Using RCA Clean in a Wet Bench Process
Editor’s Note: This article was originally published in May 2015 and has been updated with new information and re-posted in August 2023. The semiconductor manufacturing industry relies heavily on complex and precise processes to create electronic components we rely on every day. One such process is wafer cleaning – an essential step that removes unwanted […]
How Specialized Wet Bench Equipment Improves the RCA Clean Process
The RCA clean process removes contaminants from the surface of silicon wafers so that additional wet process semiconductor manufacturing steps can take place. The process consists of two steps, with the SC1 step removing organic compounds and the SC2 step dislodging any remaining metallic residues or particles. Specialized wet benches ensure that contaminant and particle removal is […]
Why Pre-Diffusion Cleans Are Critical in Wafer Cleaning Processing
Before silicon wafers are placed in a diffusion furnace, they must be cleaned to remove impurities and particles from their surfaces. Such pre-diffusion cleaning takes place several times during semiconductor manufacturing as microscopic structures are fabricated in the silicon. Various wafer cleaning process methods include the use of different chemical baths, ozone treatment or megasonic […]