How the Piranha Etch Process Improves Silicon Wafer Cleaning
While the Piranha solution quickly removes organic residue from silicon wafers, the process is difficult to control and may produce explosive gas mixtures. The Piranha solution is made up of one part hydrogen peroxide and three parts sulfuric acid, although the ratio may vary for specific applications. The mixture is exothermic and the heat released […]
Improving Piranha Etch Process Results in Silicon Wafer Cleaning
Piranha etch is a popular process for silicon wafer cleaning, but it has to be tightly controlled to be effective. The mixture of about one part hydrogen peroxide and three parts sulfuric acid rapidly removes organic matter from silicon wafers. The etch process takes place in heated quartz tanks where both temperature and chemical concentration […]