Customizing Wet Benches for Precision in Semiconductor Processing
Summary: Custom wet bench systems enhance precision, safety, and efficiency in semiconductor processing by providing tailored solutions for research and high-volume manufacturing. Table of Contents Introduction Key Aspects of Wet Bench Customization Wet Bench Configuration Options Customization for Different Applications Processing Acids vs. Solvents: Key Considerations Wet Processing Equipment Components to Support Different Processes Benefits […]
Modutek’s In-House Expertise Provides Superior Wet Processing
For over 40 years, Modutek has set the standard in wet processing solutions, empowering semiconductor manufacturers, tech innovators, and researchers with precision-engineered equipment for unmatched performance. Our in-house engineering team creates systems that meet exact semiconductor production requirements. This integrated approach removes quality variables common with outsourced manufacturing, delivering equipment built to precise specifications. Direct […]
Using RCA Clean in a Wet Bench Process
Editor’s Note: This article was originally published in May 2015 and has been updated with new information and re-posted in August 2023. The semiconductor manufacturing industry relies heavily on complex and precise processes to create electronic components we rely on every day. One such process is wafer cleaning – an essential step that removes unwanted […]
How Specialized Wet Bench Equipment Improves the RCA Clean Process
The RCA clean process removes contaminants from the surface of silicon wafers so that additional wet process semiconductor manufacturing steps can take place. The process consists of two steps, with the SC1 step removing organic compounds and the SC2 step dislodging any remaining metallic residues or particles. Specialized wet benches ensure that contaminant and particle removal is […]
Why Pre-Diffusion Cleans Are Critical in Wafer Cleaning Processing
Before silicon wafers are placed in a diffusion furnace, they must be cleaned to remove impurities and particles from their surfaces. Such pre-diffusion cleaning takes place several times during semiconductor manufacturing as microscopic structures are fabricated in the silicon. Various wafer cleaning process methods include the use of different chemical baths, ozone treatment or megasonic […]