Using Modutek’s Teflon Tanks with KOH and TMAH Etching Processes
Editor’s Note: This article was originally published in June 2014 and has been updated with additional information and reposted in March 2023. KOH (potassium hydroxide) and TMAH (tetramethylammonium hydroxide) are two commonly used chemicals for etching silicon, glass, and other materials. The etching process involves dissolving the surface of the material, leaving behind a desired […]
Advantages of Using the KOH Etching Process
The KOH etching process uses a potassium hydroxide solution to etch silicon wafers and produce microscopic structures in the silicon. In subsequent semiconductor fabrication steps, the micro structures are used in the manufacture of integrated circuits, processors and other electronic devices. Compared to other etching processes KOH etching is comparatively safe, etches silicon rapidly and […]