When ozone is used to clean silicon wafers, it reduces the use of aggressive chemicals and it can decrease the wafer particle count. Modutek’s advanced ozone cleaning process can clean more quickly than many chemical-based processes and it delivers other benefits. Ozone is used to remove organic contaminants from wafer surfaces in either the Coldstrip sub ambient process or the Organostrip process. Either process can reduce overall wafer fabrication costs and improve manufacturing facility performance.
Advanced Ozone Cleaning Outperforms Chemical Stripping
With increased regulation of the use of dangerous chemicals and pressure on businesses to make their operations more environmentally friendly, Modutek developed the advanced ozone cleaning processes to help semiconductor manufacturers and research labs reduce chemical use. Ozone is introduced in Modutek’s DryZone system in compact units using the Coldstrip or Organo strip processes. Both cleaning methods also feature a reduced particle count compared to chemical cleaning methods.
In the Coldstrip process, wafers are first rinsed with deionized water to remove soluble non-organic contaminants. The process operates at four to ten degrees centigrade. After the rinsing, ozone is introduced into the chamber and combines with the carbon of the organic compounds on the wafer surfaces. The ozone-carbon reaction forms carbon dioxide, leaving wafers clean and almost free of particles.
The Organostrip process also uses ozone but operates at ambient temperature. Ozone is introduced into the process dissolved in acetic acid, a mild solvent in which ozone has a very high solubility. The wafers are rinsed with the ozone-acetic acid solution and the high level of ozone rapidly oxidizes the organic contaminants. The waste products of the process do not require special treatment. Both processes work quickly and feature excellent cleaning performance with low particle counts.
Changing to the Advanced Ozone Cleaning Process Delivers Substantial Benefits
The major benefits of changing from chemical cleaning to an advanced ozone cleaning process is a reduction in the use of toxic chemicals and improved cleaning performance with a lower particle count. These two factors are at the root of additional benefits resulting in cost savings, better yields and improved safety for employees.
Reduced Use of Chemicals
When the use of toxic chemicals is reduced, there are cost reductions in addition to savings resulting from fewer chemical purchases. Other savings include reduced costs for chemical storage, handling and disposal. Employees benefit from lower exposure to harmful chemicals and from increased workplace safety because there is less danger of spills or accidents.
Regulatory compliance costs are also reduced. As environmental regulations become more onerous, costs rise and compliance becomes more difficult. Reduced chemical use results in lower compliance costs, and a more environmentally friendly operation helps improve community relations and the environmental reputation of the business.
Lower Particle Contamination
Lower particle counts are the result of better cleaning performance. Particle counts play ang increasingly important role in wafer structures that are smaller and more tightly packed. Even a single particle can block a conducting path or the etching of a tiny detail. Fewer particles means a lower rate of defective products and higher yields. Product quality and longevity may also be improved.
Improved Cleaning Performance and Wafer Yields with Less Equipment
In addition to a lower particle count, the improved cleaning performance of the advanced ozone cleaning process results in shorter cleaning times within a smaller footprint. Modutek’s DryZone units used for the ozone cleaning process are compact and take up less space than the corresponding chemical cleaning stations. Cleaning is more rapid resulting in higher throughput. As a result of these benefits, the overall performance of the silicon wafer fabrication facility can improve substantially.
Modutek Provides Advanced Equipment for Manufacturers
As one of the leading semiconductor equipment manufacturers, Modutek can advise customers on how to implement a change to ozone cleaning. Modutek offers a free consultation and quote on their equipment, and ensures their equipment will support processes that meet customer requirements.