Advanced Wafer Drying using Modutek’s IPA Vapor Dryer
The successful manufacture of tightly packed semiconductor products depends on obtaining low particle counts on silicon wafer surfaces after rinsing. Heat drying and spin dryers may leave water marks and residue as the water evaporates. Modutek’s advanced IPA vapor dryers use the Marangoni drying effect to reduce particle counts to a minimum. The compact dryer […]