Optimizing the BOE Process for High-Precision Manufacturing
In the constantly evolving field of semiconductor manufacturing, achieving high-precision results is paramount. Buffered Oxide Etch (BOE) plays a crucial role in this process, providing the precise etching capabilities required for intricate semiconductor devices. This article guides process engineers in optimizing the BOE process for small-scale wet processing tabletop baths to large-scale wet bench systems. […]
How Specialized Equipment Improves Silicon Wet Etching Processes
Results from common wet etching processes such as KOH and Piranha etch can be improved with the use of specialized equipment. Depending on the process, key parameters can be controlled especially well and innovative procedures can reduce particle counts. When specialized equipment is used in silicon wet etching processes, wafer output can increase, defects can […]