Innovative Table Top Units that Support Chemical Wet Processing

Innovative Table Top Units that Support Chemical Wet ProcessingResearch, proof of concept, or prototyping often require the production of single silicon semiconductors or a small number of functional units. Using a semiconductor manufacturing line for this purpose is expensive and lacks flexibility. Wet process manufacturing can be scaled back to reduce equipment size without losing functionality. Modutek has developed table top units that can carry out the most important silicon wet etching functions to produce small volumes of semiconductor products quickly and efficiently.

Modutek’s Table Top Units Support the Most Common Kinds of Chemical Wet Processing

The table top chemical wet processing units that are compact, self-supporting systems made up of a Teflon tank or stainless-steel solvent tank and a control box. The tanks are available as ambient or temperature-controlled models and can be static baths or recirculating baths with a filter. They support KOH etch, buffered oxide etch (BOE), solvent resist strip and they can be fitted out for other types of wet processing.

The temperature-controlled tanks feature fast temperature rise, uniform heating, and accurate temperature maintenance. Tanks have an all-Teflon fluid path, level, and temperature alarms, and a drain interlock. Their size makes them ideal for small batches, test units, or multiple versions of a basic design.

KOH Etch Using Modutek Table Top Units

KOH etching is widely used because it is relatively safe and easy to control. The concentration of the potassium hydroxide and the temperature of the bath are the key variables for determining the etch rate. Once the concentration is set, the table top units can control the temperature to get the desired etch rate. The rapid temperature rise speeds up the overall process and improves efficiency. The precision of the temperature control ensures that the etched cavities in the silicon wafer are exactly as required and provide for excellent repeatability.

The table top units are designed to minimize impurities and deliver high-quality output. Design changes in semiconductor structure are reliably carried out while the basic structures of the original design remain identical from one process run to the next.

The Table Top Units Can Handle Solvent Resist Strip

Solvents used in semiconductor manufacturing can remove resist, oils, and organic contaminants from silicon wafers in preparation for further processing steps. Acetone, isopropyl alcohol (IPA) and ethylene diproxitol (EDP) are solvents commonly used to clean wafers, remove photoresists, and in pattern transfers for the creation of microscopic structures on the wafer. The solvents are inflammable and require special safety measures to reduce the risk of fire and explosion, and they have to be disposed of safely. Modutek’s table top system supplies all of this in an easy-to-install design package.

Sub Ambient Buffered Oxide Etch (BOE) with Table Top Units

The BOE process is used to etch thin layers of silicon dioxide or silicon nitride with hydrofluoric acid and a buffer. For sub ambient BOE, the table top units are fitted with a chiller/heater that permits an operation in the 10-to-60-degree centigrade range. The sub ambient filtered etch bath reduces acid consumption and delivers highly efficient filtration. The table top units feature a safe and reliable operation at a comparatively low cost.

Modutek Can Design Custom Units for Special Applications

As a leading manufacturer of silicon wet etching equipment, Modutek designs builds and tests their own products in-house. Modutek works closely with customers to develop innovative approaches that solve industry problems. Contact Modutek for a free quote or consultation for specialized equipment that meets your wet processing requirements.