvent stations are for customers who have applications with acetone or IPA or who want to carry out photo resist stripping or EDP etching.

Dry to Dry Wet Process Equipment

Modutek’s Dry to Dry equipment saves time by eliminating transfers and increases throughput and yield. It uses an IPA dryer to avoid having to dry in a separate tool. The same automation options as for other wet processing equipment are available for the Dry to Dry models. The unit is a convenient option for customers who want to simplify their process and increase output.

Custom Options

Because Modutek designs and produces all wet benches and related equipment in house without subcontracting, the company can use in house expertise to develop custom solutions for particular applications that may not fall within the standard option set. Customers can be assured that, no matter what the wet process application, Modutek engineers can propose a custom solution if the broad range of standard options is not suitable. For more information or for a free quote contact Modutek at 866-803-1533 or email [email protected].

Modutek Receives Order for Single Chamber HF Last/ IPA Vapor Dryer

Modutek Corporation, a premier provider of semiconductor manufacturing equipment has received a customer order for a new innovative IPA vapor dryer. The new IPA vapor dryer includes HF (hydrofluoric acid) injection (ratio controlled) as a first step before the standard IPA vapor drying process. This provides an oxide etch to bare silicon. The Hydrophobic wafers are now rinsed to pH controlled level. Once the pH level is met the IPA vapor dry process begins in the same chamber.  This eliminates the requirement to move a cassette of Hydrophobic wafers to a separate drying station.  The new dryer system improves yields by reducing or eliminating water spots and reduces defects with particle-neutral drying.

IPA Vapor Dryer Features

Modutek’s IPA vapor dryer has a single drying chamber for DI water rinsing and IPA vapor drying. The on board HF metering ensures precision mix ratios. The oxide etch with IPA drying uses an in situ process with a rinse to pH before the IPA drying cycle begins. The system features a filter bypass for contamination control and no cassette contact points during etch, rinse and dry.

IPA vapor, generated in standard one-gallon bottles, is introduced into the drying tank through the top cover. The bottles are easy to change at deck level and the top entry of the IPA vapor ensures an even distribution. Modutek’s IPA vapor dryers handle all process sizes from standard wafer carriers to glass substrates. Modutek designs, assembles and tests all the company’s equipment in their facilities in San Jose California and does not subcontract the design or assembly of their dryers.

Modutek Dryer Benefits

Most Modutek dryer cycles conclude within 10 to 15 minutes with a very low consumption of IPA. The technology eliminates watermarks and, because there are no moving parts in the dryer, there is no chance of wafer breakage. By designing the dryer technology into the wet bench, one transfer step can be eliminated. Modutek has extensive experience with custom installations and can help design an IPA vapor dryer to meet the requirements of any application.

About Modutek:

Modutek serves domestic and international customers who have needs in any type of wet processing or lab setting and builds chemical delivery systems for pharma, biochemical, nuclear, solar and wet bench manufacturing. Modutek has a full background in chemical delivery and is a turnkey wet process system integration manufacturing operation.

Modutek At Semicon Conference in China

Modutek At Semicon Conference in ChinaModutek, a leading provider of leading-edge wet benches and wet process equipment, will have a factory representative at the Semicon Conference in Shanghai China from March 15-17, 2016. Modutek will be with their China Rep Laserwort located in Hall N3 at booth 3401. Information about the Semicon Conference can be referenced at http://www.semiconchina.org/ and details on Modutek’s attendance at the conference can be referenced at: Modutek at Semicon Conference in China

Stop by the Modutek /Laserwort booth to get information and answer any questions you have about Automated, Semi-Automated and Manual Wet Process Stations used for acid/base, solvent and ozone cleaning or photo resist strip. Modutek also provides IPA vapor drying and Megasonic cleaning equipment to support your manufacturing applications. In addition environmentally friendly acid neutralization systems and air scrubbers are available with all their equipment.

Additional details on some of Modutek’s products are listed below:

  • Fully-automated Wet Bench Equipment
    • Benefits include:
      • Full automation control with touch screen
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
      • Servo motor automation
      • All robotics and software designed in house
      • Complete design, assembly and test done according to your specifications
  • Semi-automated Wet Bench Equipment:
    • Benefits include:
      • Automation control with touch screen
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
      • Servo motor automation
      • All robotics and software designed in house
      • Complete design, assembly and test done according to your specifications
  • Manual Wet Bench Equipment:
    • Benefits include:
      • High end manual equipment at competitive pricing
      • Meets or exceeds all current safety standards
      • Designed to meet any process requirements
      • Can accommodate custom designs and processes
      • Low cost of ownership
      • Equipment designed for future expansion

Our fully-automated, semi-automated and manual wet bench equipment supports the following applications:

  • KOH Etching
  • Quartz cleaning
  • Ozone Etching
  • Ozone Cleaning
  • SC1 & SC2 featuring Megasonic Cleaning
  • BOE (Buffered Oxide Etching)
  • MEMs processing
  • Plating
  • All solvent applications
  • Hot phosphoric (Nitride Etching)
  • SPM Cleaning
  • Precision Part Cleaning
  • IPA Vapor Dryer
    • Benefits include:
      • Very low IPA consumption
      • No moving parts inside drying chamber which eliminates wafer breakage
      • Most drying cycles completed within 10-15 minutes
      • No watermarks
      • Drying technology can be easily designed into your wet bench eliminating one transfer step
    • The IPA Vapor Dryer supports the following applications:
      • Ozone Cleaning
      • Wafer Drying

Modutek has over 35 years of experience developing and building wet bench stations and wet process equipment that provides highly reliable results for precision processes. They also provide world-class service, and customer support. Call 866-803-1533 or email [email protected] for a free quote or consultation to discuss your requirements.

Wet Processing Equipment Applications

Wet Processing Equipment ApplicationsModutek provides a complete line of silicon processing solutions with state-of-the-art wet processing equipment designed to deliver high quality output at a low total cost of ownership. Applications include wafer etching, cleaning, drying, stripping and metal etching. Specific solutions include KOH etch and nitride etch. State-of-the-art design and engineering ensures that equipment is reliable, safe and low-maintenance.

The rotary wafer etching system can etch, clean, reclaim, develop and strip semiconductor wafers and substrates. It features a dual tank design with a transfer between tanks for etching and cleaning or rinsing. A carrier assembly holds the wafer boats and takes up to 50 six-inch or 25 eight-inch wafers at a time. When the operator closes the fume door and presses the start button, the carrier assembly carries out a continuous rotational agitation in the chemical tank for a pre-set time. The assembly then automatically transfers the wafers to the rinse tank in less than three seconds. After the Quench-Quick Dump-Overflow rinse cycles, the wafers can be moved to the drying unit.

The system can be programmed with up to five process recipes and a touch screen controller displays a summary of the recipe and the process. Axial rotation of the wafers at up to 80 rpm ensures adequate agitation for consistent results. The system is flexible enough to handle different semiconductor processing applications and can carry out automatic batch processing.

Modutek’s vacuum metal etcher is designed for precision etching of aluminum layers on semiconductor wafers. The fully automated unit etches aluminum in a vacuum to eliminate hydrogen bubbles that interfere with the etching and produce “snow” and bridging on the etched wafers. At the beginning of a cycle, the unit evacuates the plenum, drawing acid into the etch tank. Etching continues until the preset time is elapsed or the end-point detector senses that lines have been etched through the aluminum layer. When etching is complete, the acid drains back into the acid reservoir and nozzles spray deionized water over the wafers. The metal etcher is characterized by a fast throughput and a high yield.

Modutek’s IPA Vapor Dryer provides a way to clean dry wafers without water spots. The unit can introduce ozone into the drying chamber to eliminate organic impurities. Most drying cycles take only 10 to 15 minutes. As low-cost drying solution, Modutek can custom design their IPA vapor dryers to meet your specific requirements and application.

In addition to equipment that can be used for a variety of semiconductor processing, Modutek offers specific solutions such as KOH etching and nitride etching. For KOH etching, Modutek uses an individualized approach that produces solutions for specific customer applications with the company’s Teflon tanks. The tanks are all-PFA material and sheets are welded using advanced techniques designed to reduce impurities. Modutek KOH etching solutions are designed to work with a customer’s existing wet bench equipment.

For nitride etching, Modutek provides a new Nb series Silicon Nitride Etch Bath. The system features a dual system that monitors the chemical boiling while ensuring tight control of the nitride etching process. As a result, the system provides unparalleled control of the nitride etch process and uniformity while achieving elevated levels of safety and reliability.

Modutek’s wet processing equipment is designed to meet the application needs of any semiconductor fabrication or research facility, either with standard products or with custom-designed solutions. Call Modutek at 866-803-1533 for any questions you have about wet processing equipment or if you need help in choosing the right equipment for your specific requirements.

Using RCA Clean in a Wet Bench Process

Using RCA Clean in a Wet Bench ProcessBefore processing a silicon wafer under high temperatures, semiconductor process engineers will use RCA clean as part of a wet bench process. This procedure removes organic residue from a silicon wafer and replaces the surface layer of oxide with a thin, new layer. The application of two chemical solutions, SC-1 and SC-2, make up this process.

SC-1 removes impurities attached to silicon, quartz and oxide surfaces in a 15 minute soak. In addition, it initiates the regeneration of surface oxide layers. The mixture consists of:

  • 1 part NH4OH (ammonium hydroxide)
  • 1 part H2O2 (hydrogen peroxide)
  • 5 parts deionized (DI) water.

After an SC-1 application, cleanliness is ensured by soaking a wafer in SC-2 for 10 minutes. This mixture does not etch silicon, but targets and eliminates microscopic metal hydroxides, alkali residue and any other remaining metal. SC-2 consists of:

  • 1 part HCl (hydrochloric acid)
  • 1 part H2O2 (hydrogen peroxide)
  • 5 parts DI water

Fortunately, Modutek offers an array of wet bench equipment that support both steps of RCA clean. With a custom station, you can rinse and dry wafers in one place within 15 minutes.

Modutek Wet Bench Equipment

Modutek produces high-tech, high-yield wet bench processing equipment suited for RCA clean. Stations conserve DI water and operate with precise process controls via SolidWorks Flow Simulation software. Expedite your applications with a station designed in-house according to your specific requirements. Standard features include:

  • DI water hand spray
  • Continuous flow DI water chamber
  • Teflon N2 gun

Modutek IPA Vapor Dryer

Eliminate the need for separate rinsing and drying chambers with Modutek’s Marangoni drying system, also called an IPA Vapor Dryer. Incorporated into your wet bench, the IPA Vapor Dryer’s single chamber makes finalizing the cleaning process quick and convenient. In addition, this advanced system allows for ozone introduction in a post-solution clean. Safe and simple bottle change happens at deck level where IPA vapor precipitates inside your gallon container under level sensor protection. Additional safety features include an Emergency Power Off button and the absence of moving parts inside the drying chamber. IPA vapor distributes evenly through the top of the chamber, reducing IPA use while providing sufficient surface tension drying for all substrates and silicon wafers.

Modutek has been designing and manufacturing wet bench equipment for customers for 30+ years. Certified specialists will work with you from design to installation, ensuring you have the perfect wet bench and IPA Vapor Dryer for your cleaning and processing applications. Email [email protected] or call 866-803-1533 for inquiries.

Modutek Featured at Semicon Conference in China

Modutek-Featured-at-Semicon-ConferenceModutek, a leading provider of semiconductor manufacturing equipment and wet bench stations, will have a factory representative at the Semicon Conference in Shanghai China in Hall W3 at booth 3243. The conference will be held from March 17-19, 2015 and will be attended by a large number of exhibitors in the semiconductor manufacturing industry. Details and information about the Semicon Conference can be viewed on their site at http://www.semiconchina.org/.

Modutek will provide information and can answer questions about their manufacturing equipment with Laserwort who is their local Rep in China. Information about the following products will be provided at the conference:

  • Semi-automated Wet Bench Equipment:
    • Benefits include:
      • Servo motor automation
      • Automation control with touch screen
      • All robotics and software designed in house
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
  • Fully-automated Wet Bench Equipment
    • Benefits include:
      • Servo motor automation
      • Full automation control with touch screen
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
      • All robotics and software designed in house

The semi-automated and fully-automated wet bench equipment supports the following applications:

  • MEMs processing
  • KOH Etching
  • Ozone Etching
  • Ozone Cleaning
  • Precision Part Cleaning
  • SC1 & SC2 featuring Megasonic Cleaning
  • Quartz cleaning
  • BOE (Buffered Oxide Etching)
  • SPM Cleaning
  • Plating
  • All solvent applications
  • Hot phosphoric (Nitride Etching)
  • IPA Vapor Dryer
    • Benefits include:
      • Very low IPA consumption
      • No watermarks
      • Most drying cycles completed within 10-15 minutes
      • No moving parts inside drying chamber which eliminates wafer breakage
      • Drying technology can be easily designed and integrated into your wet bench eliminating one transfer step

       

    • The IPA Vapor Dryer supports the following applications:
      • Ozone Cleaning
      • Wafer Drying

Modutek has over 30 years of experience designing and building semiconductor manufacturing equipment and wet bench stations to meet the requirements of customers around the world. Modutek provides world-class service, set-up, and customer support. Their Wet Benches and Wet Process equipment provides high reliable results for precision processes. Contact them by calling 866-803-1533 or by email from the site.