Using RCA Clean in a Wet Bench Process
Editor’s Note: This article was originally published in May 2015 and has been updated with new information and re-posted in August 2023. The semiconductor manufacturing industry relies heavily on complex and precise processes to create electronic components we rely on every day. One such process is wafer cleaning – an essential step that removes unwanted […]
Why Pre-Diffusion Cleans Are Essential for Silicon Wafer Processing
Silicon wafers must be completely clean before they go through the diffusion process. If contaminating particles are present on the wafer surfaces during the diffusion process, they will cause defects in the final semiconductor product. Pre-diffusion cleaning can be carried out with several methods. RCA clean and Piranha etch use chemicals to strip away wafer […]
The Importance of Pre-Diffusion Cleans in Silicon Wafer Cleaning
When wafer cleaning immediately prior to diffusion is effective, semiconductor manufacturing output is of high quality and the defect rate is reduced. A major pre-occupation of pre-diffusion cleaning is the removal of microscopic particles from the surface of the silicon wafer. Particles can prevent even diffusion and may themselves be diffused into the silicon, causing […]