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How Standard Clean Particle Removal (SC1 Clean) is Supported in a Wet Bench Process


Editor’s Note: This article was originally published in April 2015 and has been updated with additional information and reposted in April 2023. The SC1 clean process is a widely used method for removing particles and other contaminants from silicon wafers. This process involves using a solution of ammonium hydroxide and hydrogen peroxide, which is heated […]