Why Customization and Flexibility are Needed in Wafer Fabrication Equipment
In the demanding world of semiconductor manufacturing, the wafer fabrication process stands out for its precision and stringent cleanliness requirements. Every stage of production requires equipment that meets exacting standards and aligns with each facility’s unique demands. In this context, the customization and flexibility of wafer fabrication systems and equipment are paramount. Process engineers face […]
Safety Protocols for Using Wet Bench Equipment
In semiconductor manufacturing and research lab environments, the importance of safety cannot be overstated. These environments, known for their intricate processes and delicate handling of materials, necessitate stringent safety protocols to protect both personnel and products. This is particularly crucial when dealing with wet bench equipment, a central component in the semiconductor industry for various […]
Why it’s Important to Buy from a Wet Bench Manufacturer with In-House Expertise
Selecting a wet bench manufacturer with in-house expertise is essential for numerous reasons, ensuring high-quality products while significantly impacting the efficiency, safety, and success of semiconductor manufacturing processes. Here are several key reasons why in-house expertise should be prioritized: Custom Solutions: Tailored designs and adjustments to meet specific process requirements that enhance operational efficiency. Quality […]
10 Quick Tips on Selecting Semiconductor Manufacturing Equipment
Editor’s Note: This article was originally published in August 2014 and has been updated with new information and reposted in October 2023. Facility and process management in the semiconductor industry requires meticulous attention to detail. Here we offer tips that encompass decades of Modutek’s experience, catering to technology professionals, including process engineers, facility managers, and […]
5 Things About Wet Benches You Should Know
Editor’s Note: This article was originally published in February 2015 and has been updated with new information and reposted in October 2023. When you choose a reputable supplier of wet benches, your process can be efficient, flexible, and safe. Ideally, the supplier will be a manufacturer of wet bench equipment, performing most of the design, […]
How to Develop a Requirements List When Buying Wet Bench Equipment
Editor’s Note: This article was originally published in March 2015 and has been updated with new information and reposted in August 2023. Wet bench equipment is an integral component that semiconductor manufacturing and research industries need. From cleaning, etching, stripping, developing, and testing new processes, it plays a vital role in these fields. The range […]
Making the Right Choice: Comparing Automated and Semi-Automated Wet Bench Systems
Wet bench systems play a vital role in various industries, providing essential support in manufacturing processes such as cleaning, etching, and surface preparation. When considering wet process operations, there are two primary options for wet bench systems – automated and semi-automated wet bench systems. These systems offer different benefits, applications, and considerations for use in […]
How Stainless-Steel Wet Benches Ensure Safety When Using Solvents
When solvents are used in stainless steel wet benches during semiconductor manufacturing, special measures are required to reduce the risk of fire or explosions. Solvents such as acetone are highly flammable. They are used for silicon wafer cleaning and stripping to remove contaminants from the silicon wafer and to remove photoresist. Essential safety measures include […]
How the SPM Clean Process is Supported in a Wet Bench Process
Editor’s Note: This article was originally published in Oct 2016 and has been updated with additional information and reposted in May 2023. Semiconductor manufacturing involves multiple processing steps which include cleaning silicon wafers. The sulfuric peroxide mix (SPM) cleaning process is widely utilized in semiconductor manufacturing. The process utilizes a mixture of approximately 3 parts […]
How Standard Clean Particle Removal (SC1 Clean) is Supported in a Wet Bench Process
Editor’s Note: This article was originally published in April 2015 and has been updated with additional information and reposted in April 2023. The SC1 clean process is a widely used method for removing particles and other contaminants from silicon wafers. This process involves using a solution of ammonium hydroxide and hydrogen peroxide, which is heated […]