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Archive: August 2020
How Isotropic and Anisotropic Processes Improve Silicon Wet Etching
The microscopic structures produced by silicon wet etching can be created with a high degree of precision by using both isotropic and anisotropic processes. Isotropic etching is faster but may…
Read More →
How Megasonic Cleaning Reduces Costs and Improves Silicon Wafer Yields
Between process steps that etch silicon wafers and deposit circuit paths, semiconductor manufacturing relies on wafer cleaning to remove material from previous process steps and microscopic contaminating particles. As structures…
Read More →Latest Posts
Categories
Archives
Archive: August 2020
How Isotropic and Anisotropic Processes Improve Silicon Wet Etching
The microscopic structures produced by silicon wet etching can be created with a high degree of precision by using both isotropic and anisotropic processes. Isotropic etching is faster but may…
Read More →
How Megasonic Cleaning Reduces Costs and Improves Silicon Wafer Yields
Between process steps that etch silicon wafers and deposit circuit paths, semiconductor manufacturing relies on wafer cleaning to remove material from previous process steps and microscopic contaminating particles. As structures…
Read More →