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Archive: June 2021

How Specialized Equipment Improves Silicon Wet Etching Processes

Results from common wet etching processes such as KOH and Piranha etch can be improved with the use of specialized equipment. Depending on the process, key parameters can be controlled…

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Improving Standard Clean Particle Removal in a Wet Bench Process

When silicon wafer yields are not improved with the Standard Clean process, improved particle removal can be achieved with advanced processing equipment. Standard Clean or RCA clean was developed by…

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