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Archive: August 2022
Equipment Innovations Improve Silicon Nitride Etch Processing
When silicon nitride wet etching is used to etch masks on silicon wafers, precise control of the etch rate is important. If the etch rate varies, the mask may not…
Read More →
How Advanced Ozone Cleaning Reduces Costs and Improves Wafer Yields
When ozone is used to clean silicon wafers, it reduces the use of aggressive chemicals and it can decrease the wafer particle count. Modutek’s advanced ozone cleaning process can clean…
Read More →Latest Posts
Categories
Archives
Archive: August 2022
Equipment Innovations Improve Silicon Nitride Etch Processing
When silicon nitride wet etching is used to etch masks on silicon wafers, precise control of the etch rate is important. If the etch rate varies, the mask may not…
Read More →
How Advanced Ozone Cleaning Reduces Costs and Improves Wafer Yields
When ozone is used to clean silicon wafers, it reduces the use of aggressive chemicals and it can decrease the wafer particle count. Modutek’s advanced ozone cleaning process can clean…
Read More →