Tag Archives: wet bench equipment

Modutek’s Wet Bench Design Process

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Modutek's Wet Bench Design ProcessIn an effort to meet the highest customer expectations, Modutek has developed a wet bench design process that emphasizes collaboration with customers and dedicates the full resources of the company to identifying and satisfying customer requirements. Key features of the process are an emphasis on quality, an orientation toward partnering with the customer, a project-based account management structure and the use of the latest design tools. With this approach to wet bench equipment design, Modutek intends to ensure that the company meets the highest levels of customer satisfaction.

Design Goals

While meeting and exceeding customer expectations is the overall goal, Modutek emphasizes wet bench process results as well. A high-quality wet bench must be designed for high throughput with a long service life and a low level of downtime. High product quality requires a high level of extremely precise control. Based on these essential features, Modutek starts a conversation with the customer to identify his particular needs.

Partnership Design Program

To begin with the process, Modutek technical personnel gather all the details of their customer’s application. Specifications, data, descriptions and parameters are collected to allow Modutek to understand the customer’s business. The company can then develop the criteria for a successful design together with the customer. The business needs for wet benches, wet process tools, chemical delivery systems or custom semiconductor equipment are explored in detail. At the end of this process the requirements for a successful design are clear.

Design Tools

Once the design requirements have been identified together with the customer, Modutek uses advanced tools to help with design and modeling. Three dimensional design tools ensure precision and the accuracy of the models. Such 3-D designs are created for all wet process and chemical delivery systems, to show the positions of all components and to form the basis for a detailed design review. Once approved, the same material is used to create complete documentation, including post installation maintenance manuals. Using a single set of designs to generate all the documentation ensures that performance is always consistent, even when many units are produced.

Project Management

To execute the production as specified in the designs, Modutek focuses on managing accounts as projects. For each order, the company assigns a dedicated project manager to lead the work. He coordinates with the customer to make sure the design, engineering, manufacturing and integration remain on track. Delivery and installation at the end of the project are handled the same way. The project manager is responsible for ensuring basic technical requirements are met and the customer’s input is respected, leading to a high quality design that meets the customer’s needs.

Factors for a Successful Design Process

Four factors allow Modutek to offer a collaborative design process that gives superior results. First, the company has the experience and broad line of wet bench equipment to respond to a wide variety of customer requirements. Secondly, the company designs and builds all process, etching or cleaning components of its wafer fabrication equipment in house. Thirdly, all automation design is carried out in house, with Modutek engineers designing and writing the software. Lastly, Modutek’s SolidWorks Simulation Professional and SolidWorks Flow Simulation tools help design the system to get the end results specified. All of these factors must be in place for the successful implementation of the type of design process offered by Modutek, and the company works hard to ensure these prerequisites are retained in order to deliver the superior customer-centric service they make possible.

If you need wet bench equipment designed and built for your specific process requirements, contact Modutek at 866-803-1533 or email [email protected].

Modutek At Semicon Conference in China

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Modutek At Semicon Conference in ChinaModutek, a leading provider of leading-edge wet benches and wet process equipment, will have a factory representative at the Semicon Conference in Shanghai China from March 15-17, 2016. Modutek will be with their China Rep Laserwort located in Hall N3 at booth 3401. Information about the Semicon Conference can be referenced at http://www.semiconchina.org/ and details on Modutek’s attendance at the conference can be referenced at: Modutek at Semicon Conference in China

Stop by the Modutek /Laserwort booth to get information and answer any questions you have about Automated, Semi-Automated and Manual Wet Process Stations used for acid/base, solvent and ozone cleaning or photo resist strip. Modutek also provides IPA vapor drying and Megasonic cleaning equipment to support your manufacturing applications. In addition environmentally friendly acid neutralization systems and air scrubbers are available with all their equipment.

Additional details on some of Modutek’s products are listed below:

  • Fully-automated Wet Bench Equipment
    • Benefits include:
      • Full automation control with touch screen
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
      • Servo motor automation
      • All robotics and software designed in house
      • Complete design, assembly and test done according to your specifications
  • Semi-automated Wet Bench Equipment:
    • Benefits include:
      • Automation control with touch screen
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
      • Servo motor automation
      • All robotics and software designed in house
      • Complete design, assembly and test done according to your specifications
  • Manual Wet Bench Equipment:
    • Benefits include:
      • High end manual equipment at competitive pricing
      • Meets or exceeds all current safety standards
      • Designed to meet any process requirements
      • Can accommodate custom designs and processes
      • Low cost of ownership
      • Equipment designed for future expansion

Our fully-automated, semi-automated and manual wet bench equipment supports the following applications:

  • KOH Etching
  • Quartz cleaning
  • Ozone Etching
  • Ozone Cleaning
  • SC1 & SC2 featuring Megasonic Cleaning
  • BOE (Buffered Oxide Etching)
  • MEMs processing
  • Plating
  • All solvent applications
  • Hot phosphoric (Nitride Etching)
  • SPM Cleaning
  • Precision Part Cleaning
  • IPA Vapor Dryer
    • Benefits include:
      • Very low IPA consumption
      • No moving parts inside drying chamber which eliminates wafer breakage
      • Most drying cycles completed within 10-15 minutes
      • No watermarks
      • Drying technology can be easily designed into your wet bench eliminating one transfer step
    • The IPA Vapor Dryer supports the following applications:
      • Ozone Cleaning
      • Wafer Drying

Modutek has over 35 years of experience developing and building wet bench stations and wet process equipment that provides highly reliable results for precision processes. They also provide world-class service, and customer support. Call 866-803-1533 or email [email protected] for a free quote or consultation to discuss your requirements.

Using the KOH Etching Process with Modutek’s Teflon Tanks

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Potassium hydroxide-KOH etching is an efficient chemical process that allows for precise impressions to be made within a body of silicon. The process uses DI (deionized) water in combination with heavy alkalinity (pH levels greater than 12); the solution is then thermally adjusted for the appropriate degree of etching needed. This process allows for greater precision than other forms of etching when it comes to manufacturing silicon wafers.

What Are the Benefits of Using KOH Etching?

The precision KOH etching grants is very beneficial to the product’s outcome. Due to its chemical composure and procedural approach, dry etching is more apt to create physical flaws; it also can make for a more hazardous environment, as it risks the exposure of toxic — even explosive — chemicals.

KOH etching, on the other hand, is almost entirely aquatic. The liquids for the etching process are contained within Modutek’s own Teflon Tanks, meaning that exposure to hazardous chemicals is drastically reduced to create a safe environment for manufacturing. The structuring behind the process also means that it can easily be set up for repeat manufacturing; the resources required for the etching are more stable and affordable, meaning that clients can duplicate their etchings at a much more feasible rate.

How Do Teflon Tanks Bolster the KOH Etching Process?

Modutek’s Teflon Tanks are designed with the foresight to emphasize the maximum potential KOH etching can provide. Furthermore, each Teflon Tank is fashioned to cater to the specific needs of the client, regardless of unorthodoxy. In unison with wet bench equipment, these Teflon Tanks greatly reduce the impurities other methods of etching may establish, providing you with a more reliable and consistent output every time.

The Teflon Tanks can be thermally adjusted to operate between 30 — 100º C (86 — 212º F), and on average can heat up at a rate of 2 — 3º C per minute, though smaller or larger tanks may have varying thermal increase rates. Thermal output can be mustered either from inline Teflon heating, or from submersion within an overflow bank for each type of Teflon Tank. Each tank is also fitted with cooling coils that can quickly reduce the solution’s temperature.

There are two types of Teflon Tanks that support KOH etching: Temperature Controlled Re-circulating Baths (TFa Series), and Temperature Controlled Static Baths (TI Series). These two series of Teflon Tanks are designed with overlapping covers to minimize the loss of water during the etching process; they also boast the ability to eliminate concentration deficiency.

Because Modutek designs their Teflon Tanks with the client’s specifications in mind, the customization each tank receives is advantageous to the desired end result. Dual heating methods produce a quick, balanced aid to water-based etching. Drains and valves can be installed into the tanks for safe and easy clean-up. Remote timers, controllers, or even a data interface can be equipped to make a simple process even simpler.

When compared to other forms of etching (whether wet or dry), Modutek’s support of KOH etching produces more precise and affordable results in a safer and more expeditious work environment. Teflon Tanks can be produced individually or en masse depending on the output the client is in need of. Each tank can also be fitted with a number of practical options that can improve the etching process dramatically.

No client should work with an environment or product that diminishes the quality of their manufacturing process; customization leads the way for an innovative and effective product. Modutek’s support of KOH etching in their catalytic Teflon Tanks will provide exceptional results for clients that use this process.

Benefits of Using Quick Dump Rinsers for Silicon Wet Etching

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Benefits for Using Quick Dump Rinsers for Silicon Wet EtchingQuick Dump Rinsers are used during the rinse cycle in the silicon wet etching process. The deionized water (DI) rinse cycle is a vital step in your wafer manufacturing process. In fact, DI water probably contacts your product more than any process solution. This makes an efficient rinsing system invaluable to particle and defect density reduction. Fortunately, Modutek Corporation offers the DR Series Quick Dump Rinser for thorough, economical cleaning. Their experienced specialists can upgrade existing rinsing modules and install fresh-from-the-factory wet bench process stations to suit your specific needs.

Features and Functionality

For optimal operations, Modutek includes two defining features into each DR Series Quick Dump Rinser: limited DI water use and easy installation into new or used stations. These properties complement complete rinsing enhanced by:

  • Ergonomic DI water spray nozzles
  • N2 agitation
  • Bottom filling
  • Optional rinse tank vortex agitation
  • Dual overhead spray manifolds

In addition, Modutek has reduced the interior volume of their Rinsers to suit the size of your wafer cassettes. This design expedites dump time through a large, machined dump door and utilizes a surrounding overflow weir to remove all contaminates while preventing recontamination on wafer surfaces.

A Compatible Controller 

Complete your DR Series Quick Dump Rinser with Modutek’s compatible C15sa Rinser Controller. Designed specifically for the wafer rinse module, the controller provides convenience with a high degree of adjustability. Engineers program the fill and dump cycles and initiate cascade and spray delay at the click of a button. Safety features include access code-protected resistivity to prevent unwanted changes to the program.

A Monitored Rinse

Use the Modutek Resistivity Monitor RM30a with the DR Series wafer rinse system for a meticulous oversight of your cleaning process. Along with measuring resistivity, the optional RM30a monitors in flowing water into your wet bench station and internal temperatures of the DR Series rinse system. For minimal DI water consumption, rinse cycles automatically finish after reaching the resistivity setting. This ensures a fully adjustable, conservative rinse.

Whether you desire to upgrade your old rinse system or customize a new wet bench, the Modutek DR Series Quick Dump Rinser installs seamlessly. Even if you choose the latter, Modutek’s rinse system design ensures you save money on water costs throughout years of operation. Also don’t forget to consider increased throughput on all of your manufacturing projects.

Modutek has over 30 years of experience in providing reliable wet bench equipment for all processes in silicon wet etching. Certified specialists will guide you through from design to installation and can provide a free quote on equipment to meet your specific requirements. Call Modutek at 866-803-1533 or an email to [email protected].

How to Develop a Requirements List When Buying Wet Bench Equipment

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How-to-Develop-a-Requirements-List-When-Buying-Wet-Bench-EquipmentChoosing the right wet bench equipment is a huge challenge for a manufacturing company or research facility. The equipment represents a major investment and you don’t want to spend a lot of money to find out the system doesn’t meet all your requirements. Secondly, the complex nature of wet bench equipment often makes the selection process even more difficult. In many cases, wet benches are designed to handle specific processes for wafer manufacturing. You need to insure that the equipment can support all your chemical processing and through put requirements.

That’s why you need to carefully evaluate your needs as you prepare to buy a wet bench. Below are 7 things you need to consider when buying wet bench equipment.

  • Wafer or substrate size

Before you even think about the equipment you want to buy, consider what wafer or substrate sizes it can handle. Different applications utilize different processes and wafer sizes, which applications do you need? Fortunately Modutek’s wet bench stations can handle all manufacturing process and wafer sizes up to 12″, whichever wet station you choose; manual, automated, or semi-automated.

  • Cassettes per bath

How many wafer cassettes per bath can the wet bench equipment hold? Some equipment can hold 2 wafer cassettes per bath; others can only hold one cassette per bath. An even more important feature is how the wafers are moved between baths. In some equipment, the movement is manual while in others it is automatic.

  • Is FM approval required?

FM Global Standards form the basis approval assessment of manufacturing equipment used in the semiconductor industry. It is a general understanding in the industry that equipment addressed as FM Standard are custom built rather than produced in mass. The manufacturer’s ability to produce consistently standard products is assessed on a regular basis during FM Approval’s product follow-up program.

  • Is CO2 fire system required?

Considering the fire risk posed by wet bench processes when solvents are used, most manufacturers fit their equipment with fire extinguisher systems. A common trend is to fit the equipment with CO2 fire suppression systems (Acid benches do not require CO2). See if the fire extinguisher suppresses fires without leaving behind foam, water, or dry chemical that may damage sensitive equipment parts.

  • Is a third party electrical inspection needed?

SEMI S2, CE, and 3rd party tests are an excellent way to test your system for consistency and efficiency. Modutek uses SEMI S2, NFPA, and NEC as guidelines in manufacturing wet processing equipment and can also provide a quotation for inspection reports as requested. You’re guaranteed that all systems will pass 3rd party electrical inspections.

  • Wafer volume requirements per day/week

How many wafers do you expect to process per day/week? As most process engineers have discovered, Modutek’s dry-to-dry wet processing equipment eliminates the need to dry using a separate tool. Fitted with an MVD Series IPA Dryer, the equipment shortens overall manufacturing process allowing for greater yield per unit time.

  • Exhaust/chemical fume hood filtration requirements

Since hazardous fumes are produced in wet bench process, an exhaust mechanism is critical to all processes. Modutek provides a chemical fume hood that gives you a quick and low cost means to dispose of hazardous chemicals from the work station. Featuring white polypropylene construction for base and acid processes and stainless steel construction for solvent applications, the fume hoods are easy to install and set up, low cost, and meet or exceed all safety standards.

Summary

Remember that you always have the choice of manual, semi-automatic, and automatic wet bench stations. Other factors you may need to consider include: pump requirements, in-line heater needs, and station layout. For more information, contact Modutek on 866-803-1533 or 408-362-2000.

Modutek Featured at Semicon Conference in China

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Modutek-Featured-at-Semicon-ConferenceModutek, a leading provider of semiconductor manufacturing equipment and wet bench stations, will have a factory representative at the Semicon Conference in Shanghai China in Hall W3 at booth 3243. The conference will be held from March 17-19, 2015 and will be attended by a large number of exhibitors in the semiconductor manufacturing industry. Details and information about the Semicon Conference can be viewed on their site at http://www.semiconchina.org/.

Modutek will provide information and can answer questions about their manufacturing equipment with Laserwort who is their local Rep in China. Information about the following products will be provided at the conference:

  • Semi-automated Wet Bench Equipment:
    • Benefits include:
      • Servo motor automation
      • Automation control with touch screen
      • All robotics and software designed in house
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
  • Fully-automated Wet Bench Equipment
    • Benefits include:
      • Servo motor automation
      • Full automation control with touch screen
      • SolidWorks Simulation Professional software
      • SolidWorks Flow Simulation software
      • All robotics and software designed in house

The semi-automated and fully-automated wet bench equipment supports the following applications:

  • MEMs processing
  • KOH Etching
  • Ozone Etching
  • Ozone Cleaning
  • Precision Part Cleaning
  • SC1 & SC2 featuring Megasonic Cleaning
  • Quartz cleaning
  • BOE (Buffered Oxide Etching)
  • SPM Cleaning
  • Plating
  • All solvent applications
  • Hot phosphoric (Nitride Etching)
  • IPA Vapor Dryer
    • Benefits include:
      • Very low IPA consumption
      • No watermarks
      • Most drying cycles completed within 10-15 minutes
      • No moving parts inside drying chamber which eliminates wafer breakage
      • Drying technology can be easily designed and integrated into your wet bench eliminating one transfer step

       

    • The IPA Vapor Dryer supports the following applications:
      • Ozone Cleaning
      • Wafer Drying

Modutek has over 30 years of experience designing and building semiconductor manufacturing equipment and wet bench stations to meet the requirements of customers around the world. Modutek provides world-class service, set-up, and customer support. Their Wet Benches and Wet Process equipment provides high reliable results for precision processes. Contact them by calling 866-803-1533 or by email from the site.

Quick Tips About Using Wet Benches

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Quick Tips About Using Wet BenchesAs a lab tech or process engineer, you understand that having the best tools and equipment to work with is critical. Whether you work in manufacturing or research, keeping up with the latest technology changes is sometimes what will save even the greatest products from falling short. At Modutek Corporation, we understand that using highly reliable wet benches and wet bench chemical equipment is a big part of your job. We have been working to provide excellent products for over 30 years, and we offer a great deal of expertise on all of our products which include fully automated, semi automated, and manual wet bench stations. Whether you are manufacturing semiconductors, solar panels, disk drives, flat panel displays, or any other highly specialized product, we can provide you with high quality and reliable wet bench equipment that meets all your requirements.

Getting the Right Equipment for the Job

Every process requires reliable equipment to complete the job. When purchasing wet benches, we work with you to insure our equipment will meet all your specific process requirements. In addition, we also build and design our equipment for future expansion, just in case you are in need of additional accessories or capacity in the future.

Selecting the Right Equipment at the Right Price

Every business or research facility should be able to afford the most advanced wet bench technology available. At Modutek, we carry three unique wet bench or wet processing stations depending on your application requirements:

  • Wet Bench Manual Stations: Manual stations are the most cost effective option when selecting your new equipment. Able to support both acid and solvent applications, our manual benches are an excellent solution that offers a wide range of safety features and perks without the robotics.    
  • Wet Bench Semi-Automated Stations: These high-tech wet benches come in countless configurations perfect for any application. Semi-automated systems allow users to experience process uniformity at a lower price than the fully automated systems.
  • Wet Bench Fully Automated Stations: For technicians who need all the bells and whistles of full robotics, our fully automated stations are designed specifically for your business. Our in-house engineers generate unique operating software right at our facility, allowing your unit to come prepared to work straight out of the box.

Keeping You Safe

All of our wet processing equipment either meets or exceeds all current safety standards. Each wet bench comes standard with PVC safety shields, Emergency Power Off (EPO) with mushroom button, and safety interlocks, keeping you and your coworkers safe from harmful chemicals.

If you have any questions regarding our wet benches or how they can improve your research or product, give us a call today at (866) 803-1533 or (408) 362-2000. You can also email us at [email protected] for more information and one of our service experts will contact you to discuss your requirements and also provide a free quote.