Wet Bench Manufacturer | Wet Process Equipment | Modutek

How Advanced Ozone Cleaning Reduces Costs and Improves Wafer Yields


When ozone is used to clean silicon wafers, it reduces the use of aggressive chemicals and it can decrease the wafer particle count. Modutek’s advanced ozone cleaning process can clean more quickly than many chemical-based processes and it delivers other benefits. Ozone is used to remove organic contaminants from wafer surfaces in either the Coldstrip […]

How Megasonic Cleaning Improves Silicon Wafer Manufacturing


When silicon wafers are cleaned between manufacturing steps, it is critical to remove all contamination from the wafer surfaces. The remaining traces of process chemicals or microscopic particles can disrupt the etching process and result in defective or low-quality semiconductor devices. Megasonic cleaning uses high-frequency sound waves in the cleaning tank to remove contaminants and […]