Tag Archives: improving wafer cleaning processes

How Quick Dump Rinsers Improve Wet Processing Results

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While effective and rapid rinsing with a low particle count remains a key benefit of quick dump rinsers, reduced water usage is also becoming more important. Special design measures can lower the amount of water required to rinse the silicon wafers while retaining fast and efficient operation with a low level of particle contamination.

Low water consumption is especially important in some regions such as the Western U.S., where a long-term drought makes water conservation mandatory. Even in other areas, a reduced use of the deionized water used in silicon wafer fabrication saves money and is environmentally responsible. Modutek has pioneered the design of quick dump rinsers that feature efficient use of deionized water, fast operation, and low particle entrapment.

Quick Dump Rinser Benefits that Incorporate Reduced Water Usage

Modutek’s quick dump rinsers feature a state-of-the-art design for efficient operation while minimizing rinse time, reducing the particle count, and keeping deionized water usage to a minimum. Modutek’s quick dump rinsers offer the following characteristics:

  • Efficient Rinsing. The units have dual spray manifolds and low misting nozzles for quick and complete rinsing away of chemical residues.
  • Nitrogen Bubbler. The bubbler generates nitrogen bubbles as the tank fills, removing additional contaminants and particles.
  • 360 Degree Overflow Weir. As the dislodged impurities rise to the surface, they are flushed away across the overflow weir and out of the tank.
  • Programmable Water Use. Modutek’s quick dump rinsers can be programmed to use less water.
  • Contoured Bottom. The rinser bottom is contoured around a wafer cassette, reducing the amount of water required.
  • Large Machined Trap Door. The machined trap door doesn’t need gaskets or seals that could trap particles, and the large size lets water drain rapidly.
  • Polypropylene Construction. High-quality smooth polypropylene construction ensures that the tank is not a source of contamination with new particles.
  • Automatic Dump and Refill. The rinsing controller can be set to automatically dump and refill every two hours, reducing bacterial growth and minimizing the possibility of contamination.
  • Optional Reclaim System. An optional reclaim system further reduces water consumption and lowers costs.
  • Variety of Standard Sizes. Modutek offers seven standard tank sizes for their quick dump rinsers, and can accommodate many special customer needs.

Modutek has designed the quick dump rinser to operate as a stand-alone unit or for integration into a silicon wet etching process line. The rinser can improve the overall performance of the line and lower costs while reducing the number of defective products.

Benefits of Using Modutek’s Quick Dump Rinser

Modutek’s design is based on extensive experience working with wet process equipment to address key customer concerns. Benefits include the following:

  • The reduced water consumption due to rapid rinsing and a water-conserving design lowers costs and reduces the environmental impact.
  • The machined trap door and laminar flow of rinsing water reduce the particle count and improve output quality.
  • The smooth polypropylene construction avoids additional contamination and reduces the percentage of rejects.
  • Quick rinsing allows increased throughput for the production line and reduces costs.

From its close working relationship with customers, Modutek can address the challenges manufacturers often have with meeting higher product densities, smaller silicon structures, and increasing regulation with using chemicals and water. Modutek continuously works to improve silicon wafer processing capabilities, while keeping in mind the overall costs of ownership and efficient wafer processing.

Modutek Provides Innovative Solutions to Meet Customer Needs

Modutek’s quick dump rinsers represent years of innovative design and development. These systems let semiconductor manufacturers and research facilities reduce water consumption while increasing output and reducing the number of product defects. Overall facility performance is improved through cost reduction and improved output quality. Contact Modutek for a free quote or consultation to discuss your specific processing requirements at 866-803-1533 or email [email protected].

How Specialized Equipment Improves Wafer Cleaning Results

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When equipment is specially designed for a specific cleaning process, residue and particle removal from wafers can be improved. A better wafer cleaning process reduces semiconductor defects and can result in improved output quality. Specialized equipment can clean more quickly, allowing higher facility throughput. Specialized and customized equipment can be adapted for batch processing, continuous manufacturing or prototyping, improving production line performance, and reducing costs.

Specialized Equipment Delivers Specific Advantages

Modutek has developed specialized equipment that addresses issues with specific semiconductor manufacturing processes. Resulting advantages include better control of process variables, more efficient cleaning, reduced space requirements, and more flexible automation. While standard solutions are also available and are sometimes sufficient, the specialized equipment will deliver superior results in specific cases.

Piranha Etch Clean is often used for post-etch clean and for the removal of organic matter. Modutek has implemented a specialized control strategy that gives more reliable cleaning results while cutting chemical costs. The “bleed and feed” method provides tight control of temperature and chemical concentration to deliver superior cleaning performance.

A wafer cleaning process used in semiconductor manufacturing such as Piranha Clean has to take place in special tanks that are impervious to the process chemicals. Modutek’s heated quartz tanks minimize particle contamination while delivering precise temperature control. They are available in recirculating and constant temperature models are made from boron-free virgin fused quartz.

For many process steps, wafers must be carefully rinsed after cleaning. Modutek’s specialized quick dump rinsers minimize rinsing time while reducing the consumption of deionized water. Modutek’s specialized design has eliminated particle entrapment by reducing particle contamination at the rinsing stage.

After rinsing, wafers have to be dried while limiting additional particle contamination. Modutek offers IPA vapor drying stations but has developed a specialized single-chamber unit that rinses and dries the wafers without moving them to a new station. Moving the wafers exposes them to additional particle contamination and the single chamber IPA vapor dryer features extremely low particle counts.

As microscopic structures on silicon wafers become smaller and more tightly packed, a reduced particle count becomes critical for some wafer processes. Modutek’s use of Megasonic cleaning uses high-frequency sound waves in a cleaning solution to remove almost all remaining particles on wafer surfaces. The cavitation bubbles created by the sound waves can dislodge even the smallest particles, delivering an almost completely particle-free wafer.

Specialized Software Control for Automation

To control the wafer cleaning process, specialized software and automation can help deliver exactly the cleaning chemicals required while eliminating human error. Modutek uses its own SolidWorks Simulation Professional and Flow Simulation software and can adapt the programs to any process. Modutek’s wet bench stations are available in manual, semi-automatic, and fully automated versions with the automation designed to support the latest wet process technology. The specialized automation can be customized for specific applications to satisfy customer process requirements.

How Modutek’s Specialized Equipment Improves Performance

Specialized equipment can reduce particle counts, improve cleaning, reduce costs and increase production capacity. Modutek works closely with customers in a variety of industries and develops specialized wafer cleaning equipment to meet their unique needs. When additional customization is needed, Modutek can adapt equipment and software as required. Because the company designs and builds its products in-house, it can make the changes needed itself without relying on third parties.

With Modutek’s specialized equipment, customers ranging from large semiconductor manufacturers to small research labs can achieve excellent production results, especially after the additional customization that Modutek can provide. Superior wafer cleaning performance impacts all aspects of semiconductor manufacturing, from initial prototyping to full production line fabrication. Modutek can help with the choice of specialized equipment, suggest customizations, and ensure that the delivered equipment meets expectations.