Tag Archives: wet bench stations

Using RCA Clean in a Wet Bench Process

Posted on by

Using RCA Clean in a Wet Bench ProcessEditor’s Note: This article was originally published in May 2015 and has been updated with new information and re-posted in August 2023.

The semiconductor manufacturing industry relies heavily on complex and precise processes to create electronic components we rely on every day. One such process is wafer cleaning – an essential step that removes unwanted particles or residue from silicon wafer surfaces that could otherwise compromise product quality or reliability. RCA Clean has been established as an industry standard wafer cleaning process due to its effectiveness in removing both organic and inorganic contaminants from silicon wafer surfaces.

RCA clean is a wet chemical process developed at Radio Corporation of America that involves a series of sequential steps. The objective is to prepare wafer surfaces for further processing while maintaining their integrity, an aim that aligns directly with the needs of Process Engineers.

Process Engineers focus on cost efficiency, reliability and cleanliness, and equipment design for precise process control. Equipment must be easy to use and deliver repeatable processes while meeting specific demands of a facility’s wet processes requirements.

Understanding RCA Clean in a Wet Bench Process

At its core, RCA Clean is a three-step cleaning process aimed at effectively cleaning silicon wafers.  Each step addresses different types of contaminants, such as organic residues, thin layers of native oxide, and finally, ionic contamination.

In the first stage of RCA cleaning, commonly referred to as Standard Clean 1 (SC-1), the mixture consists of:

  • 1 part NH4OH (ammonium hydroxide)
  • 1 part H2O2 (hydrogen peroxide)
  • 5 parts deionized (DI) water.

The SC-1 solution efficiently removes organic residues while simultaneously creating a thin silicon dioxide coating to provide additional protection to the wafer surface. The second step is to rinse with deionized water to remove the SC-1 solution.

Next, a dip into hydrochloric acid and deionized water mixture removes the thin oxide layer formed during Step One. Following this, the Standard Clean 2 (SC-2) begins. This mixture consists of:

  • 1 part HCl (hydrochloric acid)
  • 1 part H2O2 (hydrogen peroxide)
  • 5 parts DI water

This step helps remove metallic ions and again forms a thin silicon dioxide layer. The process concludes with another rinse and final dip into deionized water heated to 80°C to remove any remaining residuals.

RCA Clean is essential when it comes to achieving cleanliness, consistency, and process control in semiconductor manufacturing. However, the effectiveness of RCA Clean depends on the reliability of the equipment being used. This means using equipment that effectively supports RCA clean and ensures accurate and repeatable results for process engineers.

How Wet Bench Stations Facilitate RCA Clean

Modutek’s wet bench stations have been carefully designed to enhance the RCA clean process and alleviate some of the challenges Process Engineers encounter. Their design places particular importance on chemical compatibility, cleanliness, control, and safety – essential characteristics for successful wafer cleaning.

The wet bench stations at Modutek builds use materials resistant to the chemicals used in the RCA clean process. This ensures that the equipment remains unaffected by the cleaning solutions, allowing for an uninterrupted process and a longer lifespan.

As for cleanliness, Modutek’s stations are designed to minimize particle contamination. Their design limits air movement and deposition of particulate matter. Additionally, all wet bench station components, including process tanks, are designed for easy cleaning, ensuring optimal cleanliness at all times.

Modutek’s stations feature advanced automation capabilities for process control. These automated systems offer high-precision control over process variables like temperature, cleaning time, and concentration of cleaning solutions. This ensures accurate and repeatable RCA clean results while saving time and minimizing human errors. Process Engineers can use this level of oversight to achieve their desired results consistently while saving time and avoiding human mistakes.

The wet bench stations Modutek provides incorporate numerous safety features that promote maximum protection during semiconductor manufacturing processes.  This includes chemical-resistant materials, fire suppression systems, safety interlocks, and emergency power-off capabilities.

One way that Modutek’s wet bench systems use to facilitate the RCA clean process is through their temperature control system. For instance, for optimal cleaning results in the RCA Clean process, the SC-1 and SC-2 solutions must be maintained at specific temperatures to work effectively. Modutek’s wet bench stations have been specifically designed to precisely control the temperature of solutions, ensuring an optimal cleaning process.

Incorporating Megasonic Cleaning with RCA Clean

To further enhance the results of an RCA clean process, the use of Megasonic cleaning can be instrumental. Megasonic cleaning utilizes high-frequency sound waves in a liquid medium to generate microscopic cavitation bubbles. When these microscopic bubbles collapse, they create strong local shockwaves that efficiently dislodge and remove contaminants from silicon wafer surfaces. Megasonic cleaning combined with the RCA process can significantly enhance the silicon wafer cleaning process, offering the precision necessary for creating high-quality semiconductor devices with microscopic geometries.

Modutek’s wet bench systems are designed to incorporate Megasonic cleaning seamlessly. Wet process equipment with Megasonic capabilities can operate at multiple frequencies, allowing Process Engineers to optimize the cleaning process for their specific requirements. This provides optimal particle removal, improved cleanliness, and higher yield without damaging wafers or creating defects. With the integration of Megasonic cleaning, Modutek’s wet bench systems provide a better-optimized solution for wafer cleaning.

Cost Efficiency and Ease of Use with Modutek’s Wet Bench Stations

While cleanliness and process control are essential to Process Engineers, cost efficiency and ease of use should be considered when selecting equipment for wet bench processes. Modutek’s wet bench stations are designed with the end user in mind. They provide high-quality, reliable results at an exceptional value proposition. Modutek recognizes the importance of cost control for semiconductor manufacturing facilities and offers solutions that enhance productivity while reducing the total cost of ownership.

The robust construction and quality of Modutek’s wet bench stations extend their lifespan, meaning fewer replacement costs over time and reduced frequency of replacements. Furthermore, their precise control enables businesses to reduce waste while improving yield for higher profits and increased profitability.

Modutek’s wet bench stations are also designed for maximum operator convenience. The intuitive user interface and clear control parameters enable Process Engineers and equipment technicians to master operations quickly, reducing the learning curve and training time. This easy operation also reduces human errors that could otherwise result in costly process defects.

In addition, Modutek stands behind its products by offering top-tier customer service and maintenance support. This helps facilities maintain productivity with minimal downtime for their equipment. Modutek is dedicated to ensuring minimal equipment downtime to maximize productivity for customers. Modutek also provides on-site service, technical support, and spare parts to address any potential issues promptly and effectively.

Conclusion

The need for meticulous and consistent wafer cleaning in semiconductor manufacturing is paramount, and the RCA clean method, combined with Megasonic cleaning, provides an effective solution for ensuring optimal cleanliness. However, the success of these processes relies heavily upon the equipment utilized.

Modutek’s wet bench systems are carefully designed with precision, ease of use, and cost efficiency in mind, making them an ideal choice for the RCA cleaning process. They address key requirements and challenges faced by Process Engineers, such as chemical compatibility and effective process controls, as well as providing safety and maintenance support.

For Process Engineers seeking reliable, effective, and easy-to-use solutions for their wet process requirements, Modutek provides leading-edge solutions. With a strong track record and expert service, Modutek is a trusted name in the semiconductor manufacturing industry. Contact Modutek to schedule a free consultation to discuss your wafer cleaning process requirements.

Selecting a Wet Bench Manufacturer That Meets Your Process Requirements

Posted on by

Semiconductor device fabrication can be a complex process. Often, it can take as many as eight weeks to complete a manufacturing cycle. During this process it’s critical to use wet bench stations that are built with high quality components that work reliably. This is needed to ensure that every manufacturing process involved complies with important industry standards.

How do you choose the right wet bench manufacturer and station to ensure that all your process requirements are met? There are a few areas that you need to consider:

Confirm the Wet Bench Station That Directly Meets Your Needs

A wet bench needs to address all your requirements.

  • Do you need full automation, semi automation or manual control? Fully automated stations use robotics for all the process steps and are typically used to optimize through put on well developed process. Semi automated stations use robotics for some process steps with some operator interaction. Manual wet bench stations are least expensive option and are often used when developing a new process that requires a manual interaction and does not use any robotics for automation.
  • The use of compatible materials is important. You need to consider what kind of processes engineers will use the wet bench for, and confirm the kind of fire-resistant plastics that must be used.
  • Consider the types of chemicals that will be used in the wet bench. Will corrosive chemical solvents be used? If solvents such as Acetone, NMP or Photo Resist Striping will be used a stainless steel solvent station will be need that uses corrosion-resistant material and provides fire suppression features.
  • The wet bench manufacturer should supply equipment that is in compliance with all fire safety and electrical safety codes.

If it’s difficult to find a ready-designed wet bench unit that needs all these needs, you should consider contacting the manufacturer for a custom solution.

Choose a Turnkey Solution

A wet bench manufacturer should be a one-stop outlet that has an extensive product line. They should offer complete, fully integrated systems. A complete turnkey solution is what you should choose. You should order your semiconductor wet process equipment from a vendor who not only provides you with the wet bench that you need, but also includes full installation, after sales service, technical support, and warranty support. If the unit is capable of accepting improvements and updates down the line, such improvements should be offered by the vendor, as well.

Look at Reputation and Longevity

Look for a vendor who comes with a good reputation for product quality and customer service and has been in business for awhile. Wet bench equipment is a long-term purchase. It can be beneficial to maintain a relationship with the supplier, for help with installation, repairs and updates along the way. It is also important to choose a well-established supplier. A wet bench manufacturer who has been business for decades is likely to stay in business and honor the warranty support offered.

Choose Modutek for Your Wet Bench Needs

Modutek has been the leading supplier of wet bench and wet processing equipment for over 38 years. During this time, the company has become one of the leaders and innovators in the business. Modutek does more than supply standardized wet bench equipment. The company offers clients the ability to customize and configure their equipment as they need it. Modutek’s design engineers work closely with clients to meet specific requirements.

Modutek designs all its equipment and software in-house, and, for this reason, is far more capable of offering perfectly customized solutions, when compared to other manufacturers who outsource much of their design and software.

Modutek Offers a Wide Range of Options

Semiconductor fabrication is complex process. Clients are usually not able to accept one-size-fits-all solutions. It is for this reason that Modutek offers a number of options.

Fully automated wet benches: These appliances offer wafer fabrication, using the company’s own SolidWorks Simulation Professional software. The system is known to improve production times, with high throughput for better yields.

Semi-automated wet benches: Semi-automation offers greater precision than manual control, but is more affordable than full-automation. A servo-activated robot offers three levels of automation. Just as with fully automated wet benches, the semi-automated ones come with deep software control.

Manual wet benches: These appliances offer all the features of the automated and semi-automated ranges, except that they do not use robotics. Equipment of this kind can be affordable, and it is expandable, as well.

Modutek’s wet benches offer dry-to-dry processing. They allow drying without the need to use separate appliances. It speeds up wafer processing, and allows for higher yields.

Modutek is one of the best-known names in the wet processing industry. All of Modutek’s products are designed and assembled at the company’s facilities in San Jose. With its year-long guarantee on all its products, and a name that has set high standards for quality and reliability. Modutek is a premier semiconductor wet bench manufacturer and wet process equipment supplier that you can trust. Call 866-803-1533 for a free consultation to discuss your specific process requirements.

Reviewed and Approved by Douglas Wagner
President & CEO, Modutek Corporation

 

Modutek at 2019 Semicon Conference in China-Hall N3 Booth 3243

Posted on by

Modutek Corporation, a leading supplier of wet bench stations and wet process equipment, will be at the Semicon Conference located at the Shanghai International Expo Center in China from March 20-22, 2019. At the Conference Modutek and their factory representative Laserwort Ltd., will be located in Hall N3 at booth 3243. Additional details about the Semicon Conference in China can be referenced at: http://www.semiconchina.org/

Representatives at the Modutek /Laserwort booth will be available to answer questions and provide information on using Wet Bench Stations for acid/base, solvent and or photo resist strip.  In addition Modutek will also provide information about the benefits of their new IPA vapor dryer with the HF last process. Modutek serves customers around the world and builds customized wet bench stations and wet processing equipment for customers in many industries including pharmaceutical, biochemical, solar and semiconductor manufacturing.

Additional details on some of Modutek’s products are listed below:

Single Chamber HF Last IPA Vapor Dryer

Benefits include:

  • Very low consumption of IPA
  • Most drying cycles completed within 10 to 15 minutes
  • Eliminates watermarks
  • No moving parts inside drying chamber eliminating wafer breakage
  • Drying technology can be integrated into wet bench eliminating one transfer step

Features include:

  • Single drying chamber for DI water rinsing and IPA vapor drying
  • Easy to change IPA bottles
  • Filter bypass for contamination control with no cassette contact points
  • On board HF metering for precision mix ratios
  • Uses an in situ HF etch process with a rinse step before the IPA drying cycle
  • Handles all process sizes (standard wafer carriers to glass substrates)

Fully-automated Wet Bench Equipment

Benefits include:

  • In house customization to meet customer process requirements
  • Precise automated process execution and reliable repeatability
  • Full automation control with touch screen
  • Improved yield and reduced errors
  • SolidWorks Simulation software for accurate calculation of process parameters
  • All robotics and software design designed in house
  • Complete design, assembly and test at one location to meet your specifications

Semi-automated Wet Bench Equipment:

Benefits Include:

  • Automation control with touch screen
  • Servo motor automation
  • SolidWorks Flow Simulation software
  • SolidWorks Simulation Professional software
  • All robotics and software designed and developed in house
  • Complete design, assembly and test at one location to meet your specifications

Manual Wet Bench Equipment:

Benefits Include:

  • High end manual equipment at competitive pricing
  • Meets or exceeds all current safety standards
  • Low cost of ownership
  • Designed to meet any process requirements
  • Can accommodate custom designs and processes
  • Equipment designed for future expansion

All wet bench equipment supports the following applications:

  • KOH Etching
  • Quartz cleaning
  • Ozone Strip
  • Ozone Cleaning
  • SC1 & SC2 (RCA Clean)
  • Megasonic Cleaning
  • BOE (Buffered Oxide Etching)
  • MEMs processing
  • All solvent applications
  • Hot phosphoric (Nitride Etching)
  • SPM Cleaning
  • Precision Part Cleaning

Modutek has over 38 years of industry experience and expertise in designing and building wet bench stations and wet process equipment that provides highly reliable and consistent results for precision processes. They also provide world-class service, and customer support. Contact Modutek for a free consultation or quote at 866-803-1533 or email Modutek@Modutek.com.

Reviewed and Approved by Douglas Wagner
President & CEO, Modutek Corporation

 

Why Chemical Lift Station Pumps Are Needed for Wet Bench Stations

Posted on by

why-chemical-lift-station-pumps-are-needed-for-wet-bench-stations2Once a wet bench process step is completed, the remaining chemicals and waste water have to be drained and transferred to an area for neutralization and disposal. Depending on the physical layout of the semiconductor manufacturing facility, gravity draining may either not be possible at all or may be insufficient in terms of flow and speed. Chemical lift station pumps take over the transfer of chemical solvent in a controlled and optimized way. The removal of chemical solvents and waste liquids is accomplished rapidly and completely, leaving the wet bench station ready for a new process step.

Lift Station Pumps for New Installations

While it may be possible to design new installations without lift station pumps and relying only on gravity drains, changes in the facility, expansions or upgrades may require the retrofitting of pumps. In that case, lift station pumps have to be included in separate stations that are often located behind the wet bench stations. These separate stations take up valuable floor space that could otherwise be dedicated to productive process elements. As a result, incorporating lift station pumps in new wet benches is more desirable.

Modutek can add lift station pumps to their wet bench stations and use them to pump acids, solvents and related chemicals and solutions in their semiconductor manufacturing equipment. The lift stations automatically monitor the lift station tanks. When fluids are detected in the tank via the installed level sensors, the corresponding pump is activated to transfer the liquid from the processing station to the facility’s neutralization area. Incorporating the lift pumps in the processing stations is an efficient and compact solution for new installations.

Adding Lift Stations to Existing Processing Lines

When wet bench processing lines are used with a new process or are upgraded, the gravity drains that were previously adequate may no longer deliver the required flow. Lift stations have to be added to deliver the anticipated performance. Often extensive customization of the lift stations is required to accommodate them in the existing facility.

Modutek can help find solutions to adding chemical lift stations to wet processing lines. The company has a complete line of chemical lift stations for installation outside existing wet processing stations. Modutek engineers evaluate process requirements and plant layout to propose equipment that works best for a particular application.

Modutek’s chemical lift stations have all-plastic fluid paths for resistance to corrosion and feature an automatic constant ON with level sensing governing operation. Standard pumps are vertical centrifugal polypro with other pump options and a double containment option available. The polypro holding tank can be built to the size required and the designs are customized to meet flow requirements. Level sensing is via four float-type level sensors signaling low/low, low, high and high/high. Remote control is available.

Modutek Delivers Customization and Support

Modutek can analyze the requirements of a wet bench installation and propose ideal solutions because the company designs and builds their wet bench equipment in house at their facility in San Jose. With almost 40 years experience in wet bench technology, Modutek has the expertise to find optimum solutions and implement them using their own equipment. Chemical lift stations for existing installations and lift station pumps incorporated into new wet bench stations often require extensive customization. Such customization can include different geometry, size, materials, and control logic to meet unique customer requirements. Modutek can rely on in house experience to adapt its equipment for a specific application. Once delivered and installed, Modutek can provide unparalleled customer support because the company doesn’t use third party suppliers. The Modutek specialists carrying out wet bench and lift station service are backed up by the Modutek personnel who designed and built the equipment.

Reviewed and Approved by Douglas Wagner
President & CEO, Modutek Corporation

 

How to Safely Use Solvents for Wafer Processing

Posted on by

how-to-safely-use-solvents-for-wafer-processingAt semiconductor research centers and foundries, solvent wet bench stations provide a critical role in the semiconductor fabrication process. These stations are designed for operations that include substrate cleaning, photoresist stripping and liftoff pattern transfers. Since the solvents are often highly inflammable, wet bench equipment needs to be designed with stringent compliance to safety codes.

Equipping for safety

Precautions related to fire safety and electrical safety is among the most basic requirements in wet bench station design. Fire suppression can involve the application of spark-resistant electrical design all around, and the provision of extinguisher equipment. Solvent wet bench stations must be designed to meet Class 1 Div 2 certifications, and incorporate a carbon dioxide (CO2) fire system.

Safety alarms: Exhaust, CTA and N2 safety interlocks should monitor for use within acceptable ranges. Safety doors on the head case and elsewhere should be monitored during use and should be able to shut down operation if they are opened during use. Float switches should detect liquid spills on the floor of the bench. Differences in pressure between the exhaust on the bench and the rest of the room should be monitored through the use of photohelic gauges (low readings indicating incorrect operation should sound an alarm).

Carboy collection: Since solvent waste should never be sent down the drain, carboys help collect waste for containment. Multiple containment volume sizes are available.  All come with current safety interface.

Heated solvent baths: Temperature control is achieved in many ways, and heated baths are one of them. They should be used to control the temperature of the solvents being used. Temperature controllers should be used both to raise and lower temperatures and to monitor temperatures.

Process timers: These vital pieces of equipment should be mounted to the head case to ensure that personnel are able to keep track of how long each process is to run.

Restrictions on use: A login system should ensure that only authorized individuals are able to access the bench.

In many cases, safety comes from simpler approaches — the use of auto lids made of Teflon or stainless steel to help seal off chemical containers.

Modutek’s Solvent Wet Bench Equipment

Available in manual, dry-to-dry, semi-and fully-automated designs, Modutek’s stainless steel solvent stations are constructed all through using 304 stainless steel. Solvent applications require the use of this material. From photoresist to IPA, and acetone, these stations are suitable for critical operations in the wafer processing activities. From solid works simulation to professional flow simulation, many critical flow characteristics are available. Improvements to productivity are achieved through the use of Modutek’s advanced software.

Modutek’s safety design for solvent processing involves every required feature. With wiring specified to NFPA 70 & 79 codes, emergency power off design for every safety interlock, lip exhausts on all solvent tanks, N2 head case purge design, photohelic EPO interlocks, safety shields, Teflon N2 guns, and continuous flow of the water manifolds, Modutek’s designs are among the safest of all wet stations.

With a chemical management interface, a PCL with touchscreen GUI, a rear access design, Teflon plumbing throughout, certification to the CE Mark, and seismic certification, Modutek’s equipment incorporates features beyond legally required safety measures.

Modutek’s Wet Bench Design and Build Process

Wet bench construction is a complicated process, and Modutek provides systems that are designed to meet the requirements of specific applications of individual customers. With 35 years in the business, Modutek understands that acid and solvent processing for micro fabrication requires customized solutions. Modutek’s designs and builds all their wet bench stations in house to ensure every part of the system provides reliable performance. If you need a solvent wet bench station designed and built to meet your requirement s contact Modutek for a free consultation or quote.

 

How Wet Bench Stations Are Tailored for Specific Manufacturing Process Requirements

Posted on by

The fabrication of semiconductor wafers requires that an elaborate set of chemical etching, stripping and cleaning steps be followed in a precise procedure that can be consistently repeated. The semiconductor manufacturing process requires that the use of hydrofluoric acid and other chemicals which must precisely controlled and monitored. These high-tech processes are critically important to industries that fabricate semiconductors, medical equipment and photovoltaic cells. They require the use of custom-made wet benches designed to assist in the safe and precise control of corrosive chemicals at high temperatures.

Wet bench equipment

Modutek provides a full range of wet bench equipment to address the specialized needs of semiconductor manufacturing facilities and research centers. Wet bench stations can be tailor made according to the specific manufacturing process requirements of a customer.

Citric-nitric passivation wet benches are critical to the passivation of titanium and stainless-steel parts in various industries. Electro-polishing wet bench equipment is deployed in the medical device industry in the manufacture of precision steel, cobalt chrome and titanium components.

Multistage wet process fume hoods with circulation pumps are used in aerospace component manufacture, printed circuit board fabrication, and the semiconductor manufacturing industry. Modutek’s wet bench equipment for the semiconductor industry meets UL2360/FM4910 standards for fire and contamination safety. This enables fabricators to remain compliant with applicable environmental laws.

Titanium anodizing equipment, agitated immersion washers, in-line conveyor washers, spray cabinet washers and other precision equipment are an integral part of the semiconductor industry, as well. Modutek is an industry leader in the design, development and deployment of these and many other kinds of wet bench equipment.

The precision needed in manufacturing equipment

Sulfuric acid-peroxide is a powerful chemical that is critical to the cleaning processes applied to semiconductor wafers. Effective application of this chemical mixture is inherently unstable and requires constant rebalancing. The rebalancing and control is needed to maintain efficiency. The mixture needs to be constantly replenished with hydrogen peroxide at high temperatures, something that can be costly even in simple material costs. Modutek’s high-tech systems not only ensure the correct concentration levels, they also help fabricators contain material costs through the use of an exclusive chemical re-use system to contain material costs. Every part of the process is maintained and monitored by equipment that is software controlled.

The silicon nitride wet etching process is another semiconductor fabrication stage that requires a high level of precision and control. Silicon nitride is used to mask chemical etchings on silicon wafers. Once an etching successfully completes, the masking material requires removal. Typically, a mixture of phosphoric acid and the ionized water is applied. Precise control over the chemical mixture is needed, however, if only to prevent the risk of dangerous heat levels and explosions. Modutek’s wet bench station design addresses this challenge through the use of high-tech safety features and the use of precision software.

Modutek’s in-house design process

From manual to semi-automated and fully automated wet bench stations, Modutek’s products are designed and developed in-house right down to the software. From servo-controlled robots and automated equipment to low-cost manual stations, Modutek’s equipment covers the needs of the industries they serve. With their in house expertise and 35+ years of operation, the company is well equipped to meet and support the requirements of semiconductor manufacturers and research centers. Developing equipment that provides thorough and precise control of the manufacturing process is what sets Modutek apart from other semiconductor equipment manufacturers. Contact Modutek today at 866-803-1533 for a free consultation or quote on wet bench equipment that can be tailor made to support your specific manufacturing requirements.

 

Designing Semiconductor Manufacturing Equipment for Ergonomics and Safety

Posted on by

Designing Semiconductor Manufacturing Equipment for Ergonomics and SafetySemiconductor manufacturing processes routinely use chemicals and procedures that could result in accidents if the manufacturer did not have a serious commitment to safety. Safety guidelines such as SEMI S2, published by the global industry association for microelectronics manufacturers, help manufacturers implement safe operating protocols. Ergonomic designs for semiconductor manufacturing equipment as described in SEMI S8 help ensure a safe operating environment by reducing operator strain and fatigue.

In semiconductor facilities, fire is one of the most damaging threats and burning plastic releases toxic fumes while contaminating clean areas. The Cleanroom Materials Flammability Test Protocol (Class 4910) or the FM 4910 specification allows manufacturers to specify the use of non-flammable materials for their equipment. A comprehensive approach to safety, including ergonomic design and the reduction of fire hazards is the most effective strategy for reducing accidents in a semiconductor manufacturing environment.

Prioritizing Safety When Purchasing Semiconductor Manufacturing Equipment

Installations that have been in operation for a number of years may no longer satisfy current safety standards or may not meet the safety goals of the owner. The purchase of new equipment is an ideal opportunity to upgrade existing safety features and to ensure that the new equipment is as safe as possible.

Modutek follows the SEMI safety and ergonomics guidelines to design equipment that is easy to use and doesn’t require excessive reach or strength to operate. Typical examples include the Modutek wafer holding tray and a swing-arm operator interface mount. The wafer holding tray on the Modutek wet benches includes a robot arm that moves the tray to the front of the station for optimal loading with a minimum of effort.

The Modutek operator interface is normally out of the way along the side of the station, but that position is hard to see when an operator is monitoring the process. The ergonomic design allows the operator to swing the interface out and angle it for optimal viewing. The swing arm can rotate along three axes so the operator can place it in whatever position is the most convenient. Once in position, the operator can lock it into place securely, so it doesn’t move inadvertently.

Both of these examples demonstrate how Modutek implements ergonomic designs to help operators and technicians carry out their work safely and with a minimum of effort. The result is often higher productivity, more satisfied employees and fewer accidents.

Reducing Fire Hazards on New Equipment

Traditionally clean rooms are fitted with sprinkler systems or other specialized fire protection. An array of sensors detects flames, smoke, chemical vapors or heat and triggers the fire extinguishing system. By this time contamination of the facility is severe and re-establishing clean room manufacturing capability is time-consuming and expensive.

Semiconductor manufacturers and research centers with clean room facilities can reduce the threat of a fire that could disable their production by minimizing the use of flammable materials. Many wet bench processes use corrosive chemicals in tanks and piping made of plastic or other normally flammable synthetic material. Modutek can support efforts to minimize the use of flammable materials by supplying equipment that meets the FM 4910 flammability specifications and reduces the threat of fire.

Increased Safety with New Equipment from Modutek

Modutek has over 35 years experience in designing and manufacturing wet bench stations. The company has a broad range of standard equipment and can customize all aspects of semiconductor manufacturing to meet specific specialized needs.

While Modutek wet benches have a high degree of safety and ergonomic design built in, special customer requests can always be accommodated. Specific safety features or special ergonomic requirements can be added if not already present, and additional precautions against fire and other hazards can be incorporated as needed. Modutek equipment already includes many safety features, but the company has the experience and expertise to meet any additional customer requirements.

Tips on Selecting Chemical Delivery Systems for Your Application

Posted on by

Tips on Selecting Chemical Delivery Systems for Your ApplicationChemical delivery systems handle the chemicals required to support various industrial processes. Chemicals that are often corrosive or hazardous are stored securely and delivered to the process in specified concentrations and mixtures. Once used in a particular process, the chemicals can be recovered and neutralized, disposed of or re-used.

Such chemical delivery systems, when integrated in processes such as semiconductor manufacturing using wet bench equipment, allow safe operation with accurate dosages and quick change from one chemical to another. The systems reduce spills and operator error and they can save money by using exactly the amounts of chemical needed. Depending on the process and the volume of chemicals, chemical delivery system design must take into account appropriate storage methods and customization to meet the requirements of the specific application.

Considerations Before Purchase

In addition to selecting a supplier that has an excellent reputation and extensive experience in the design and building of chemical delivery systems, there are specific factors that affect the type of system needed.

  • How much of a particular chemical is used in the process? Storage options from large volumes to small local storage must be available.
  • How does the system calculate the required chemicals and how is the software for calculations supported?
  • What are the control options and do they integrate easily and well with wet bench controls?
  • What safety, error and leak detection features are available?
  • Is the system flexible enough to adapt to specific process requirements and can the supplier undertake such customization?

 

Before making a purchasing decision, facility managers and staff responsible for the technical evaluation have to make sure the chosen chemical delivery system can meet their requirements on various factors such as the five listed above.

Chemical Delivery Systems by Modutek

Modutek has extensive experience in the design and construction of chemical delivery systems that meet the needs of their customers. The company’s systems feature a variety of storage options such as large volume storage, chemical tote or local drum, bottle or carboy. Storage includes level sensing from low/low through low and high to high/high and levels are displayed on a touch screen.

The SolidWorks Simulation Professional and SolidWorks Flow Simulation software calculates accurate chemical requirements. Because the software and the controls are designed and programmed in house, Modutek can customize them and can support the software with its own technicians. Based on the calculations, the controls provide precise mixing to minimize waste and lessen the overall operational costs.

Modutek’s chemical delivery systems integrate seamlessly with their wet bench technology, and can usually be used with wet benches from most other manufacturers. The company offers fully automated, semi-automated and manual wet processing equipment that can easily interface with its chemical delivery systems. These systems are flexible enough to also be used with existing wet bench equipment, whether made by Modutek or by other equipment manufacturers.

Modutek’s systems feature high safety and reliability with attention to excellent performance and quick changeovers. Cabinets are manufactured with double containment and double-walled plumbing is available along with leak detection and data logging. Modutek’s chemical delivery systems provide excellent repeatability and consistent results.

Modutek can easily customize its chemical delivery systems because all design and manufacturing work is done in house. The company has the expertise to evaluate customer requirements and make appropriate recommendations. Once the customer has decided on the system needed, Modutek’s engineers and technicians can make sure the equipment performs as expected and meets the specified operating parameters.

When customers ask Modutek to supply their chemical delivery system, the company can design and build exactly the customized system needed for the particular application. Facilities using chemicals can increase throughput while reducing chemical use. If you need an efficient and effective chemical delivery system to support your application contact Modutek for a free consultation or quote or email Modutek@modutek.com.

Silicon Wafer Strip Solutions for Wet Processing Equipment Applications

Posted on by

Silicon Wafer Strip Solutions for Wet Processing Equipment ApplicationsModutek’s extensive experience in delivering wet processing equipment allows the company to meet the particular needs of each customer. Its equipment can support a wide variety of wet bench processes and its extensive range of products can be customized to solve specialized problems for particular applications. For silicon wafer strip solutions, the company can deliver equipment to support the following applications:

Silicon Nitride Strip

The silicon nitride strip process removes silicon nitride from silicon wafers containing integrated circuits in a hot acid bath. Key factors for a high quality result are the selectivity of the bath strip solution and the repeatability of the process variables. The selectivity of removing silicon nitride while leaving silicon oxide intact must be high and the process must always deliver the same results for the same inputs.

The Modutek Nb series silicon nitride etch bath monitors bath temperature while adding DI water to maintain the acid to water ratio. The process can be tightly controlled to give excellent consistency resulting in the desired selectivity and the required repeatability.

Resist Strip

Modutek offers an advanced ozone cleaning process for photoresist strip without the use of harsh, expensive chemicals. The ozone cleaning process can strip, etch or clean silicon wafers at a lower cost than conventional technology while using an environmentally friendly and safe process.

Oxide Strip (Buffered Oxide Etch – BOE) 

The F series filtered sub-ambient circulation bath for BOE applications can cut down on acid consumption while reducing particles and improving yields. Specifically designed for BOE applications, the Modutek F series bath delivers excellent performance with a large number of options available to meet specific process requirements.

Solvent Based Resist Strip 

Modutek’s SFa series temperature controlled stainless steel recirculating baths can handle a wide variety of solvents. The baths all meet Class 1 Div 1 Group D requirements and can handle solvents such as IPA, acetone and resist strip solutions. The vessels are 316L electropolished stainless steel designed for long vessel life and operate at a temperature of up to 100 degrees Celsius. Available in a range of sizes as well as with custom dimensions, the baths are designed to handle all solvent applications.

SPM Photo Resist Strip

For photo resist strip using the sulphuric acid / hydrogen peroxide mixture SPM process, the Modutek QFa high temperature recirculation quartz baths are an ideal solution. They feature fast, even heating in a seamless, sloped flange design. Operating temperature range is 30 to 180 degrees Celsius with an approximate heat up rate of 2 degrees per minute. Process temperature control can provide an accuracy of up to plus/minus 1 degree Celsius. The quartz bath vessel is made of boron-free internally flame polished virgin fused quartz and Modutek can supply a wide range of standard and custom sizes.

Wet Processing Strip Solutions

Processing engineers considering various silicon wafer strip solutions can be confident that Modutek can supply the appropriate wet processing equipment for their application. The company has been in operation for over 35 years and provides an extensive product line of semiconductor manufacturing equipment. Their experience and expertise allows them to offer both standard equipment for common applications as well as customized solutions for applications outside the norm.

With Modutek, engineers can choose the wafer strip process they want to use, from conventional SPM, solvent or silicon nitride wet processes to the new advanced ozone technology. They can decide which is the most appropriate for their particular application. Modutek can provide recommendations on the wet processing equipment needed and also offer different options when applicable. For a free consultation or quote on selecting equipment for specific wafer strip applications call Modutek at 866-803-1533 or email Modutek@modutek.com.

How Modutek Supports Customers Using Semiconductor Manufacturing Equipment

Posted on by

How Modutek Supports Customers Using Semiconductor Manufacturing EquipmentSemiconductor manufacturing equipment from Modutek Corporation can tailored to meet a wide variety of customer requirements and the support offered by the company ensures that products work as expected. Process engineers and facility managers in wafer manufacturing facilities, research labs and universities can rely on customized wet processing equipment supported by experienced service teams for onsite testing and subsequent maintenance. Such testing and support ensures that installations operate efficiently, deliver high throughput and experience low levels of downtime.

Equipment Testing

Modutek provides final acceptance testing (FAT) of equipment at their company facilities in San Jose, CA. Customer personnel can be present for the verification process and review the final equipment testing. Customer site acceptance testing (SAT), includes onsite start-up training with experienced Modutek personnel showing operators how the equipment works. Follow-up operational training can be given at all levels, from facility managers to equipment operators.

Service Contracts

Service contracts ensure that the equipment is working optimally and that all settings and adjustments work according to specifications. Modutek offers service contracts for both new and used equipment. Services include verification that the equipment meets factory standards, and checks to make sure the equipment is correctly calibrated.  Recommendations are provided if the equipment is not performing to factory specifications.

Modutek’s service contracts help customers protect their investment and ensure the performance and production characteristics of the equipment meet expectations. For used or for older wet bench systems, Modutek can evaluate equipment condition and performance and suggest updates, revisions or upgrades for improvements that use the latest technology.

Preventive Maintenance Contracts

Modutek offers preventive maintenance contracts to help ensure their customer’s equipment continues to perform optimally. Service checks on Modutek equipment or on the equipment of some competitors are done to detect problems that could slow production, affect quality or lead to unexpected downtime. Service checks can be one-time, or customers can schedule quarterly or annual checks. In each case, any or all of the equipment supplied by Modutek can be verified and Modutek can make recommendations to address potential problems.

Field Service and Support

In addition to testing, training and service contracts, Modutek offers field service for customers who need repairs, who want to upgrade their equipment or who need customized parts to improve their process. Modutek’s field service and support operate worldwide and can undertake repairs and modifications on site. Diagnosis of equipment problems is often possible by remote access, over the phone or via email. Modutek can walk customers through the possible fixes before quoting on an agreed solution.

Modutek’s experience in wet bench technology lets the company provide extensive on site support with the possibility of shipping units back for in house repairs or upgrades if that is the better solution for the customer. When equipment is repaired or modified, a new warranty applies, even on non-Modutek equipment. With more than 35 years of operation, Modutek still supports all their older equipment, and repairs or upgrades may be less expensive than new equipment.

Managers at semiconductor fabs and research facilities can depend on Modutek’s service and support. In addition to supplying state-of-the-art technology and reliable, efficient equipment that produces quality output, the company protects customer investments by supporting its products over their lifetime. In addition, they will identify upgrades and improvements that extend useful life, and offer comprehensive repair services when parts fail. For Modutek, customer service and support is as important as supplying the right equipment for the customer’s needs. If you need quality service and support for the semiconductor manufacturing equipment used at your facility call Modutek for a free quote at 866-803-1533 or email Modutek@modutek.com.