Improving Standard Clean Particle Removal in a Wet Bench Process
When silicon wafer yields are not improved with the Standard Clean process, improved particle removal can be achieved with advanced processing equipment. Standard Clean or RCA clean was developed by the RCA company in 1965 and it has changed little since then. It has always been successful in cleaning wafers and removing most particles. However, […]
Why Pre-Diffusion Cleans Are Critical in Wafer Cleaning Processing
Before silicon wafers are placed in a diffusion furnace, they must be cleaned to remove impurities and particles from their surfaces. Such pre-diffusion cleaning takes place several times during semiconductor manufacturing as microscopic structures are fabricated in the silicon. Various wafer cleaning process methods include the use of different chemical baths, ozone treatment or megasonic […]