Free Standing IPA Vapor Dryer Improves Wafer Processing

When a series of semiconductor manufacturing steps are complete, the silicon wafers have to be rinsed and dried. At this stage in the fabrication process, the surface of the silicon wafer has to be as free as possible from particle contamination wafer and free from water marks caused by the water evaporating on the wafer. […]
How the IPA Vapor Dryer Further Improves Wafer Processing

When silicon wafers are dried after rinsing, the wafer surface has to be free of water marks and contaminating particles. This is especially true after hydrofluoric acid removes the silicon oxide layer during the last etching before further processing. The wafers are subsequently exposed to diffusion or vapor deposition and surface contamination will result in […]
The Advantages of Using Modutek’s Quartz Tube Cleaning Stations

After a quartz tube is used in a high-temperature semiconductor manufacturing process, it has to be cleaned thoroughly to remove contamination. Process steps such as diffusion leave traces of diffused material on the tube and the high-temperature furnace leaves contaminants. A Quartz tube cleaning station removes the surface contaminants and leaves the quartz tube clean and free […]
Achieving Optimum Particle Removal in a Wet Bench Process

As component packing is tighter and circuit geometries trend towards smaller structures, the reduction of submicron particle contamination during the wet bench process steps becomes more important for output quality. When circuit paths are reduced in size, a single submicron particle can block the path and render the final semiconductor component defective. Even when the […]
How Customized Equipment Improves Silicon Wafer Processing

Because semiconductor manufacturing is made up of a large number of steps, silicon wafer processing often includes unique requirements. Standard equipment may be suitable to some extent, but using custom equipment adapted to the particular process can improve production line performance. Customization of the physical characteristics of the system, the software, the degree of automation […]
How the IPA Vapor Dryer Provides Superior Wafer Processing

After etching and rinsing, an IPA (isopropyl alcohol) vapor dryer can produce dry silicon wafers without watermarks and limited particle adders. In IPA drying, also known as Marangoni drying, the Marangoni effect relies on the low surface tension of IPA compared to water. When IPA vapor is introduced into the drying chamber, a surface tension […]
How Megasonic Cleaning Improves Silicon Wafer Manufacturing Results

Traditional silicon wafer cleaning uses aggressive chemicals to strip wafers and remove particles during semiconductor manufacturing. As semiconductor components such as processors, switches and memory chips become more tightly packed, removing all traces of contamination on the wafer surface becomes important for the production of high quality components and the reduction of component failure rates. […]
How Quartz Tube Stations Work and the Benefits They Provide

Among the many processing steps involved in the manufacture of semiconductor components are high-temperature operations such as diffusion of materials into the silicon wafers. Quartz tubes are an ideal vessel for these process steps because the tubes can withstand the temperatures required and are inert enough to minimize contamination. Typically, the silicon wafers are placed […]
How the IPA Vapor Dryer Improves Wafer Processing Results

Not every advancement in semiconductor fabrication produces results that are usable in industry. To be of value, advancements need to be consistently repeatable when used on an industrial scale. Modutek’s IPA vapor dryer falls into this category, helping semiconductor fabricators improve both yields and processing times. Modutek’s IPA vapor dryers are custom-engineered with in-house experts […]
Improving Wafer Processing with Automated Equipment

Fully and semi-automated wafer processing equipment can help improve wafer output quality by providing consistent chemical processing dosages and timing, however these settings must be first be determined. One way to find optimal process settings is to operate in manual and then in semi-automated mode where settings can easily be adjusted. This is especially true […]